US5567647A
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Method for fabricating a gate electrode structure of compound semiconductor device
Assignee: Renesas Electronics Corp
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Filing: 1994-12-06
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Granted: 1996-10-22
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Expires: 2014-12-06
Abstract
Abstract A method for fabricating a gate electrode structure of a semiconductor device includes the steps of forming a refractory metal layer of such as tungsten over a substrate, a nitride layer of such as tungsten nitride on the refractory metal layer, and a low resistance metal layer of such as gold (Au) on the nitride layer, and etching and removing the portions of the refractory metal layer and the nitride layer that are existing outside a predetermined region. In place of the refractory metal layer, the refractory metal compound layer may be used. The nitride layer is formed by introducing a nitrogen gas into a sputtering system where reactive sputtering is carried out. Without sacrificing the reliability of the gate or barrier characteristics, it is possible to reduce the number of process steps otherwise required.
Inventors
- 👤 Kiyoshi Takahashi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 04:33
CPC Classifications
H; H10; H10D; H10D30/00; H10D30/01; H10D30/061; H10D30/0612; H10D64/00; H10D64/01; H10D64/012; H10D64/0124; H10D64/0125
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
135 words
A method for fabricating an electrode of a semiconductor device, the method comprising the steps of: forming one of a refractory metal layer and a refractory metal compound layer over a compound semiconductor substrate in a sputtering system; forming a nitride layer on a surface of one of said refractory metal layer and said refractory metal compound layer by a reactive sputtering process using a nitrogen containing gas introduced into said sputtering system, wherein said nitride layer comprises a nitride of one of said refractory metal and refractory metal compound; selectively forming a metal film on said nitride layer by plating using said nitride layer as an electrode; and removing one of said refractory metal layer and said refractory metal compound layer, and said nitride layer by etching using said metal film as a mask.
Claim 2
Independent Claim
135 words
A method for fabricating an electrode of a semiconductor device, the method comprising the steps of: forming one of a refractory metal layer and a refractory metal compound layer over a compound semiconductor substrate in a sputtering system; forming a nitride layer on a surface of one of said refractory metal layer and said refractory metal compound layer by a reactive sputtering process using a nitrogen containing gas introduced into said sputtering system, wherein said nitride layer comprises a nitride of one of said refractory metal and refractory metal compound; selectively forming a metal film on said nitride layer by plating using said nitride layer as an electrode; and removing one of said refractory metal layer and said refractory metal compound layer, and said nitride layer by etching using said metal film as a mask.
Claim 3
Dependent Claim
24 words
The method for fabricating an electrode of a semiconductor device according to claim 1, in which said refractory metal layer is made of tungsten.
Claim 4
Dependent Claim
24 words
The method for fabricating an electrode of a semiconductor device according to claim 1, in which said nitride layer is made of tungsten nitride.
Claim 5
Dependent Claim
26 words
The method for fabricating an electrode of a semiconductor device according to claim 1, in which said refractory metal compound layer is made of tungsten silicide.
Claim 6
Dependent Claim
23 words
The method for fabricating an electrode of a semiconductor device according to claim 1, in which said metal film is made of gold.
Claim 7
Independent Claim
184 words
A method for fabricating an electrode of a T-shape in cross-section of a semiconductor device, said method comprising the steps of: depositing a silicon oxide film on a compound semiconductor substrate; forming an opening in said silicon oxide film by reactive ion etching using a first photoresist as a mask; forming one of a refractory metal layer and a refractory metal compound layer on an upper resultant surface in a sputtering system; forming a nitride layer on a surface of one of said refractory metal layer and said refractory metal compound layer by a reactive sputtering process using a nitrogen containing gas introduced into said sputtering system, wherein said nitride layer comprises a nitride of one of said refractory metal and refractory metal compound; selectively forming a metal film on said nitride layer using a second photoresist as a mask and by plating using said nitride layer as an electrode; and after a removal of said second photoresist, removing said nitride layer and, one of said refractory metal layer and said refractory metal compound layer by etching using said metal film as a mask.
Claim 8
Independent Claim
184 words
A method for fabricating an electrode of a T-shape in cross-section of a semiconductor device, said method comprising the steps of: depositing a silicon oxide film on a compound semiconductor substrate; forming an opening in said silicon oxide film by reactive ion etching using a first photoresist as a mask; forming one of a refractory metal layer and a refractory metal compound layer on an upper resultant surface in a sputtering system; forming a nitride layer on a surface of one of said refractory metal layer and said refractory metal compound layer by a reactive sputtering process using a nitrogen containing gas introduced into said sputtering system, wherein said nitride layer comprises a nitride of one of said refractory metal and refractory metal compound; selectively forming a metal film on said nitride layer using a second photoresist as a mask and by plating using said nitride layer as an electrode; and after a removal of said second photoresist, removing said nitride layer and, one of said refractory metal layer and said refractory metal compound layer by etching using said metal film as a mask.
Claim 9
Dependent Claim
29 words
The method for fabricating an electrode of a T-shape in cross-section of a semiconductor device according to claim 6, in which said refractory metal layer is made of tungsten.
Claim 10
Dependent Claim
29 words
The method for fabricating an electrode of a T-shape in cross-section of a semiconductor device according to claim 6, in which said nitride layer is made of tungsten nitride.
Claim 11
Dependent Claim
31 words
The method for fabricating an electrode of a T-shape in cross-section of a semiconductor device according to claim 6, in which said refractory metal compound layer is made of tungsten silicide.
Claim 12
Dependent Claim
28 words
The method for fabricating an electrode of a T-shape in cross-section of a semiconductor device according to claim 6, in which said metal film is made of gold.
Claim 13
Dependent Claim
43 words
The method for fabricating an electrode of a semiconductor device according to claim 1 wherein a patterned photoresist is applied to said nitride film before applying said gold layer and wherein said patterned photoresist is removed before said etching of said nitride layer.
References Cited (Backward Citations)
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