US5580607A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Coating apparatus and method
Assignee: Tokyo Electron Ltd
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Filing: 1994-01-26
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Granted: 1996-12-03
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Expires: 2014-01-26
Abstract
Abstract A coating apparatus comprises a chuck on which a semiconductor wafer is adhered, a resist liquid supplying system for supplying a resist liquid to the semiconductor wafer, a motor for rotating the semiconductor wafer, thereby spreading the resist liquid over the semiconductor wafer, and a plate, on which the semiconductor wafer is placed, for creating a temperature distribution on the semiconductor wafer.
Inventors
- 👤 Takashi Takekuma
- 👤 Masaaki Murakami
- 👤 Masatoshi Deguchi
- 👤 Akihiro Fujimoto
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 12:12
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/04; H10P72/0451; H10P72/0452; H10P72/0456; B; B05; B05C; B05C11/00; B05C11/02; B05C11/08; B05D; B05D1/00; B05D1/002; B05D1/005; H10P72/0431; H10P72/0434; H10P72/0448
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
117 words
A coating method for coating resist on an object to be coated comprising the steps of: supplying a resist to the object; controlling a vaporizing rate of a solvent of the resist on the object by controlling a temperature distribution of a surface of the object so as to form a resist film of a uniform thickness; and rotating the object to spread the resist over the object; wherein: the temperature distribution is created by placing the object on a plate having a temperature distribution; and the plate comprises a plurality of annular medium supplying paths, and a temperature distribution is created on the plate by supplying medium of different temperatures to the respective medium supplying paths.
Claim 2
Dependent Claim
117 words
A coating method for coating resist on an object to be coated comprising the steps of: supplying a resist to the object; controlling a vaporizing rate of a solvent of the resist on the object by controlling a temperature distribution of a surface of the object so as to form a resist film of a uniform thickness; and rotating the object to spread the resist over the object; wherein: the temperature distribution is created by placing the object on a plate having a temperature distribution; and the plate comprises a plurality of annular medium supplying paths, and a temperature distribution is created on the plate by supplying medium of different temperatures to the respective medium supplying paths.
Claim 3
Dependent Claim
100 words
A coating method for coating development on an object to be coated comprising the steps of: supplying a developer to the object; controlling a developing rate of the object by controlling a temperature distribution of a surface of the object; and rotating the object to spread the developer over the object; wherein; the temperature distribution is created by placing the object on a plate having a temperature distribution; and the plate comprises a plurality of annular medium supplying paths, and a temperature distribution is created on the plate by supplying mediums of different temperatures to the respective medium supplying paths.
Claim 4
Dependent Claim
100 words
A coating method for coating development on an object to be coated comprising the steps of: supplying a developer to the object; controlling a developing rate of the object by controlling a temperature distribution of a surface of the object; and rotating the object to spread the developer over the object; wherein; the temperature distribution is created by placing the object on a plate having a temperature distribution; and the plate comprises a plurality of annular medium supplying paths, and a temperature distribution is created on the plate by supplying mediums of different temperatures to the respective medium supplying paths.
Claim 5
Dependent Claim
32 words
A coating method according to claim 2, wherein said temperature distribution is controlled so that the temperature of a peripheral portion of the object is set higher than a central portion thereof.
Claim 6
Dependent Claim
101 words
A coating method for coating resist or developer on an object to be coated, the method comprising the steps of: supplying a resist or a developer to the object; creating a temperature distribution on the object; and rotating the object to spread the resist or the developer over the object; wherein the temperature distribution on the object is created by placing the object on a plate having a temperature distribution, the plate comprising a plurality of annular medium supplying paths, and a temperature distribution is created on the plate by supplying mediums of different temperatures to the respective medium supplying paths.
Claim 7
Dependent Claim
101 words
A coating method for coating resist or developer on an object to be coated, the method comprising the steps of: supplying a resist or a developer to the object; creating a temperature distribution on the object; and rotating the object to spread the resist or the developer over the object; wherein the temperature distribution on the object is created by placing the object on a plate having a temperature distribution, the plate comprising a plurality of annular medium supplying paths, and a temperature distribution is created on the plate by supplying mediums of different temperatures to the respective medium supplying paths.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1999-12-03 | 2000-06-03 | 2000-12-03 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2003-12-03 | 2004-06-03 | 2004-12-03 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2007-12-03 | 2008-06-03 | 2008-12-03 | $7700.00 | Window Closed / Lapsed |