Radiation curable compositions containing vinyl ether functional polyorganosiloxanes

Claim 1

A curable coating composition comprising: (A) a siloxane compound having the general formula: ##STR9## wherein R is a monovalent hydrocarbon radical or halohydrocarbon radical having from 1 to 20 carbon atoms, R 1 is selected from the group consisting of monovalent hydrocarbon or halohydrocarbon radicals having from 1 to 8 carbon atoms and a group having its formula selected from the group consisting of (i) --R 2 OCH═CH 2 and (ii) --R 2 Si(OR 2 OCH═CH 2 ) 3-c R c wherein R 2 is a divalent hydrocarbon or halohydrocarbon radical having from 1 to 20 carbon atoms, c has a value of 0 to 2, R is as defined above, w has a mole percent of from greater than 0 to 100, x has a mole percent of from 0 to less than 100, y has a mole percent of from 0 to less than 100, z has a mole percent of from 0 to less than 100, a is an integer of from 0 to 3, b is an integer of from 0 to 2, the sum of w+x+y+z being equal to 100 mole percent, with the proviso that at least one .tbd.SiOR 2 OCH═CH 2 group or .tbd.SiOR 2 Si(OR 2 OCH═CH 2 ) 3-c R c group exists in each compound; and (B) a photoinitiator having its general formula selected from: R.sup.i.sub.a ArI.sup.+ ArR.sup.ii.sub.b X.sup.- or R.sup.iii.sub.a Ar--I.sup.+ --Ar--R.sup.iv.sub.b --O.sub.3 S--Ar--R.sup.iii.sub.a Y.sup.- wherein R i is selected from monovalent hydrocarbon or halohydrocarbon radicals free of aliphatic unsaturation having from 1 to 40 carbon atoms, halogen atoms, a radical selected from NO 2 , CN, COOH, SO 3 H, or alkoxy radicals, hydrocarbon groups substituted with nitro groups, nitrile groups, carboxylic acid groups, sulfonic acid groups, or alkoxy groups, R ii is selected from monovalent hydrocarbon radicals free of aliphatic unsaturation and having from 1 to 40 carbon atoms, hydrocarbon groups substituted with alkoxy groups, arylalkoxy radicals, aryloxy radicals, or halogen atoms, each R iii is independently selected from monovalent hydrocarbon or halohydrocarbon radicals free of aliphatic unsaturation and having from 1 to 20 carbon atoms, halogen atoms, a radical selected from NO 2 , CN, COOH, SO 3 H, or alkoxy radicals, hydrocarbon groups substituted with nitro groups, nitrile groups, carboxylic acid groups, sulfonic acid groups, or alkoxy groups, R iv is selected from alkoxy radicals or aryloxy radicals, Ar denotes arene radicals having from 6 to 40 carbon atoms, a has a value of from 0 to 10, b has value of from 0 to 10, X - is an anion selected from the group consisting of perfluoroalkylsulfonic acid anions, tetrahaloboronic acid anions, tetrakis(perfluoroaryl)boronic acid anions, and tetrakisperfluoroalkylsulfonatoboronic acid anions, and Y - is an aryl sulfonate anion.