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US5502668A Expired / Lapsed US ⏱️ 0.0 years remaining

Semiconductor memory device capable of low-voltage programming

Assignee: Rohm Co Ltd
•
Filing: 1994-02-25
•
Granted: 1996-03-26
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Expires: 2014-02-25
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Abstract

Abstract A poly-silicon or amorphous silicon plate having cone-like protrusions is provided on a Si substrate in a tunnel window area such that the edges of the protrusions are placed very close to a floating gate. Alternatively, the top surface of a Si substrate is shaped into protrusions.

Inventors

  • 👤 Noriyuki Shimoji
  • 👤 Hidemi Takasu

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-31 05:10
CPC Classifications
H; H10; H10D; H10D62/00; H10D62/50; H10D62/57; H10D30/00; H10D30/60; H10D30/68; H10D30/681; H10D30/683

Claims Analysis

Total Claims: 11
Claim 1
Independent Claim 85 words
An FET memory comprising: a silicon substrate; a floating gate; a tunnel insulating layer provided between the floating gate and a diffusion region of the silicon substrate on a data line side; and a silicon plate provided on the silicon substrate and having a plurality of adjacent asperities extending into the tunnel insulating layer to produce a localized increase in electric field strength within the tunnel insulating layer, the asperities being placed close to the floating gate to enhance electron injection into the floating gate.
Claim 2
Dependent Claim 85 words
An FET memory comprising: a silicon substrate; a floating gate; a tunnel insulating layer provided between the floating gate and a diffusion region of the silicon substrate on a data line side; and a silicon plate provided on the silicon substrate and having a plurality of adjacent asperities extending into the tunnel insulating layer to produce a localized increase in electric field strength within the tunnel insulating layer, the asperities being placed close to the floating gate to enhance electron injection into the floating gate.
Claim 3
Dependent Claim 14 words
The FET memory of claim 1, wherein the silicon plate is made of poly-silicon.
Claim 4
Dependent Claim 15 words
The FET memory of claim 1, wherein the silicon plate is made of amorphous silicon.
Claim 5
Dependent Claim 14 words
The FET memory of claim 1, wherein each asperity includes at least one protrusion.
Claim 6
Dependent Claim 30 words
The FET memory of claim 1, wherein the silicon plate is disposed in a window formed by removing a part of a gate oxide film formed on the silicon substrate.
Claim 7
Dependent Claim 16 words
The FET memory of claim 1, wherein the FET memory is an electrically erasable programmable ROM.
Claim 8
Dependent Claim 90 words
An FET memory comprising: a silicon substrate; a floating gate; an insulating layer having a tunnel window provided between the floating gate and a diffusion region of the silicon substrate on a data line side; and a surface of the silicon substrate in the diffusion region being formed with a plurality of adjacent asperities to produce a localized increase in electric field strength within the tunnel window, the asperities being placed close to the floating gate and extending into the tunnel window to enhance electron injection into the floating gate.
Claim 9
Dependent Claim 90 words
An FET memory comprising: a silicon substrate; a floating gate; an insulating layer having a tunnel window provided between the floating gate and a diffusion region of the silicon substrate on a data line side; and a surface of the silicon substrate in the diffusion region being formed with a plurality of adjacent asperities to produce a localized increase in electric field strength within the tunnel window, the asperities being placed close to the floating gate and extending into the tunnel window to enhance electron injection into the floating gate.
Claim 10
Dependent Claim 14 words
The FET memory of claim 7, wherein each asperity includes at least one protrusion.
Claim 11
Dependent Claim 16 words
The FET memory of claim 7, wherein the FET memory is an electrically erasable programmable ROM.

References Cited (Backward Citations)

US5017979A Cited
US5063423A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1999-03-26 1999-09-25 2000-03-26 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2003-03-26 2003-09-25 2004-03-26 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2007-03-26 2007-09-25 2008-03-26 $7700.00 Window Closed / Lapsed

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