US5479727A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Moisture removal and passivation of surfaces
Assignee: Air Products and Chemicals Inc
•
Filing: 1994-10-25
•
Granted: 1996-01-02
•
Expires: 2014-10-25
Abstract
Abstract The present invention is a process of removal of moisture from surfaces, such as metal conduit for transmission of high purity gases in electronic component fabrication facilities, and the passivation of such metal surfaces to retard the readsorption of moisture, wherein the moisture removal and passivation is enhanced using an agent of the formula: RaSiXbYcZd where a =1-3; b, c, and d are individually 0-3 and a+b+c+d=4; R is one or more organic groups; and at least one of X, Y or Z have a bond to silicon that is readily hydrolyzable. The moisture removal and passivation is conducted at less than 65 DEG C. and at least ambient pressure.
Inventors
- 👤 Stephen M. Fine
- 👤 Andrew D. Johnson
- 👤 John G. Langan
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 19:38
CPC Classifications
F; F26; F26B; F26B21/00; F26B21/40
Claims Analysis
Total Claims: 17
Claim 1
Independent Claim
126 words
A process for moisture removal and moisture passivation of a surface on which moisture is absorbed comprising contacting said surface with a flow of a carrier gas at a pressure of at least approximately 14.7 psia containing a drying reagent to remove absorbed moisture from said surface and passivate said surface to retard the readsorption of moisture, wherein said drying reagent is a composition of the formula: R a SiX b Y c Z d where a=1-3; b, c, and d are individually 0-3 and a+b+c+d=4; R is one or more organic groups; and X, Y and Z are individually hydrogen, halogen, alkoxy, amine or --N(H)Si(R 3 ), but at least one of X, Y or Z have a bond to silicon that is readily hydrolyzable.
Claim 2
Dependent Claim
126 words
A process for moisture removal and moisture passivation of a surface on which moisture is absorbed comprising contacting said surface with a flow of a carrier gas at a pressure of at least approximately 14.7 psia containing a drying reagent to remove absorbed moisture from said surface and passivate said surface to retard the readsorption of moisture, wherein said drying reagent is a composition of the formula: R a SiX b Y c Z d where a=1-3; b, c, and d are individually 0-3 and a+b+c+d=4; R is one or more organic groups; and X, Y and Z are individually hydrogen, halogen, alkoxy, amine or --N(H)Si(R 3 ), but at least one of X, Y or Z have a bond to silicon that is readily hydrolyzable.
Claim 3
Dependent Claim
38 words
The process of claim 1 wherein said organic groups are selected from the group consisting of alkyl, alkenyl, alkynyl, aryl, alkyl-substituted aryl, alkenyl-substituted aryl, alkynyl-substituted aryl, aryl substituted alkyl-, aryl substituted alkenyl-, aryl substituted alkynyl- and mixtures thereof.
Claim 4
Dependent Claim
46 words
The process of claim 1 wherein said drying reagent is a composition of the formula: R.sub.a SiH.sub.4-a wherein R is alkyl, alkenyl, alkynyl, aryl, alkyl-substituted aryl, alkenyl-substituted aryl, alkynyl-substituted aryl, aryl substituted alkyl-, aryl substituted alkenyl-, aryl substituted alkynyl- or mixtures thereof, and a is 1-3.
Claim 5
Dependent Claim
20 words
The process of claim 3 wherein R is methyl, ethyl, vinyl, propyl, butyl, pentane, hexyl, cyclohexyl, phenyl, or mixtures thereof.
Claim 6
Dependent Claim
62 words
The process of claim 1 wherein said drying reagent is a composition of the formula: X.sub.a SiH.sub.b R.sub.c wherein R is alkyl, alkenyl, alkynyl, aryl, alkyl-substituted aryl, alkenyl-substituted aryl, alkynyl-substituted aryl, aryl substituted alkyl-, aryl substituted alkenyl-, aryl substituted alkynyl- or mixtures thereof, X is fluorine, bromine, chlorine, iodine or mixtures thereof, and a, b and c are individually 1-2, and a+b+c=4.
Claim 7
Dependent Claim
20 words
The process of claim 5 wherein R is methyl, ethyl, vinyl, propyl, butyl, pentane, hexyl, cyclohexyl, phenyl, or mixtures thereof.
Claim 8
Dependent Claim
48 words
The process of claim 1 wherein said drying reagent is a composition of the formula: R.sub.a Si(OR').sub.4-a wherein R and R' are alkyl, alkenyl, alkynyl, aryl, alkyl-substituted aryl, alkenyl-substituted aryl, alkynyl-substituted aryl, aryl substituted alkyl-, aryl substituted alkenyl-, aryl substituted alkynyl- or mixtures thereof, and a is 1-3.
Claim 9
Dependent Claim
23 words
The process of claim 7 wherein R and R' are independently methyl, ethyl, vinyl, propyl, butyl, pentane, hexyl, cyclohexyl, phenyl, or mixtures thereof.
Claim 10
Dependent Claim
41 words
The process of claim 1 wherein said drying reagent is a composition of the formula: HN(SiR.sub.3).sub.2 wherein R is alkyl, alkenyl, alkynyl, aryl, alkyl-substituted aryl, alkenyl-substituted aryl, alkynyl-substituted aryl, aryl substituted alkyl-, aryl substituted alkenyl-, aryl substituted alkynyl- or mixtures thereof.
Claim 11
Dependent Claim
20 words
The process of claim 9 wherein R is methyl, ethyl, vinyl, propyl, butyl, pentane, hexyl, cyclohexyl, phenyl, or mixtures thereof.
Claim 12
Dependent Claim
28 words
The process of claim 1 wherein said flow of a carrier gas containing a drying reagent contacts said surface at a temperature no greater than approximately 65° C.
Claim 13
Dependent Claim
12 words
The process of claim 1 wherein said surface is a metal surface.
Claim 14
Dependent Claim
11 words
The process of claim 12 wherein said metal surface is steel.
Claim 15
Dependent Claim
21 words
The process of claim 12 wherein said metal surface is an interior of piping of a high purity gas delivery device.
Claim 16
Dependent Claim
161 words
A process for moisture removal and moisture passivation of an interior surface of a high purity gas piping on which moisture is absorbed, comprising: (a) purging said piping with an inert gas which has a moisture content below 0.1% by volume; and (b) contacting said surface at a pressure of at least approximately 14.7 psia and a temperature of less than approximately 65° C. with a flow of a carrier gas containing a drying reagent to remove absorbed moisture from said surface and passivate said surface to retard the readsorption of moisture, wherein said drying reagent is a composition of the formula: R a SiX b Y c Z d where a=1-3; b, c, and d are individually 0-3 and a+b+c+d=4; R is one or more organic groups; and X, Y and Z are individually hydrogen, halogen, alkoxy, amine or --N(H)Si(R 3 ), but at least one of X, Y or Z have a bond to silicon that is readily hydrolyzable.
Claim 17
Dependent Claim
161 words
A process for moisture removal and moisture passivation of an interior surface of a high purity gas piping on which moisture is absorbed, comprising: (a) purging said piping with an inert gas which has a moisture content below 0.1% by volume; and (b) contacting said surface at a pressure of at least approximately 14.7 psia and a temperature of less than approximately 65° C. with a flow of a carrier gas containing a drying reagent to remove absorbed moisture from said surface and passivate said surface to retard the readsorption of moisture, wherein said drying reagent is a composition of the formula: R a SiX b Y c Z d where a=1-3; b, c, and d are individually 0-3 and a+b+c+d=4; R is one or more organic groups; and X, Y and Z are individually hydrogen, halogen, alkoxy, amine or --N(H)Si(R 3 ), but at least one of X, Y or Z have a bond to silicon that is readily hydrolyzable.
References Cited (Backward Citations)
US3307271A
Cited
US3608000A
Cited
US3716384A
Cited
JPH03177299A
Cited
CA2070145A1
Cited
US5255445A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1999-01-01 | 1999-07-03 | 2000-01-02 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2003-01-01 | 2003-07-03 | 2004-01-02 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2007-01-01 | 2007-07-03 | 2008-01-02 | $7700.00 | Window Closed / Lapsed |