US5601957A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Micro devices manufacturing method comprising the use of a second pattern overlying an alignment mark to reduce flattening
Assignee: Nikon Corp
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Filing: 1995-06-01
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Granted: 1997-02-11
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Expires: 2015-06-01
Abstract
Abstract An exposure method according to the present invention includes a first step of forming on a substrate an alignment mark including a concave and convex pattern; a second step of forming a coat over said alignment mark and the other area on said substrate; a third step of flattening said coat; and a fourth step of applying a photosensitive material on said coat flattened by said third step and projecting a mask pattern thereto. The alignment mark is formed by said concave and convex pattern arranged with a pitch which is smaller than the predetermined value between adjacent convex portions having a width of not less than a predetermined value.
Inventors
- 👤 Shinji Mizutani
- 👤 Kazuya Ota
- 👤 Masahiko Yasuda
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 00:48
CPC Classifications
G; G03; G03F; G03F9/00; G03F9/70; G03F9/7073; G03F9/708; H; H10; H10P; H10P76/00; G03F9/7076; G03F9/7084
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
104 words
An exposure method including: a first step of forming on a substrate an alignment mark including a concave and convex pattern, said mark being formed by said concave and convex pattern arranged with a pitch which is smaller than the predetermined value between adjacent convex portions having a width of not less than a predetermined value; a second step of forming a coat over said alignment mark and the other area on said substrate; a third step of flattening said coat; and a fourth step of applying a photosensitive material on said coat flattened by said third step and projecting a mask pattern thereto.
Claim 2
Dependent Claim
104 words
An exposure method including: a first step of forming on a substrate an alignment mark including a concave and convex pattern, said mark being formed by said concave and convex pattern arranged with a pitch which is smaller than the predetermined value between adjacent convex portions having a width of not less than a predetermined value; a second step of forming a coat over said alignment mark and the other area on said substrate; a third step of flattening said coat; and a fourth step of applying a photosensitive material on said coat flattened by said third step and projecting a mask pattern thereto.
Claim 3
Dependent Claim
35 words
An exposure method according to claim 1, wherein the distance between said adjacent convex portions of said alignment mark having a width of not less than a predetermined value is not less than 2 μm.
Claim 4
Dependent Claim
28 words
An exposure method according to claim 1 or 2, wherein the pitch of said concave and convex pattern is not more than the resolution of an alignment sensor.
Claim 5
Dependent Claim
15 words
An exposure method according to claim 3, wherein said concave and convex pattern is regular.
Claim 6
Dependent Claim
15 words
An exposure method according to claim 3, wherein said concave and convex pattern is irregular.
Claim 7
Dependent Claim
53 words
An exposure method including steps of: forming a plurality of first patterns having a height with a predetermined interval on a predetermined surface of a substrate as an alignment mark; and forming a plurality of second patterns having a height with an interval of less than said predetermined interval between adjacent first patterns.
Claim 8
Dependent Claim
53 words
An exposure method including steps of: forming a plurality of first patterns having a height with a predetermined interval on a predetermined surface of a substrate as an alignment mark; and forming a plurality of second patterns having a height with an interval of less than said predetermined interval between adjacent first patterns.
Claim 9
Dependent Claim
32 words
An exposure method according to claim 6 further including steps of: forming a film on the substrate on which said alignment mark has been formed; and flattening the surface of the film.
Claim 10
Dependent Claim
33 words
An exposure method according to claim 7 further including steps of: detecting said alignment mark on the substrate through said film and aligning said substrate; and transferring a circuit pattern onto said substrate.
Claim 11
Dependent Claim
49 words
An exposure method according to claim 6, further including a step of optically detecting said alignment mark by means of a mark detecting system to align the substrate, wherein the distance between each of a plurality of said second pattern is less than resolution of said mark detecting system.
Claim 12
Dependent Claim
44 words
An exposure method including a step of forming, between a plurality of first patterns which constitute an alignment mark on a predetermined surface on a substrate and has a height, second patterns so as to reduce depression in a film covering the alignment mark.
Claim 13
Dependent Claim
44 words
An exposure method including a step of forming, between a plurality of first patterns which constitute an alignment mark on a predetermined surface on a substrate and has a height, second patterns so as to reduce depression in a film covering the alignment mark.
References Cited (Backward Citations)
US5334466A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2000-02-11 | 2000-08-12 | 2001-02-11 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2004-02-11 | 2004-08-12 | 2005-02-11 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2008-02-11 | 2008-08-12 | 2009-02-11 | $7700.00 | Window Closed / Lapsed |