US5502313A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Exposure apparatus and method having a measuring unit for measuring distances between a mask surface and a projection optical system
Assignee: Nikon Corp
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Filing: 1994-09-12
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Granted: 1996-03-26
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Expires: 2014-09-12
Abstract
Abstract An exposure apparatus includes a projection optical system for projecting a pattern on a mask onto a photosensitive substrate and a measuring unit for measuring distances between the mask and the projection optical system at a plurality of positions within a surface of the mask. The position of the photosensitive substrate with respect to the projection optical system is changed on the basis of a plurality of the distances measured by the measuring unit.
Inventors
- 👤 Osamu Nakamura
- 👤 Masamitsu Yanagihara
- 👤 Hideji Goto
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 14:40
CPC Classifications
G; G03; G03F; G03F9/00; G03F9/70
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
76 words
An exposure apparatus comprising: a projection optical system for projecting a pattern formed on a mask onto a photosensitive substrate; measuring means for measuring distances between said mask and said projection optical system at a plurality of positions within a surface of said mask; and driving means for changing a position of said photosensitive substrate with respect to said projection optical system on the basis of a plurality of the distances measured by said measuring means.
Claim 2
Dependent Claim
76 words
An exposure apparatus comprising: a projection optical system for projecting a pattern formed on a mask onto a photosensitive substrate; measuring means for measuring distances between said mask and said projection optical system at a plurality of positions within a surface of said mask; and driving means for changing a position of said photosensitive substrate with respect to said projection optical system on the basis of a plurality of the distances measured by said measuring means.
Claim 3
Dependent Claim
26 words
An apparatus according to claim 1, wherein said driving means changes a position of said photosensitive substrate along an optical axis of said projection optical system.
Claim 4
Dependent Claim
28 words
An apparatus according to claim 1, wherein said driving means changes an angle of said photosensitive substrate with respect to the optical axis of said projection optical system.
Claim 5
Dependent Claim
59 words
An apparatus according to claim 1, further comprising detecting means for detecting deviations, from a predetermined set value, of the distances measured by said measuring means, and wherein said driving means changes the position of said photosensitive substrate with respect to said projection optical system on the basis of a plurality of the deviations detected by said detecting means.
Claim 6
Dependent Claim
103 words
An apparatus according to claim 1, further comprising mask placing means for integrally holding a plurality of said masks and selectively positioning said plurality of masks with respect to the optical axis of said projection optical system, and wherein said measuring means measure distances between said each selected mask and said projection optical system at a plurality of positions within the surface of said mask, and said driving means changes the position of said photosensitive substrate with respect to the optical axis of said projection optical system for said plurality of masks on the basis of the distances measured by said measuring means.
Claim 7
Dependent Claim
70 words
An exposure method comprising the steps of: locating a mask and a photosensitive substrate at positions conjugate with respect to a projection optical system; measuring distances between said mask and said projection optical system at a plurality of positions within a surface of said mask; and changing the position of said photosensitive substrate with respect to said projection optical system on the basis of a plurality of the measured distances.
Claim 8
Dependent Claim
70 words
An exposure method comprising the steps of: locating a mask and a photosensitive substrate at positions conjugate with respect to a projection optical system; measuring distances between said mask and said projection optical system at a plurality of positions within a surface of said mask; and changing the position of said photosensitive substrate with respect to said projection optical system on the basis of a plurality of the measured distances.
Claim 9
Dependent Claim
27 words
A method according to claim 6, further comprising the step of changing a position of said photosensitive substrate along an optical axis of said projection optical system.
Claim 10
Dependent Claim
29 words
A method according to claim 6, further comprising the step of changing an angle of said photosensitive substrate with respect to an optical axis of said projection optical system.
Claim 11
Dependent Claim
43 words
A method according to claim 6, further comprising the step of obtaining deviations of the measured distances from a predetermined set value, thereby changing the position of said photosensitive substrate with respect to said projection optical system on the basis of the deviations.
Claim 12
Dependent Claim
78 words
An exposure method comprising the steps of: selectively locating a plurality of masks to a position conjugate with a photosensitive substrate through a projection optical system; measuring distances between said selected mask and said projection optical system at a plurality of positions within a surface of said selected mask; and changing the position of said photosensitive substrate with respect to an optical axis of said projection optical system on the basis of a plurality of the measured distances.
Claim 13
Dependent Claim
78 words
An exposure method comprising the steps of: selectively locating a plurality of masks to a position conjugate with a photosensitive substrate through a projection optical system; measuring distances between said selected mask and said projection optical system at a plurality of positions within a surface of said selected mask; and changing the position of said photosensitive substrate with respect to an optical axis of said projection optical system on the basis of a plurality of the measured distances.
References Cited (Backward Citations)
US5166754A
Cited
US5155370A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1999-03-26 | 1999-09-25 | 2000-03-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2003-03-26 | 2003-09-25 | 2004-03-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2007-03-26 | 2007-09-25 | 2008-03-26 | $7700.00 | Window Closed / Lapsed |