Ferroelectric memory

Claim 2

A ferroelectric memory comprising: first stripe electrodes; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory-cell including: a ferroelectric thin film electrically connected with one of the first stripe electrodes; a nonlinear resistive thin film layer electrically connected with the ferroelectric thin film and with one of the second stripe electrodes, said nonlinear resistive thin film layer having an odd-numbered multilayer structure, said nonlinear resistive layer having a three-layered structure of respective layers of Bi 2 O 3 /ZnO/Bi 2 O 3 ; and an intermediate electrode formed between the ferroelectric thin film and the nonlinear resistive thin film layer, said intermediate electrode being electrically connected with the ferroelectric thin film and with the nonlinear resistive thin film layer so as to electrically connect the nonlinear resistive thin film layer with the ferroelectric thin film.

Claim 3

The ferroelectric memory according to claim 1, wherein each of said first stripe electrodes includes: a first layer selected from the group consisting of Ni, Cu, Co and Cr; and a second layer made of Pt.

Claim 4

The ferroelectric memory according to claim 1, wherein said intermediate electrode includes: a first layer selected from the group consisting of Ni, Cu, Co and Cr; and a second layer made of Pt.

Claim 5

A ferroelectric memory comprising: first stripe electrodes; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory cell including: a ferroelectric thin film electrically connected with one of the first stripe electrodes; a nonlinear resistive thin film layer electrically connected with the ferroelectric thin film and with one of the second stripe electrodes, said nonlinear resistive thin film layer having an odd-numbered multilayer structure, said nonlinear resistive layer having a three-layered structure of respective layers of ZnO/Bi 2 O 3 /ZnO; and an intermediate electrode formed between the ferroelectric thin film and the nonlinear resistive thin film layer, said intermediate electrode being electrically connected with the ferroelectric thin film and with the nonlinear resistive thin film layer so as to electrically connect the nonlinear resistive thin film layer with the ferroelectric thin film.

Claim 6

A ferroelectric memory comprising: first stripe electrodes; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory cell including: a ferroelectric thin film electrically connected with one of the first stripe electrodes; a nonlinear resistive thin film layer electrically connected with the ferroelectric thin film and with one of the second stripe electrodes, said nonlinear resistive thin film layer having an odd-numbered multilayer structure, said nonlinear resistive layer having a three-layered structure of respective layers of ZnO/Bi 2 O 3 /ZnO; and an intermediate electrode formed between the ferroelectric thin film and the nonlinear resistive thin film layer, said intermediate electrode being electrically connected with the ferroelectric thin film and with the nonlinear resistive thin film layer so as to electrically connect the nonlinear resistive thin film layer with the ferroelectric thin film.

Claim 7

The ferroelectric memory according to claim 4, wherein each of said first stripe electrodes includes: a first layer selected from the group consisting of Ni, Cu, Co and Cr; and a second layer made of Pt.

Claim 8

The ferroelectric memory according to claim 4, wherein said intermediate electrode includes: a first layer selected from the group consisting of Ni, Cu, Co and Cr; and a second layer made of Pt.

Claim 9

A ferroelectric memory comprising: first stripe electrodes; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory cell including: a ferroelectric thin film electrically connected with one of the first stripe electrodes; a nonlinear resistive thin film layer electrically connected with the ferroelectric thin film and with one of the second stripe electrodes, said nonlinear resistive thin film layer having an odd-numbered multilayer structure, said nonlinear resistive layer including layers of Bi 2 O 3 and ZnO which are alternately formed, with a layer of ZnO in a middle of the multilayer structure; and an intermediate electrode formed between the ferroelectric thin film and the nonlinear resistive thin film layer, said intermediate electrode being electrically connected with the ferroelectric thin film and with the nonlinear resistive thin film layer so as to electrically connect the nonlinear resistive thin film layer with the ferroelectric thin film.

Claim 10

A ferroelectric memory comprising: first stripe electrodes; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory cell including: a ferroelectric thin film electrically connected with one of the first stripe electrodes; a nonlinear resistive thin film layer electrically connected with the ferroelectric thin film and with one of the second stripe electrodes, said nonlinear resistive thin film layer having an odd-numbered multilayer structure, said nonlinear resistive layer including layers of Bi 2 O 3 and ZnO which are alternately formed, with a layer of ZnO in a middle of the multilayer structure; and an intermediate electrode formed between the ferroelectric thin film and the nonlinear resistive thin film layer, said intermediate electrode being electrically connected with the ferroelectric thin film and with the nonlinear resistive thin film layer so as to electrically connect the nonlinear resistive thin film layer with the ferroelectric thin film.

Claim 11

The ferroelectric memory according to claim 7, wherein each of said first stripe electrodes includes: a first layer selected from the group consisting of Ni, Cu, Co and Cr; and a second layer made of Pt.

Claim 12

The ferroelectric memory according to claim 7, wherein said intermediate electrode includes: a first layer selected from the group consisting of Ni, Cu, Co and Cr; and a second layer made of Pt.

Claim 13

A ferroelectric memory comprising: first stripe electrodes; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory cell including: a ferroelectric thin film electrically connected with one of the first stripe electrodes; a nonlinear resistive thin film layer electrically connected with the ferroelectric thin film and with one of the second stripe electrodes, said nonlinear resistive thin film layer having an odd-numbered multilayer structure, said nonlinear resistive layer including layers of ZnO and Bi 2 O 3 which are alternately formed, with a layer of Bi 2 O 3 in a middle of the multilayer structure, and an intermediate electrode formed between the ferroelectric thin film and the nonlinear resistive thin film layer, said intermediate electrode being electrically connected with the ferroelectric thin film and with the nonlinear resistive thin film layer so as to electrically connect the nonlinear resistive thin film layer with the ferroelectric thin film.

Claim 14

A ferroelectric memory comprising: first stripe electrodes; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory cell including: a ferroelectric thin film electrically connected with one of the first stripe electrodes; a nonlinear resistive thin film layer electrically connected with the ferroelectric thin film and with one of the second stripe electrodes, said nonlinear resistive thin film layer having an odd-numbered multilayer structure, said nonlinear resistive layer including layers of ZnO and Bi 2 O 3 which are alternately formed, with a layer of Bi 2 O 3 in a middle of the multilayer structure, and an intermediate electrode formed between the ferroelectric thin film and the nonlinear resistive thin film layer, said intermediate electrode being electrically connected with the ferroelectric thin film and with the nonlinear resistive thin film layer so as to electrically connect the nonlinear resistive thin film layer with the ferroelectric thin film.

Claim 15

The ferroelectric memory according to claim 10, wherein each of said first stripe electrodes includes: a first layer selected from the group consisting of Ni, Cu, Co and Cr; and a second layer made of Pt.

Claim 16

The ferroelectric memory according to claim 10, wherein said intermediate electrode includes: a first layer selected from the group consisting of Ni, Cu, Co and Cr; and a second layer made of Pt.

Claim 17

A ferroelectric memory comprising: first stripe electrodes; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory cell including: a ferroelectric thin film electrically connected with one of the first stripe electrodes; a nonlinear resistive thin film layer electrically connected with the ferroelectric thin film and with one of the second stripe electrodes, said nonlinear resistive layer includes a polycrystalline thin film having a composition including strontium titanate (SrTiO 3 ) as a main ingredient and an additive for generating a donor; and an intermediate electrode formed between the ferroelectric thin film and the nonlinear resistive thin film layer, said intermediate electrode being electrically connected with the ferroelectric thin film and the nonlinear resistive thin film layer so as to electrically connect the nonlinear resistive thin film layer with the ferroelectric thin film.

Claim 18

A ferroelectric memory comprising: first stripe electrodes; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory cell including: a ferroelectric thin film electrically connected with one of the first stripe electrodes; a nonlinear resistive thin film layer electrically connected with the ferroelectric thin film and with one of the second stripe electrodes, said nonlinear resistive layer includes a polycrystalline thin film having a composition including strontium titanate (SrTiO 3 ) as a main ingredient and an additive for generating a donor; and an intermediate electrode formed between the ferroelectric thin film and the nonlinear resistive thin film layer, said intermediate electrode being electrically connected with the ferroelectric thin film and the nonlinear resistive thin film layer so as to electrically connect the nonlinear resistive thin film layer with the ferroelectric thin film.

Claim 19

The ferroelectric memory according to claim 13, wherein said polycrystalline thin film has a composition including (Sr 1-x Cax)TiO 3 serving as a main ingredient, which is obtained by substituting Ca for part of Sr of SrTiO 3 .

Claim 20

The ferroelectric memory according to claim 13, further comprising: a semiconductor substrate; an insulation layer formed on the semiconductor substrate; and a buffer layer formed on the insulation layer, and said buffer layer being made of a material selected from the group of consisting of Ti, Cr and Mn; and wherein the first stripe electrodes are formed on the buffer layer.

Claim 21

The ferroelectric memory according to claim 13, wherein each of said first stripe electrodes includes: a first layer selected from the group consisting of Ni, Cu, Co and Cr; and a second layer made of Pt.

Claim 22

The ferroelectric memory according to claim 13, wherein said intermediate electrode includes: a first layer selected from the group consisting of Ni, Cu, Co and Cr; and a second layer made of Pt.

Claim 23

A ferroelectric memory comprising: first stripe electrodes; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory cell including: a ferroelectric thin film electrically connected with one of the first stripe electrodes; a nonlinear resistive thin film layer electrically connected with the ferroelectric thin film and with one of the second stripe electrodes; and an intermediate electrode formed between the ferroelectric thin film and the nonlinear resistive thin film layer, said intermediate electrode being electrically connected with the ferroelectric thin film and the nonlinear resistive thin film layer so as to electrically connect the nonlinear resistive thin film layer with the ferroelectric thin film, a semiconductor substrate; a first insulation film formed on said semiconductor substrate; an upper electrode formed on said nonlinear resistive layer; and a second insulation film formed on a portion of said upper electrode, and wherein: said first stripe electrodes are formed on said first insulation film and extend in a given direction; said ferroelectric thin films are arranged in a matrix, at predetermined intervals, on said first stripe electrodes; said intermediate electrode is formed on the ferroelectric thin film; said nonlinear resistive layer having a nonlinear resistive characteristic and being formed on said intermediate electrode; and said second stripe electrodes are electrically connected to said upper electrode and also have at least a portion thereof arranged on said second insulation film in a striped manner so as to extend in a direction perpendicular to the direction of said first stripe electrodes.

Claim 24

A ferroelectric memory comprising: first stripe electrodes; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory cell including: a ferroelectric thin film electrically connected with one of the first stripe electrodes; a nonlinear resistive thin film layer electrically connected with the ferroelectric thin film and with one of the second stripe electrodes; and an intermediate electrode formed between the ferroelectric thin film and the nonlinear resistive thin film layer, said intermediate electrode being electrically connected with the ferroelectric thin film and the nonlinear resistive thin film layer so as to electrically connect the nonlinear resistive thin film layer with the ferroelectric thin film, a semiconductor substrate; a first insulation film formed on said semiconductor substrate; an upper electrode formed on said nonlinear resistive layer; and a second insulation film formed on a portion of said upper electrode, and wherein: said first stripe electrodes are formed on said first insulation film and extend in a given direction; said ferroelectric thin films are arranged in a matrix, at predetermined intervals, on said first stripe electrodes; said intermediate electrode is formed on the ferroelectric thin film; said nonlinear resistive layer having a nonlinear resistive characteristic and being formed on said intermediate electrode; and said second stripe electrodes are electrically connected to said upper electrode and also have at least a portion thereof arranged on said second insulation film in a striped manner so as to extend in a direction perpendicular to the direction of said first stripe electrodes.

Claim 25

A ferroelectric memory comprising: first stripe electrodes; each of said first stripe electrodes includes: a first layer selected from the group of consisting of Ni, Cu, Co and Cr; and a second layer made of Pt; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory cell including: a ferroelectric thin film electrically connected with one of the first stripe electrodes; a nonlinear resistive thin film layer electrically connected with the ferroelectric thin film and with one of the second stripe electrodes; and an intermediate electrode formed between the ferroelectric thin film and the nonlinear resistive thin film layer, said intermediate electrode being electrically connected with the ferroelectric thin film and the nonlinear resistive thin film layer so as to electrically connect the nonlinear resistive thin film layer with the ferroelectric thin film.

Claim 26

A ferroelectric memory comprising: first stripe electrodes; each of said first stripe electrodes includes: a first layer selected from the group of consisting of Ni, Cu, Co and Cr; and a second layer made of Pt; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory cell including: a ferroelectric thin film electrically connected with one of the first stripe electrodes; a nonlinear resistive thin film layer electrically connected with the ferroelectric thin film and with one of the second stripe electrodes; and an intermediate electrode formed between the ferroelectric thin film and the nonlinear resistive thin film layer, said intermediate electrode being electrically connected with the ferroelectric thin film and the nonlinear resistive thin film layer so as to electrically connect the nonlinear resistive thin film layer with the ferroelectric thin film.

Claim 27

A ferroelectric memory comprising: first stripe electrodes; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory cell including: a ferroelectric thin film electrically connected with one of the first stripe electrodes; a nonlinear resistive thin film layer electrically connected with the ferroelectric thin film and with one of the second stripe electrodes; and an intermediate electrode formed between the ferroelectric thin film and the nonlinear resistive thin film layer, said intermediate electrode being electrically connected with the ferroelectric thin film and the nonlinear resistive thin film layer so as to electrically connect the nonlinear resistive thin film layer with the ferroelectric thin film, said intermediate electrode includes: a first layer selected from the group consisting of Ni, Cu, Co and Cr; and a second layer made of Pt.

Claim 28

A ferroelectric memory comprising: first stripe electrodes; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory cell including: a ferroelectric thin film electrically connected with one of the first stripe electrodes; a nonlinear resistive thin film layer electrically connected with the ferroelectric thin film and with one of the second stripe electrodes; and an intermediate electrode formed between the ferroelectric thin film and the nonlinear resistive thin film layer, said intermediate electrode being electrically connected with the ferroelectric thin film and the nonlinear resistive thin film layer so as to electrically connect the nonlinear resistive thin film layer with the ferroelectric thin film, said intermediate electrode includes: a first layer selected from the group consisting of Ni, Cu, Co and Cr; and a second layer made of Pt.

Claim 29

A ferroelectric memory comprising: first stripe electrodes; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory cell including: a ferroelectric thin film electrically connected with one of the first stripe electrodes; a nonlinear resistive thin film layer electrically connected with the ferroelectric thin film and with one of the second stripe electrodes, said nonlinear resistive layer is made of zinc oxide doped with Bi, Co, Mn, Cr and Sb; and an intermediate electrode formed between the ferroelectric thin film and the nonlinear resistive thin film layer, said intermediate electrode being electrically connected with the ferroelectric thin film and the nonlinear resistive thin film layer so as to electrically connect the nonlinear resistive thin film layer with the ferroelectric thin film.

Claim 30

A ferroelectric memory comprising: first stripe electrodes; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory cell including: a ferroelectric thin film electrically connected with one of the first stripe electrodes; a nonlinear resistive thin film layer electrically connected with the ferroelectric thin film and with one of the second stripe electrodes, said nonlinear resistive layer is made of zinc oxide doped with Bi, Co, Mn, Cr and Sb; and an intermediate electrode formed between the ferroelectric thin film and the nonlinear resistive thin film layer, said intermediate electrode being electrically connected with the ferroelectric thin film and the nonlinear resistive thin film layer so as to electrically connect the nonlinear resistive thin film layer with the ferroelectric thin film.

Claim 31

The ferroelectric memory according to claim 21, wherein each of said first stripe electrodes includes: a first layer selected from the group consisting of Ni, Cu, Co and Cr; and a second layer made of Pt.

Claim 32

The ferroelectric memory according to claim 21, wherein said intermediate electrode includes: a first layer selected from the group consisting of Ni, Cu, Co and Cr; and a second layer made of Pt.

Claim 33

A ferroelectric memory comprising: first stripe electrodes; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory cell including: a ferroelectric thin film electrically connected with one of the first stripe electrodes; and a nonlinear resistive thin film layer electrically connected with the ferroelectric thin film and with one of the second stripe electrodes, said nonlinear resistive thin film layer having an odd-numbered multilayer structure, said nonlinear resistive thin film layer being made of metal oxide and said nonlinear resistive layer having a three-layered structure of respective layers of Bi 2 O 3 /ZnO/Bi 2 O 3 .

Claim 34

A ferroelectric memory comprising: first stripe electrodes; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory cell including: a ferroelectric thin film electrically connected with one of the first stripe electrodes; and a nonlinear resistive thin film layer electrically connected with the ferroelectric thin film and with one of the second stripe electrodes, said nonlinear resistive thin film layer having an odd-numbered multilayer structure, said nonlinear resistive thin film layer being made of metal oxide and said nonlinear resistive layer having a three-layered structure of respective layers of Bi 2 O 3 /ZnO/Bi 2 O 3 .

Claim 35

The ferroelectric memory according to claim 24, wherein each of said first stripe electrodes includes: a first layer selected from the group consisting of Ni, Cu, Co and Cr; and a second layer made of Pt.

Claim 36

A ferroelectric memory comprising: first stripe electrodes; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory cell including: a ferroelectric thin film electrically connected with one of the first stripe electrodes; and a nonlinear resistive thin film layer electrically connected with the ferroelectric thin film and with one of the second stripe electrodes, said nonlinear resistive thin film layer having an odd-numbered multilayer structure, said nonlinear resistive thin film layer being made of metal oxide and said nonlinear resistive layer having a three-layered structure of respective layers of ZnO/Bi 2 O 3 /ZnO.

Claim 37

A ferroelectric memory comprising: first stripe electrodes; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory cell including: a ferroelectric thin film electrically connected with one of the first stripe electrodes; and a nonlinear resistive thin film layer electrically connected with the ferroelectric thin film and with one of the second stripe electrodes, said nonlinear resistive thin film layer having an odd-numbered multilayer structure, said nonlinear resistive thin film layer being made of metal oxide and said nonlinear resistive layer having a three-layered structure of respective layers of ZnO/Bi 2 O 3 /ZnO.

Claim 38

The ferroelectric memory according to claim 26, wherein each of said first stripe electrodes includes: a first layer selected from the group consisting of Ni, Cu, Co and Cr; and a second layer made of Pt.

Claim 39

A ferroelectric memory comprising: first stripe electrodes; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory cell including: a ferroelectric thin film electrically connected with one of the first stripe electrodes; and a nonlinear resistive thin film layer electrically connected with the ferroelectric thin film and with one of the second stripe electrodes, said nonlinear resistive thin film layer having an odd-numbered multilayer structure, said nonlinear resistive thin film layer being made of metal oxide and said nonlinear resistive layer including layers of Bi 2 O 3 and ZnO which are alternately formed, with a layer of ZnO in a middle of the multilayer structure.

Claim 40

A ferroelectric memory comprising: first stripe electrodes; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory cell including: a ferroelectric thin film electrically connected with one of the first stripe electrodes; and a nonlinear resistive thin film layer electrically connected with the ferroelectric thin film and with one of the second stripe electrodes, said nonlinear resistive thin film layer having an odd-numbered multilayer structure, said nonlinear resistive thin film layer being made of metal oxide and said nonlinear resistive layer including layers of Bi 2 O 3 and ZnO which are alternately formed, with a layer of ZnO in a middle of the multilayer structure.

Claim 41

The ferroelectric memory according to claim 28, wherein each of said first stripe electrodes includes: a first layer selected from the group consisting of Ni, Cu, Co and Cr; and a second layer made of Pt.

Claim 42

A ferroelectric memory comprising: first stripe electrodes; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory cell including: a ferroelectric thin film electrically connected with one of the first stripe electrodes; and a nonlinear resistive thin film layer electrically connected with the ferroelectric thin film and with one of the second stripe electrodes, said nonlinear resistive thin film layer having an odd-numbered multilayer structure, said nonlinear resistive thin film layer being made of metal oxide, and said nonlinear resistive layer including layers of ZnO and Bi 2 O 3 which are alternately formed, with a layer of Bi 2 O 3 in a middle of the multilayer structure.

Claim 43

A ferroelectric memory comprising: first stripe electrodes; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory cell including: a ferroelectric thin film electrically connected with one of the first stripe electrodes; and a nonlinear resistive thin film layer electrically connected with the ferroelectric thin film and with one of the second stripe electrodes, said nonlinear resistive thin film layer having an odd-numbered multilayer structure, said nonlinear resistive thin film layer being made of metal oxide, and said nonlinear resistive layer including layers of ZnO and Bi 2 O 3 which are alternately formed, with a layer of Bi 2 O 3 in a middle of the multilayer structure.

Claim 44

The ferroelectric memory according to claim 30, wherein each of said first stripe electrodes includes: a first layer selected from the group consisting of Ni, Cu, Co and Cr; and a second layer made of Pt.

Claim 45

A ferroelectric memory comprising; first stripe electrodes; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory cell including: a ferroelectric thin film electrically connected with one of the first stripe electrodes, and a nonlinear resistive thin film layer electrically connected with the ferroelectric thin film and with one of the second stripe electrodes, said nonlinear resistive thin film layer is made of metal oxide, said nonlinear resistive layer includes a polycrystalline thin film having a composition including strontium titanate (SrTiO 3 ) as a main ingredient.

Claim 46

A ferroelectric memory comprising; first stripe electrodes; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory cell including: a ferroelectric thin film electrically connected with one of the first stripe electrodes, and a nonlinear resistive thin film layer electrically connected with the ferroelectric thin film and with one of the second stripe electrodes, said nonlinear resistive thin film layer is made of metal oxide, said nonlinear resistive layer includes a polycrystalline thin film having a composition including strontium titanate (SrTiO 3 ) as a main ingredient.

Claim 47

The ferroelectric memory according to claim 32, wherein said polycrystalline thin film has a composition including (Sr 1-X Ca x )TiO 3 serving as a main ingredient, which is obtained by substituting Ca for part of Sr of SrTiO 3 .

Claim 48

The ferroelectric memory according to claim 32, further comprising: a semiconductor substrate; an insulation layer formed on the semiconductor substrate; and a buffer layer formed on the insulation layer, and said buffer layer being made of a material selected from the group of consisting of Ti, Cr and Mn; and wherein the first stripe electrodes are formed on the buffer layer.

Claim 49

The ferroelectric memory according to claim 32, wherein each of said first stripe electrodes includes: a first layer selected from the group consisting of Ni, Cu, Co and Cr; and a second layer made of Pt.

Claim 50

A ferroelectric memory comprising: first stripe electrodes; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory cell including: a ferroelectric thin film electrically connected with one of the first stripe electrodes; a nonlinear resistive thin film layer electrically connected with the ferroelectric thin film and with one of the second stripe electrodes, said nonlinear resistive thin film layer being made of metal oxide; and an intermediate electrode disposed between the ferroelectric thin film and the nonlinear resistive thin film layer, said intermediate electrode includes: a first layer selected from the group consisting of Ni, Cu, Co and Cr; and a second layer made of Pt.

Claim 51

A ferroelectric memory comprising: first stripe electrodes; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory cell including: a ferroelectric thin film electrically connected with one of the first stripe electrodes; a nonlinear resistive thin film layer electrically connected with the ferroelectric thin film and with one of the second stripe electrodes, said nonlinear resistive thin film layer being made of metal oxide; and an intermediate electrode disposed between the ferroelectric thin film and the nonlinear resistive thin film layer, said intermediate electrode includes: a first layer selected from the group consisting of Ni, Cu, Co and Cr; and a second layer made of Pt.

Claim 52

A ferroelectric memory comprising: first stripe electrodes; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory cell including: a ferroelectric thin film electrically connected with one of the first stripe electrodes; a nonlinear resistive thin film layer electrically connected with the ferroelectric thin film and with one of the second stripe electrodes, said nonlinear resistive thin film layer being made of metal oxide; a semiconductor substrate; a first insulation film formed on said semiconductor substrate; an upper electrode formed on said nonlinear resistive thin film layer; and a second insulation film formed on a portion of said upper electrode, and wherein, said first stripe electrodes are formed on said first insulation film and extend in a given direction; and wherein said ferroelectric thin films are arranged in a matrix, at predetermined intervals, on said first stripe electrodes; an intermediate electrode is formed on the ferroelectric thin film; and said nonlinear resistive thin film layer having a nonlinear resistive characteristic is formed on said intermediate electrode; and said second stripe electrodes are electrically connected to said upper electrode and also have at least a portion thereof arranged on said second insulation film in a striped manner so as to extend in a direction perpendicular to the direction of said first stripe electrodes.

Claim 53

A ferroelectric memory comprising: first stripe electrodes; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory cell including: a ferroelectric thin film electrically connected with one of the first stripe electrodes; a nonlinear resistive thin film layer electrically connected with the ferroelectric thin film and with one of the second stripe electrodes, said nonlinear resistive thin film layer being made of metal oxide; a semiconductor substrate; a first insulation film formed on said semiconductor substrate; an upper electrode formed on said nonlinear resistive thin film layer; and a second insulation film formed on a portion of said upper electrode, and wherein, said first stripe electrodes are formed on said first insulation film and extend in a given direction; and wherein said ferroelectric thin films are arranged in a matrix, at predetermined intervals, on said first stripe electrodes; an intermediate electrode is formed on the ferroelectric thin film; and said nonlinear resistive thin film layer having a nonlinear resistive characteristic is formed on said intermediate electrode; and said second stripe electrodes are electrically connected to said upper electrode and also have at least a portion thereof arranged on said second insulation film in a striped manner so as to extend in a direction perpendicular to the direction of said first stripe electrodes.

Claim 54

A ferroelectric memory comprising: first stripe electrodes, each of said first stripe electrodes includes: a first layer selected from the group of consisting of Ni, Cu, Co and Cr; and a second layer made of Pt; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory cell including: a ferroelectric thin film electrically connected with one of the first stripe electrodes; and a nonlinear resistive thin film layer electrically connected with the ferroelectric thin film and with one of the second stripe electrodes; said nonlinear resistive thin film layer is made of metal oxide.

Claim 55

A ferroelectric memory comprising: first stripe electrodes, each of said first stripe electrodes includes: a first layer selected from the group of consisting of Ni, Cu, Co and Cr; and a second layer made of Pt; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory cell including: a ferroelectric thin film electrically connected with one of the first stripe electrodes; and a nonlinear resistive thin film layer electrically connected with the ferroelectric thin film and with one of the second stripe electrodes; said nonlinear resistive thin film layer is made of metal oxide.

Claim 56

A ferroelectric memory comprising: first stripe electrodes; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory cell including: a ferroelectric thin film electrically connected with one of the first stripe electrodes; and a nonlinear resistive thin film layer electrically connected with the ferroelectric thin film and with one of the second stripe electrodes, said nonlinear resistive thin film layer is made of metal oxide, said nonlinear resistive layer is made of zinc oxide doped with Bi, Co, Mn, Cr and Sb.

Claim 57

A ferroelectric memory comprising: first stripe electrodes; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory cell including: a ferroelectric thin film electrically connected with one of the first stripe electrodes; and a nonlinear resistive thin film layer electrically connected with the ferroelectric thin film and with one of the second stripe electrodes, said nonlinear resistive thin film layer is made of metal oxide, said nonlinear resistive layer is made of zinc oxide doped with Bi, Co, Mn, Cr and Sb.

Claim 58

The ferroelectric memory according to claim 39, wherein each of said first stripe electrodes includes: a first layer selected from the group consisting of Ni, Cu, Co and Cr; and a second layer made of Pt.

Claim 59

A ferroelectric memory comprising: first stripe electrodes; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; and a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory cell including: a ferroelectric film electrically connected with one of the first stripe electrodes; and a metal oxide nonlinear resistive layer electrically connected with the ferroelectric film and with one of the second stripe electrodes, said nonlinear resistive layer being made of zinc oxide doped with Bi, Co, Mn and Sb.

Claim 60

A ferroelectric memory comprising: first stripe electrodes; second stripe electrodes crossing the first stripe electrodes at a different height level from the first stripe electrodes; and a plurality of memory cells, each of said memory cells being arranged between the first and second stripe electrodes, and each memory cell including: a ferroelectric film electrically connected with one of the first stripe electrodes; and a metal oxide nonlinear resistive layer electrically connected with the ferroelectric film and with one of the second stripe electrodes, said nonlinear resistive layer being made of zinc oxide doped with Bi, Co, Mn and Sb.

Claim 61

The ferroelectric memory according to claim 41, wherein each of said first stripe electrodes includes: a first layer selected from the group consisting of Ni, Cu, Co and Cr; and a second layer made of Pt.

Claim 62

The ferroelectric memory according to claim 41, wherein each memory cell further comprises an intermediate electrode formed between the ferroelectric film and the nonlinear resistive layer, said intermediate electrode being electrically connected with the ferroelectric film and the nonlinear resistive layer so as to electrically connect the nonlinear resistive layer with the ferroelectric film.

Claim 63

The ferroelectric memory according to claim 43, wherein said intermediate electrode includes: a first layer selected from the group consisting of Ni, Cu, Co and Cr; and a second layer made of Pt.