US5539228A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Field-effect transistor with high breakdown voltage provided by channel recess offset toward drain
Assignee: Raytheon Co
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Filing: 1995-02-07
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Granted: 1996-07-23
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Expires: 2015-02-07
Abstract
Abstract A monolithic-microwave-integrated-circuit (MMIC) metal-semiconductor-field-effect (MESFET) transistor (40) or other type of field-effect transistor has a double-recessed channel region (32,42) with a gate recess (42) formed in a channel recess (32). The channel recess (32) is offset toward the drain (16) as far as possible without shorting the channel recess (32) to the drain (16) to increase the transistor breakdown voltage. The gate recess (42) is offset toward the source (14) as far as possible without causing the gate-source capacitance to increase, thereby reducing the transistor source resistance.
Inventors
- 👤 Tom Y. Chi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 14:09
CPC Classifications
H; H10; H10D; H10D30/00; H10D30/01; H10D30/061; H10D30/0612; H10D30/80; H10D30/87; H10D30/877; H10D64/00; H10D64/01; H10D64/012; H10D64/0124; H10D64/0125
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
210 words
A metal semiconductor field-effect transistor comprising: (a) a semiconductor substrate; (b) a source and a drain each formed in said substrate; (c) a channel region formed in said substrate between said source and said drain; (d) a channel recess formed in said channel region and having a first end closer to said source and a second end closer to said drain, wherein a distance between said second end of said channel recess and said drain is less than a distance between said first end of said channel recess and said source and said distance between said second end of said channel recess and said drain is a predetermined distance having a value below which electrical shorting of said channel recess to said drain would occur; (e) a gate recess formed entirely within said channel recess such that a depth of said gate recess is greater than a depth of said channel recess, said gate recess having a first end closer to said source and a second end closer to said drain wherein a distance between said first end of said gate recess and said source is less than a distance between said second end of said gate recess and said drain; and (f) a gate formed in said gate recess.
Claim 2
Dependent Claim
210 words
A metal semiconductor field-effect transistor comprising: (a) a semiconductor substrate; (b) a source and a drain each formed in said substrate; (c) a channel region formed in said substrate between said source and said drain; (d) a channel recess formed in said channel region and having a first end closer to said source and a second end closer to said drain, wherein a distance between said second end of said channel recess and said drain is less than a distance between said first end of said channel recess and said source and said distance between said second end of said channel recess and said drain is a predetermined distance having a value below which electrical shorting of said channel recess to said drain would occur; (e) a gate recess formed entirely within said channel recess such that a depth of said gate recess is greater than a depth of said channel recess, said gate recess having a first end closer to said source and a second end closer to said drain wherein a distance between said first end of said gate recess and said source is less than a distance between said second end of said gate recess and said drain; and (f) a gate formed in said gate recess.
Claim 3
Dependent Claim
14 words
The metal semiconductor field-effect transistor of claim 1 wherein said substrate comprises gallium arsenide.
Claim 4
Dependent Claim
21 words
A metal semiconductor field effect transistor as in claim 1, in which the gate is substantially centered in the gate recess.
Claim 5
Dependent Claim
43 words
The metal semiconductor field effect transistor as in claim 1, in which a distance between said gate recess and said first end of said channel recess is substantially a predetermined value below which the capacitance between said gate and said source would increase.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1999-07-23 | 2000-01-22 | 2000-07-23 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2003-07-23 | 2004-01-22 | 2004-07-23 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2007-07-23 | 2008-01-22 | 2008-07-23 | $7700.00 | Window Closed / Lapsed |