US5571639A
Expired / Lapsed
US
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Computer-aided engineering system for design of sequence arrays and lithographic masks
Assignee: Affymetrix Inc
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Filing: 1994-05-24
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Granted: 1996-11-05
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Expires: 2014-05-24
Abstract
Abstract An improved set of computer tools for forming arrays. According to one aspect of the invention, a computer system (100) is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files (104) to design and/or generate lithographic masks (110).
Inventors
- 👤 Earl A. Hubbell
- 👤 MacDonald S. Morris
- 👤 James L. Winkler
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 03:05
CPC Classifications
B; B82; B82Y; B82Y30/00; B01; B01J; B01J19/00; B01J19/0046; C; C07; C07K; C07K1/00; C07K1/04; C07K1/045; B01J2219/00; B01J2219/00274; B01J2219/00277; B01J2219/00351; B01J2219/00427; B01J2219/00432; B01J2219/00497; B01J2219/00527; B01J2219/00529; B01J2219/00583; B01J2219/00585; B01J2219/0059; B01J2219/00596; B01J2219/00603; B01J2219/00605; B01J2219/00608; B01J2219/00612; B01J2219/00623; B01J2219/00626; B01J2219/00632; B01J2219/00637; B01J2219/00659; B01J2219/0068; B01J2219/00686; B01J2219/00689; B01J2219/00693; B01J2219/00695; B01J2219/00709; B01J2219/00711; B01J2219/00718; B01J2219/0072; B01J2219/00722; C40; C40B; C40B40/00; C40B40/04; C40B40/06; C40B60/00; C40B60/14
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
181 words
A method of forming a lithographic mask comprising the steps of: in a computer system, generating a lithographic mask design file by the steps comprising: (a)(i) inputting sequence information into said computer system, said sequence information defining monomer addition steps in a molecular synthesis wherein each monomer addition step is associated with at least one opening location in a mask design of said lithographic mask; (a)(ii) identifying open locations in said mask design of said lithographic mask and joining said open locations in said mask design of said lithographic mask to form a joined location, said open locations defining flash locations for forming said lithographic mask, said joined location defining a larger flash location for forming said lithographic mask; (a)(iii) outputting said mask design file, said mask design file defining locations for openings in said lithographic mask, wherein at least one flash location in said mask design file corresponds to a joined location; and (b) with a computer-controlled system, forming said lithographic mask according to said mask design file, whereby at least some flash locations on said lithographic mask are connected.
Claim 2
Independent Claim
181 words
A method of forming a lithographic mask comprising the steps of: in a computer system, generating a lithographic mask design file by the steps comprising: (a)(i) inputting sequence information into said computer system, said sequence information defining monomer addition steps in a molecular synthesis wherein each monomer addition step is associated with at least one opening location in a mask design of said lithographic mask; (a)(ii) identifying open locations in said mask design of said lithographic mask and joining said open locations in said mask design of said lithographic mask to form a joined location, said open locations defining flash locations for forming said lithographic mask, said joined location defining a larger flash location for forming said lithographic mask; (a)(iii) outputting said mask design file, said mask design file defining locations for openings in said lithographic mask, wherein at least one flash location in said mask design file corresponds to a joined location; and (b) with a computer-controlled system, forming said lithographic mask according to said mask design file, whereby at least some flash locations on said lithographic mask are connected.
Claim 3
Independent Claim
186 words
A method of forming a lithographic mask comprising the steps of: in a computer system, generating a lithographic mask design file by the steps comprising: (a)(i) inputting sequence information into said computer system, said sequence information defining monomer addition steps in a molecular synthesis wherein each monomer addition step is associated with at least one opening location in a mask design of said lithographic mask; (a)(ii) identifying a first rectangular flash location as an open location in said mask design of said lithographic mask; (a)(iii) evaluating an adjacent rectangular location to determine if said adjacent location is an open location and, if said adjacent location is an open location, connecting it with said first rectangular flash location to form a joined rectangular flash opening; (a)(iv) outputting said mask design file, said mask design file defining locations for openings in said lithographic mask, wherein a flash location in said mask design file corresponds to said joined rectangular flash opening; and (b) with a computer-controlled system, forming said lithographic mask according to said mask design file, whereby at least one flash location on said lithographic mask is connected.
Claim 4
Independent Claim
186 words
A method of forming a lithographic mask comprising the steps of: in a computer system, generating a lithographic mask design file by the steps comprising: (a)(i) inputting sequence information into said computer system, said sequence information defining monomer addition steps in a molecular synthesis wherein each monomer addition step is associated with at least one opening location in a mask design of said lithographic mask; (a)(ii) identifying a first rectangular flash location as an open location in said mask design of said lithographic mask; (a)(iii) evaluating an adjacent rectangular location to determine if said adjacent location is an open location and, if said adjacent location is an open location, connecting it with said first rectangular flash location to form a joined rectangular flash opening; (a)(iv) outputting said mask design file, said mask design file defining locations for openings in said lithographic mask, wherein a flash location in said mask design file corresponds to said joined rectangular flash opening; and (b) with a computer-controlled system, forming said lithographic mask according to said mask design file, whereby at least one flash location on said lithographic mask is connected.
Claim 5
Dependent Claim
38 words
The method as recited in claim 2 further comprising, before step (a)(iii), identifying an adjacent location by repetitively scanning said mask design of said lithographic mask from left to right and bottom to top to identify open locations.
Claim 6
Dependent Claim
27 words
The method as recited in claim 3 wherein said first rectangular flash location is located at a bottom left hand corner of said joined rectangular flash opening.
Claim 7
Dependent Claim
19 words
The method as recited in claim 1 wherein said mask design file is outputted as a pattern generator file.
Claim 8
Dependent Claim
19 words
The method as recited in claim 1 wherein steps (a)(ii)-(a)(iii) are repeated for additional reticles on a single mask.
Claim 9
Dependent Claim
21 words
The method as recited in claim 1 wherein said mask design file comprises mask reticle opening location information and reticle identification.
Claim 10
Independent Claim
228 words
A method of forming a molecule with a lithographic mask comprising the steps of: in a computer system, generating a lithographic mask design file by the steps comprising: (a)(i) inputting sequence information into said computer system, said sequence information defining monomer addition steps in a molecular synthesis wherein each monomer addition step is associated with at least one opening location in a mask design of said lithographic mask; (a)(ii) identifying open locations in said mask design of said lithographic mask and joining said open locations in said mask design of said lithographic mask to form a joined location, said open locations defining flash locations for forming said lithographic mask, said joined location defining a larger flash location for forming said lithographic mask; (a)(iii) outputting said mask design file, said mask design file defining locations for openings in said lithographic mask, wherein at least one flash location in said mask design file corresponds to a joined location; and (b) with a computer-controlled system, forming said lithographic mask according to said mask design file, whereby at least some flash locations on said lithographic mask are connected; (c) exposing a substrate to light through said lithographic mask, said substrate comprising photoremovable protecting groups thereon; and (d) coupling monomeric molecules to said substrate wherein said photoremovable protecting groups are removed by step (c) to form a desired biological molecule on said substrate.
Claim 11
Independent Claim
228 words
A method of forming a molecule with a lithographic mask comprising the steps of: in a computer system, generating a lithographic mask design file by the steps comprising: (a)(i) inputting sequence information into said computer system, said sequence information defining monomer addition steps in a molecular synthesis wherein each monomer addition step is associated with at least one opening location in a mask design of said lithographic mask; (a)(ii) identifying open locations in said mask design of said lithographic mask and joining said open locations in said mask design of said lithographic mask to form a joined location, said open locations defining flash locations for forming said lithographic mask, said joined location defining a larger flash location for forming said lithographic mask; (a)(iii) outputting said mask design file, said mask design file defining locations for openings in said lithographic mask, wherein at least one flash location in said mask design file corresponds to a joined location; and (b) with a computer-controlled system, forming said lithographic mask according to said mask design file, whereby at least some flash locations on said lithographic mask are connected; (c) exposing a substrate to light through said lithographic mask, said substrate comprising photoremovable protecting groups thereon; and (d) coupling monomeric molecules to said substrate wherein said photoremovable protecting groups are removed by step (c) to form a desired biological molecule on said substrate.
Claim 12
Dependent Claim
19 words
The method as recited in claim 1 wherein step (a)(i) further comprises the step of inputting a switch matrix.
Claim 13
Dependent Claim
13 words
The method as recited in claim 8 wherein said monomeric molecules are nucleotides.
References Cited (Backward Citations)
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