US5585148A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process for forming a deposited film using a light transmissive perforated diffusion plate
Assignee: Canon Inc
•
Filing: 1995-04-06
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Granted: 1996-12-17
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Expires: 2015-04-06
Abstract
Abstract A process for forming a deposited film on a substrate including generating a plasma in a plasma generating chamber via a light transmissive perforated diffusion plate which is located adjacent to a reaction chamber containing the substrate. The plasma thereby excites a gas, which is introduced into the reaction chamber through the light-transmissive perforated diffusion plate. A gaseous starting material for forming the deposited film is introduced into the reaction chamber and reacts with the excited gas. A deposited film is formed on the substrate while irradiating the substrate with a light scattered by the light-transmissive perforated diffusion plate.
Inventors
- 👤 Nobumasa Suzuki
- 👤 Senichi Hayashi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 02:35
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/455; C23C16/45563; C23C16/45565; C23C16/48; C23C16/482; C23C16/50; C23C16/517
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
121 words
A process for forming a deposited film which comprises the steps of: generating a plasma in a plasma generating chamber provided via a light-transmissive perforated diffusion plate adjacent to a reaction chamber having a substrate arranged therein on which the deposited film is to be formed, thereby exciting a gas; introducing the gas excited in the plasma generating chamber through the light-transmissive perforated diffusion plate into the reaction chamber; introducing a gaseous starting material for forming the deposited film into the reaction chamber so that the excited gas reacts with the gaseous starting material; and forming the deposited film on the substrate arranged in the reaction chamber while irradiating the substrate with a light scattered by the light-transmissive perforated diffusion plate.
Claim 2
Dependent Claim
121 words
A process for forming a deposited film which comprises the steps of: generating a plasma in a plasma generating chamber provided via a light-transmissive perforated diffusion plate adjacent to a reaction chamber having a substrate arranged therein on which the deposited film is to be formed, thereby exciting a gas; introducing the gas excited in the plasma generating chamber through the light-transmissive perforated diffusion plate into the reaction chamber; introducing a gaseous starting material for forming the deposited film into the reaction chamber so that the excited gas reacts with the gaseous starting material; and forming the deposited film on the substrate arranged in the reaction chamber while irradiating the substrate with a light scattered by the light-transmissive perforated diffusion plate.
Claim 3
Dependent Claim
50 words
The process according to claim 1, wherein the gas to be excited by the plasma is an oxidizing gas and the gaseous starting material is a silanol having at least one hydroxyl group bonded to a silicon atom and the film deposited on the substrate is a SiO 2 film.
Claim 4
Dependent Claim
21 words
The process according to claim 1, wherein the light with which the substrate is irradiated is ultraviolet light or visible light.
Claim 5
Dependent Claim
29 words
The process according to claim 2, wherein the gas is at least one gas selected from the group consisting of O 2 , O 3 and N 2 O.
Claim 6
Dependent Claim
41 words
The process for forming a deposited film according to claim 2, wherein the process comprises a step of forming the silanol to be used in the reaction step by reaction of an organic silane with water prior to the reaction step.
Claim 7
Dependent Claim
41 words
The process for forming a deposited film according to claim 2, wherein the process comprises a step of forming the silanol to be used in the reaction step by reaction of an inorganic silane with water prior to the reaction step.
Claim 8
Dependent Claim
18 words
The process according to claim 2, wherein the substrate is irradiated with a ultraviolet light or visible light.
References Cited (Backward Citations)
JPS60130126A
Cited
US4715318A
Cited
JPS61196542A
Cited
JPS62206823A
Cited
JPH02122077A
Cited
US4989544A
Cited
JPH03268320A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1999-12-17 | 2000-06-17 | 2000-12-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2003-12-17 | 2004-06-17 | 2004-12-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2007-12-17 | 2008-06-17 | 2008-12-17 | $7700.00 | Window Closed / Lapsed |