Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
121 words
A polishing member disposed on a polishing table, having a foam sheet of soft rubbery elastomer and a laminated polishing cloth; and wherein said foam sheet is a closed-cell foam which is made of natural rubber, synthetic rubber, or thermoplastic elastomer and vested with flexibility by gas in cells thereof and said foam sheet has (1) a thickness in a range of 0.2 to 2 mm, (2) a cell diameter in a range of 0.05 to 1 mm, (3) a cell content (ratio of total volume of cells to total volume of the foam sheet) in a range of 70 to 98%, . . . and (4) a compressive elastic modulus in a range of 10 to 100 g/mm 2 .
Claim 2
Dependent Claim
121 words
A polishing member disposed on a polishing table, having a foam sheet of soft rubbery elastomer and a laminated polishing cloth; and wherein said foam sheet is a closed-cell foam which is made of natural rubber, synthetic rubber, or thermoplastic elastomer and vested with flexibility by gas in cells thereof and said foam sheet has (1) a thickness in a range of 0.2 to 2 mm, (2) a cell diameter in a range of 0.05 to 1 mm, (3) a cell content (ratio of total volume of cells to total volume of the foam sheet) in a range of 70 to 98%, . . . and (4) a compressive elastic modulus in a range of 10 to 100 g/mm 2 .
Claim 3
Dependent Claim
18 words
A polishing member according to claim 1, wherein said polishing cloth is a suede type or velour type.
Claim 4
Dependent Claim
130 words
A polishing member disposed on a polishing table, characterized by having a flexible sheet member of a hard thin sheet interposed between a foam sheet of soft rubbery elastomer and a polishing cloth; and wherein said foam sheet is a closed-cell foam which is made of natural rubber, synthetic rubber, or thermoplastic elastomer and vested with flexibility by gas in cells thereof and said foam sheet has (1) a thickness in a range of 0.2 to 2 mm, (2) a cell diameter in a range of 0.05 to 1 mm, (3) a cell content (ratio of total volume of cells to total volume of the foam sheet) in a range of 70 to 98%, and (4) a compressive elastic modulus in a range of 10 to 100 g/mm 2 .
Claim 5
Dependent Claim
130 words
A polishing member disposed on a polishing table, characterized by having a flexible sheet member of a hard thin sheet interposed between a foam sheet of soft rubbery elastomer and a polishing cloth; and wherein said foam sheet is a closed-cell foam which is made of natural rubber, synthetic rubber, or thermoplastic elastomer and vested with flexibility by gas in cells thereof and said foam sheet has (1) a thickness in a range of 0.2 to 2 mm, (2) a cell diameter in a range of 0.05 to 1 mm, (3) a cell content (ratio of total volume of cells to total volume of the foam sheet) in a range of 70 to 98%, and (4) a compressive elastic modulus in a range of 10 to 100 g/mm 2 .
Claim 6
Dependent Claim
18 words
A polishing member according to claim 3, wherein said polishing cloth is a suede type or velour type.
Claim 7
Dependent Claim
131 words
A wafer polishing apparatus, characterized by having a foam sheet of soft rubbery elastomer superposed fast on the surface of a polishing table and having a polishing cloth laminated on said foam sheet; and wherein said foam sheet is a closed-cell foam which is made of natural rubber, synthetic rubber, or thermoplastic elastomer and vested with flexibility by gas in cells thereof and said foam sheet has (1) a thickness in a range of 0.2 to 2 mm, (2) a cell diameter in a range of 0.05 to 1 mm, (3) a cell content (ratio of the total volume of cells to total volume of the foam sheet) in a range of 70 to 98%, and (4) a compressive elastic modulus in a range of 10 to 100 g/mm 2 .
Claim 8
Dependent Claim
131 words
A wafer polishing apparatus, characterized by having a foam sheet of soft rubbery elastomer superposed fast on the surface of a polishing table and having a polishing cloth laminated on said foam sheet; and wherein said foam sheet is a closed-cell foam which is made of natural rubber, synthetic rubber, or thermoplastic elastomer and vested with flexibility by gas in cells thereof and said foam sheet has (1) a thickness in a range of 0.2 to 2 mm, (2) a cell diameter in a range of 0.05 to 1 mm, (3) a cell content (ratio of the total volume of cells to total volume of the foam sheet) in a range of 70 to 98%, and (4) a compressive elastic modulus in a range of 10 to 100 g/mm 2 .
Claim 9
Dependent Claim
19 words
A wafer polishing apparatus according to claim 5, wherein said polishing cloth is a suede type or velour type.
Claim 10
Dependent Claim
147 words
A wafer polishing apparatus, characterized by having a foam sheet of soft rubbery elastomer superposed fast on the surface of a polishing table, having a flexible sheet member of hard thin sheet laminated on said foam sheet, and having a polishing cloth laminated on said flexible sheet member; and wherein said foam sheet is a closed-cell foam which is made of natural rubber, synthetic rubber, or thermoplastic elastomer and vested with flexibility by gas in cells thereof and said foam sheet has (1) a thickness in a range of 0.2 to 2 mm, (2) a cell diameter in a range of 0.05 to 1 mm, (3) a cell content (ratio of the total volume of cells to total volume of the foam sheet) in a range of 70 to 98%, and (4) a compressive elastic modulus in a range of from 10 to 100 g/mm 2 .
Claim 11
Dependent Claim
147 words
A wafer polishing apparatus, characterized by having a foam sheet of soft rubbery elastomer superposed fast on the surface of a polishing table, having a flexible sheet member of hard thin sheet laminated on said foam sheet, and having a polishing cloth laminated on said flexible sheet member; and wherein said foam sheet is a closed-cell foam which is made of natural rubber, synthetic rubber, or thermoplastic elastomer and vested with flexibility by gas in cells thereof and said foam sheet has (1) a thickness in a range of 0.2 to 2 mm, (2) a cell diameter in a range of 0.05 to 1 mm, (3) a cell content (ratio of the total volume of cells to total volume of the foam sheet) in a range of 70 to 98%, and (4) a compressive elastic modulus in a range of from 10 to 100 g/mm 2 .
Claim 12
Dependent Claim
19 words
A wafer polishing apparatus according to claim 7, wherein said polishing cloth is a suede type or velour type.