US5604059A
Expired / Lapsed
US
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Mask structure having phase shifting pattern suitable for forming fine pattern on photosensitive film and method of manufacturing solid-state devices using such mask structure
Assignee: Renesas Electronics Corp
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Filing: 1994-08-15
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Granted: 1997-02-18
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Expires: 2014-08-15
Abstract
Abstract A mask structure has two (or more) groups of device patterns formed on one transparent support plate. Each of the device patterns has a transparent partial pattern. One or both of the groups of device patterns are provided with phase shifting patterns for improvement of the resolution in the lithography. The transparent partial pattern in each of the device patterns in each of the device pattern groups is determined such that each of the transparent partial patterns held by one of the device pattern groups is adapted for combination with one transparent partial pattern held by the other device pattern group by two or more times of transmission of an exposure beam through the mask structure. Manufacturing of solid-state devices is possible by use of the mask structure, in which exposure of a photo-sensitive film on a substrate to an exposure beam through the mask structure is repeated two or more times with a relative position between the mask structure and the substrate being changed.
Inventors
- 👤 Ryo Imura
- 👤 Yoshinori Hoshina
- 👤 Kengo Asai
- 👤 Mitsutaka Hikita
- 👤 Atsushi Isobe
- 👤 Ryo Suzuki
- 👤 Kohji Oda
- 👤 Kazuyuki Sakiyama
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 19:12
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70425; G03F7/70466; G03F1/00; G03F1/26; G03F1/30; G03F1/50; G03F7/20; G03F7/2002
Claims Analysis
Total Claims: 19
Claim 1
Independent Claim
242 words
A method of manufacturing a device comprising the steps of: preparing a preliminary pattern corresponding to said device which includes a combination of patterns transparent to exposure light and a background area opaque to the exposure light; dividing at least one of said patterns into first and second area portions; forming a first device pattern which includes a plurality of transparent pattern segments, wherein adjacent transparent pattern segments are separated by opaque material, at least one of said transparent pattern segments in said first device pattern is geometrically identical to the first area portion and another transparent pattern segment is geometrically identical to a first pattern not subjected to division; forming a second device pattern which includes a plurality of transparent pattern segments, wherein adjacent transparent pattern segments are separated by opaque material, at least one of said transparent pattern segments in said second device pattern is geometrically identical to the second area portion and another transparent pattern segment is geometrically identical to a second pattern not subjected to division; providing a phase shifter layer for causing a phase shift in said exposure light to one of said adjacent transparent pattern segments in each of said first and second device patterns; preparing a substrate in which to form said device; exposing said substrate to exposure light through one of said first and second device patterns; and exposing said substrate to exposure light through an other of said first and second device patterns.
Claim 2
Independent Claim
242 words
A method of manufacturing a device comprising the steps of: preparing a preliminary pattern corresponding to said device which includes a combination of patterns transparent to exposure light and a background area opaque to the exposure light; dividing at least one of said patterns into first and second area portions; forming a first device pattern which includes a plurality of transparent pattern segments, wherein adjacent transparent pattern segments are separated by opaque material, at least one of said transparent pattern segments in said first device pattern is geometrically identical to the first area portion and another transparent pattern segment is geometrically identical to a first pattern not subjected to division; forming a second device pattern which includes a plurality of transparent pattern segments, wherein adjacent transparent pattern segments are separated by opaque material, at least one of said transparent pattern segments in said second device pattern is geometrically identical to the second area portion and another transparent pattern segment is geometrically identical to a second pattern not subjected to division; providing a phase shifter layer for causing a phase shift in said exposure light to one of said adjacent transparent pattern segments in each of said first and second device patterns; preparing a substrate in which to form said device; exposing said substrate to exposure light through one of said first and second device patterns; and exposing said substrate to exposure light through an other of said first and second device patterns.
Claim 3
Dependent Claim
19 words
The method according to claim 1, wherein said first and second device patterns are formed on separate mask plates.
Claim 4
Dependent Claim
12 words
The method according to claim 1, wherein said phase shift is 180°.
Claim 5
Independent Claim
208 words
A method of manufacturing a mask structure for fabricating an electronic device comprising the steps of: preparing a preliminary pattern corresponding to said device which includes a combination of patterns transparent to exposure light and a background area opaque to the exposure light; dividing at least one of said patterns into first and second area portions; forming a first device pattern which includes a plurality of transparent pattern segments, wherein adjacent transparent pattern segments are separated by opaque material, at least one of said transparent pattern segments in said first device pattern is geometrically identical to the first area portion and another transparent pattern segment is geometrically identical to a first pattern not subjected to division; forming a second device pattern which includes a plurality of transparent pattern segments, wherein adjacent transparent pattern segments are separated by opaque material, at least one of said transparent pattern segments in said second device pattern is geometrically identical to said second area portion and another transparent pattern segment is geometrically identical to a second pattern not subjected to division; and providing a phase shifter layer for causing a phase shift in said exposure light to one of said adjacent transparent pattern segments in each of said first and second device patterns.
Claim 6
Independent Claim
208 words
A method of manufacturing a mask structure for fabricating an electronic device comprising the steps of: preparing a preliminary pattern corresponding to said device which includes a combination of patterns transparent to exposure light and a background area opaque to the exposure light; dividing at least one of said patterns into first and second area portions; forming a first device pattern which includes a plurality of transparent pattern segments, wherein adjacent transparent pattern segments are separated by opaque material, at least one of said transparent pattern segments in said first device pattern is geometrically identical to the first area portion and another transparent pattern segment is geometrically identical to a first pattern not subjected to division; forming a second device pattern which includes a plurality of transparent pattern segments, wherein adjacent transparent pattern segments are separated by opaque material, at least one of said transparent pattern segments in said second device pattern is geometrically identical to said second area portion and another transparent pattern segment is geometrically identical to a second pattern not subjected to division; and providing a phase shifter layer for causing a phase shift in said exposure light to one of said adjacent transparent pattern segments in each of said first and second device patterns.
Claim 7
Dependent Claim
12 words
The method according to claim 4, wherein said phase shift is 180°.
Claim 8
Independent Claim
201 words
A method of manufacturing a mask structure for fabricating an electronic device comprising the steps of: preparing a preliminary pattern corresponding to said electronic device which includes a combination of a first pattern area assumed to be transparent to exposure light and a second pattern area assumed to be opaque to the exposure light; dividing said first pattern area into a first group of area portions and a second group of area portions; forming a first device pattern which includes a plurality of transparent pattern segments, wherein two adjacent transparent pattern segments are separated by an opaque material and each of said transparent pattern segments in said first device pattern is geometrically identical to one area portion of said first group; forming a second device pattern which includes a plurality of transparent pattern segments, wherein two adjacent transparent pattern segments are separated by an opaque material and each of said transparent pattern segments in said second device pattern is geometrically identical to one area portion of said second group; and providing a phase shifter layer for causing a phase shift in said exposure light to one of said adjacent transparent pattern segments in each of said first and second device patterns.
Claim 9
Independent Claim
201 words
A method of manufacturing a mask structure for fabricating an electronic device comprising the steps of: preparing a preliminary pattern corresponding to said electronic device which includes a combination of a first pattern area assumed to be transparent to exposure light and a second pattern area assumed to be opaque to the exposure light; dividing said first pattern area into a first group of area portions and a second group of area portions; forming a first device pattern which includes a plurality of transparent pattern segments, wherein two adjacent transparent pattern segments are separated by an opaque material and each of said transparent pattern segments in said first device pattern is geometrically identical to one area portion of said first group; forming a second device pattern which includes a plurality of transparent pattern segments, wherein two adjacent transparent pattern segments are separated by an opaque material and each of said transparent pattern segments in said second device pattern is geometrically identical to one area portion of said second group; and providing a phase shifter layer for causing a phase shift in said exposure light to one of said adjacent transparent pattern segments in each of said first and second device patterns.
Claim 10
Dependent Claim
12 words
The method according to claim 6, wherein said phase shift is 180°.
Claim 11
Dependent Claim
19 words
The method according to claim 6, wherein said first and second device patterns are formed on separate mask plates.
Claim 12
Independent Claim
150 words
A method of manufacturing an electronic device comprising the steps of: preparing a preliminary pattern corresponding to said device which includes a combination of a pattern transparent to exposure light and a background area opaque to the light; dividing said pattern into n area portions where n is an integer not smaller than 2; forming n groups of identical device patterns, wherein each device pattern in one device pattern group has transparent pattern segments separated by an opaque material and one transparent pattern segment identical to one of said area portions; providing at least one of an adjacent pair of said transparent pattern segments separated by an opaque material in each device pattern, with a phase shifting layer for causing a phase shift in said exposure light; preparing a substrate in which to form said device; and exposing said substrate to light passing through the n groups of device patterns.
Claim 13
Independent Claim
150 words
A method of manufacturing an electronic device comprising the steps of: preparing a preliminary pattern corresponding to said device which includes a combination of a pattern transparent to exposure light and a background area opaque to the light; dividing said pattern into n area portions where n is an integer not smaller than 2; forming n groups of identical device patterns, wherein each device pattern in one device pattern group has transparent pattern segments separated by an opaque material and one transparent pattern segment identical to one of said area portions; providing at least one of an adjacent pair of said transparent pattern segments separated by an opaque material in each device pattern, with a phase shifting layer for causing a phase shift in said exposure light; preparing a substrate in which to form said device; and exposing said substrate to light passing through the n groups of device patterns.
Claim 14
Dependent Claim
12 words
The method according to claim 9, wherein said phase shift is 180°.
Claim 15
Independent Claim
136 words
A method of manufacturing a mask structure for fabrication of a device, comprising the steps of: preparing a preliminary pattern corresponding to said device which includes a combination of at least one pattern transparent to exposure light and a background opaque to the exposure light; dividing said pattern into n area portions where n is an integer not smaller than 2; forming n groups of identical device patterns, wherein each of said device pattern in one device pattern group has transparent pattern segments separated by an opaque material and one transparent pattern segment geometrically identical to one area portion; and providing at least one of an adjacent pair of said transparent pattern segments separated by an opaque material in each device pattern, with a phase shifting layer for causing a phase shift in said exposure light.
Claim 16
Independent Claim
136 words
A method of manufacturing a mask structure for fabrication of a device, comprising the steps of: preparing a preliminary pattern corresponding to said device which includes a combination of at least one pattern transparent to exposure light and a background opaque to the exposure light; dividing said pattern into n area portions where n is an integer not smaller than 2; forming n groups of identical device patterns, wherein each of said device pattern in one device pattern group has transparent pattern segments separated by an opaque material and one transparent pattern segment geometrically identical to one area portion; and providing at least one of an adjacent pair of said transparent pattern segments separated by an opaque material in each device pattern, with a phase shifting layer for causing a phase shift in said exposure light.
Claim 17
Dependent Claim
12 words
The method according to claim 11, wherein said phase shift is 180°.
Claim 18
Independent Claim
189 words
A method of manufacturing an electronic device comprising the steps of: preparing a preliminary pattern corresponding to said electronic device which includes a combination of pattern areas and background areas; dividing at least one of pattern areas into first and second half area portions; separating an undivided pattern area into first and second groups of undivided pattern areas; forming a first device pattern which comprises pattern segments corresponding to the first group of undivided pattern areas and the first half area portion, the pattern segments being separated by an opaque pattern area; forming a second device pattern which comprises pattern segments corresponding to the second group of undivided pattern areas and the second half area portion, the pattern segments being separated by another opaque pattern area; providing a phase shifting layer for causing a phase shift in said exposure light to one of the pattern segments in each of said first and second device patterns; preparing a substrate upon which to form said electronic device; exposing said substrate to exposure light passing through said first device pattern; and exposing said substrate to exposure light passing through said second pattern.
Claim 19
Independent Claim
189 words
A method of manufacturing an electronic device comprising the steps of: preparing a preliminary pattern corresponding to said electronic device which includes a combination of pattern areas and background areas; dividing at least one of pattern areas into first and second half area portions; separating an undivided pattern area into first and second groups of undivided pattern areas; forming a first device pattern which comprises pattern segments corresponding to the first group of undivided pattern areas and the first half area portion, the pattern segments being separated by an opaque pattern area; forming a second device pattern which comprises pattern segments corresponding to the second group of undivided pattern areas and the second half area portion, the pattern segments being separated by another opaque pattern area; providing a phase shifting layer for causing a phase shift in said exposure light to one of the pattern segments in each of said first and second device patterns; preparing a substrate upon which to form said electronic device; exposing said substrate to exposure light passing through said first device pattern; and exposing said substrate to exposure light passing through said second pattern.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2000-02-18 | 2000-08-19 | 2001-02-18 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-02-18 | 2004-08-19 | 2005-02-18 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2008-02-18 | 2008-08-19 | 2009-02-18 | $7700.00 | Window Closed / Lapsed |