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US5583879A Expired / Lapsed US ⏱️ 0.0 years remaining

Gallum nitride group compound semiconductor laser diode

Assignee: RESEARCH DEVELOPMENT
•
Filing: 1995-04-19
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Granted: 1996-12-10
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Expires: 2015-04-19
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Abstract

Abstract A gallium nitride group compound semiconductor laser diode (10) satisfying the formula (Al x Ga 1-x ) y In 1-y N, inclusive of 0≦x≦1 and 0≦y≦1 comprises by a double hetero-junction structure sandwiching an active layer (5) between layers (4, 6) having wider band gaps than the active layer (5). The active layer (5) may comprise magnesium (Mg) doped p-type conductive gallium nitride group compound semiconductor satisfying the formula (Al x Ga 1-x ) y In 1-y N, inclusive of 0≦x≦1 and 0≦y≦1 . In another embodiment, the active layer (5) is doped with silicon (Si).

Inventors

  • 👤 Shiro Yamazaki
  • 👤 Norikatsu Koide
  • 👤 Katsuhide Manabe
  • 👤 Isamu Akasaki
  • 👤 Hiroshi Amano

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-27 21:15
CPC Classifications
H; H01; H01S; H01S5/00; H01S5/30; H01S5/32; H01S5/323; H01S5/32308; H01S5/32341; H01S5/305; H01S5/3086

Claims Analysis

Total Claims: 9
Claim 1
Independent Claim 76 words
A gallium nitride group compound semiconductor laser diode satisfying the formula (Al x Ga 1-x ) y In 1-y N, inclusive of 0≦X≦1 and 0≦y≦1 comprising: a double hetero-junction structure sandwiching an active layer between layers having wider band gaps than said active layer wherein said active layer comprises a magnesium (Mg)-doped p-type conductive gallium nitride group compound semiconductor satisfying the formula (Al x Ga 1-x ) y In 1-y N, inclusive of 0≦X≦1 and 0≦y≦1.
Claim 2
Dependent Claim 76 words
A gallium nitride group compound semiconductor laser diode satisfying the formula (Al x Ga 1-x ) y In 1-y N, inclusive of 0≦X≦1 and 0≦y≦1 comprising: a double hetero-junction structure sandwiching an active layer between layers having wider band gaps than said active layer wherein said active layer comprises a magnesium (Mg)-doped p-type conductive gallium nitride group compound semiconductor satisfying the formula (Al x Ga 1-x ) y In 1-y N, inclusive of 0≦X≦1 and 0≦y≦1.
Claim 3
Dependent Claim 30 words
The semiconductor laser diode according to claim 1, wherein said active layer is formed over a structure including a substrate, a buffer layer, an n + -layer, and an n-layer.
Claim 4
Dependent Claim 39 words
The semiconductor laser diode according to claim 1, wherein said active layer comprises a layer modified to be a p-type semiconductor by performing one or more of electron irradiation, laser irradiation, and heat treatment on a magnesium (Mg)-doped layer.
Claim 5
Dependent Claim 42 words
The semiconductor laser diode according to claim 1, wherein said active layer comprises a layer modified to be a p-type semiconductor by performing heat treatment to a magnesium (Mg)-doped layer in an atmosphere of nitrogen (N 2 ) under a plasma state.
Claim 6
Dependent Claim 76 words
A gallium nitride group compound semiconductor laser diode satisfying the formula (Al x Ga 1-x ) y In 1-y N, inclusive of 0≦X≦1 and 0≦y≦1 comprising: a double hetero-junction structure sandwiching an active layer between layers having wider band gaps than said active layer wherein said active layer comprises a silicon (Si)-doped n-type conductive gallium nitride group compound semiconductor satisfying the formula (Al x Ga 1-x ) y In 1-y N, inclusive of 0≦X≦1 and 0≦y≦1.
Claim 7
Dependent Claim 76 words
A gallium nitride group compound semiconductor laser diode satisfying the formula (Al x Ga 1-x ) y In 1-y N, inclusive of 0≦X≦1 and 0≦y≦1 comprising: a double hetero-junction structure sandwiching an active layer between layers having wider band gaps than said active layer wherein said active layer comprises a silicon (Si)-doped n-type conductive gallium nitride group compound semiconductor satisfying the formula (Al x Ga 1-x ) y In 1-y N, inclusive of 0≦X≦1 and 0≦y≦1.
Claim 8
Dependent Claim 39 words
The semiconductor laser diode according to claim 5, wherein said active layer comprises a layer modified to be a p-type semiconductor by performing one or more of electron irradiation, laser irradiation and heat treatment on a silicon (Si)-doped layer.
Claim 9
Dependent Claim 42 words
The semiconductor laser diode according to claim 5, wherein said active layer comprises a layer modified to be a p-type semiconductor by performing heat treatment to a silicon (Si)-doped layer in an atmosphere of nitrogen (N 2 ) under a plasma state.

References Cited (Backward Citations)

US4903088A Cited
US5247533A Cited
US5321713A Cited
EP0599224A1 Cited
JPH06268259A Cited
JPH06283825A Cited

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