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US5554304A Expired / Lapsed US ⏱️ 0.0 years remaining

Process for producing a micromotion mechanical structure

Assignee: Denso Corp
•
Filing: 1995-03-24
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Granted: 1996-09-10
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Expires: 2015-03-24
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Abstract

Abstract In a micromotion mechanical structure, such as a vibration-type sensor or a step motor, comprising at least one fixed electrode and at least one movable electrode which is moved by electrostatic power applied to the fixed electrode, at least one of the electrodes is formed essentially by a single crystal semiconductor material. The single crystal semiconductor material has various merits of uniform mechanical properties, small internal stress, etc. for use in such electrodes. Such structure has been realized by attaching patterned electrode made of the material to another substrate and then removing or thinning the original substrate carrying the patterned electrodes.

Inventors

  • 👤 Kenichiro Suzuki

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-08 18:04
CPC Classifications
B; B81; B81B; B81B3/00; B81B3/0018; B81B3/0021; H; H02; H02N; H02N1/00; H02N1/002; H02N1/004; H02N1/006; H02N1/008; B81B2201/00; B81B2201/03; B81B2201/033; B81B2203/00; B81B2203/05; B81B2203/051

Claims Analysis

Total Claims: 9
Claim 1
Independent Claim 108 words
A process for the production of a micromotion mechanical structure comprising at least one fixed electrode and at least one movable electrode which is moved by electrostatic power applied to the fixed electrode; said process comprising the steps of: (a) forming an electrode pattern of at least one of said fixed electrode and said movable electrode on a surface of a semiconductor substrate, (b) attaching the surface of the semiconductor substrate, on which said electrode pattern is formed, to a surface of a different substrate, and (c) separating said electrode pattern from the semiconductor substrate so that the electrode pattern remains on the surface of the different substrate.
Claim 2
Dependent Claim 108 words
A process for the production of a micromotion mechanical structure comprising at least one fixed electrode and at least one movable electrode which is moved by electrostatic power applied to the fixed electrode; said process comprising the steps of: (a) forming an electrode pattern of at least one of said fixed electrode and said movable electrode on a surface of a semiconductor substrate, (b) attaching the surface of the semiconductor substrate, on which said electrode pattern is formed, to a surface of a different substrate, and (c) separating said electrode pattern from the semiconductor substrate so that the electrode pattern remains on the surface of the different substrate.
Claim 3
Dependent Claim 32 words
The process according to claim 1, wherein said electrode pattern is formed in an area of said semiconductor substrate surface where a high concentration of boron is diffused in a silicon substrate.
Claim 4
Dependent Claim 40 words
The process according to claim 1, wherein said electrode pattern is formed in an area of said semiconductor substrate surface where an impurity of a type different from that of an impurity originally contained in the semiconductor substrate is diffused.
Claim 5
Dependent Claim 133 words
A process for the production of a micromotion mechanical structure comprising at least one fixed electrode and at least one movable electrode which is moved by electrostatic power applied to the fixed electrode said process comprising the steps of: (a) forming on a surface of a semiconductor substrate an electrode pattern of at least one of said fixed electrode and said movable electrode and at least one stopper means for limiting the motion of the movable electrode, (b) attaching the surface of the semiconductor substrate, on which said electrode pattern and said stopper means are formed, to a surface of a different substrate, and (c) separating said electrode pattern and stopper means from the semiconductor substrate so that the electrode pattern and the stopper means remain on the surface of the different substrate.
Claim 6
Dependent Claim 133 words
A process for the production of a micromotion mechanical structure comprising at least one fixed electrode and at least one movable electrode which is moved by electrostatic power applied to the fixed electrode said process comprising the steps of: (a) forming on a surface of a semiconductor substrate an electrode pattern of at least one of said fixed electrode and said movable electrode and at least one stopper means for limiting the motion of the movable electrode, (b) attaching the surface of the semiconductor substrate, on which said electrode pattern and said stopper means are formed, to a surface of a different substrate, and (c) separating said electrode pattern and stopper means from the semiconductor substrate so that the electrode pattern and the stopper means remain on the surface of the different substrate.
Claim 7
Dependent Claim 32 words
The process according to claim 4, wherein said electrode pattern is formed in an area of said semiconductor substrate surface where a high concentration of boron is diffused in a silicon substrate.
Claim 8
Dependent Claim 40 words
The process according to claim 4, wherein said electrode pattern is formed in an area of said semiconductor substrate surface where an impurity of a type different from that of an impurity originally contained in the semiconductor substrate is diffused.
Claim 9
Dependent Claim 47 words
The process according to claim 4, wherein stopper means is formed after the electrode pattern is formed by providing trenches on the surface of the semiconductor substrate and the trenches are filled by a semiconductor material, and then, the semiconductor material filled in the trenches is removed.

References Cited (Backward Citations)

US4381672A Cited
US4754185A Cited
US4943750A Cited
US5059556A Cited
US5045152A Cited
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US5055731A Cited
US5015906A Cited
US5043043A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1999-09-10 2000-03-11 2000-09-10 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2003-09-10 2004-03-11 2004-09-10 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2007-09-10 2008-03-11 2008-09-10 $7700.00 Window Closed / Lapsed

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