US5468520A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process for barrier coating of plastic objects
Assignee: Becton Dickinson and Co
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Filing: 1994-06-24
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Granted: 1995-11-21
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Expires: 2014-06-24
Abstract
Abstract A method for sequentially depositing a silicon oxide based film as a barrier on a substrate. The film is useful for providing an effective barrier against gas permeability in containers and for extending shelf-life of containers, especially plastic evacuated blood collection devices.
Inventors
- 👤 Joel L. Williams
- 👤 Susan L. Burkett
- 👤 Shel McGuire
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 04:31
CPC Classifications
A; A61; A61L; A61L31/00; A61L31/08; A61L31/082; A61L31/088; A61L31/084; C; C23; C23C; C23C14/00; C23C14/02; C23C14/021; C23C14/022; C23C14/22; C23C14/34; C23C14/46; C23C16/00; C23C16/02; C23C16/0254; C23C16/0272; C23C16/22; C23C16/30; C23C16/40; C23C16/401; C23C16/44; C23C16/4401; C23C16/50
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
164 words
A method of sequentially depositing a silicon oxide based film on a plastic substrate in a previously evacuated chamber by glow discharge comprising: (a) introducing a first reactive gas comprising a hydrogen silicide into a first chamber; (b) introducing a second reactive gas comprising at least one gas selected from the group consisting of oxygen and an oxygen containing compound into said first chamber; (c) admitting microwaves into said first chamber; (d) producing a magnetic field in said first chamber, said magnetic field and said microwaves being sufficient to produce a region of electron cyclotron resonance in said first chamber which produces a plasma of both said reactive gases; (e) exposing a substrate to said plasma of both gases in said region, thereby deposition a first coating of SiO x on said substrate; (f) removing or redistributing foreign particles from the surface of said substrate and (g) repeating steps (a) through (e) above, thereby depositing a second coating of SiO x on said substrate.
Claim 2
Independent Claim
164 words
A method of sequentially depositing a silicon oxide based film on a plastic substrate in a previously evacuated chamber by glow discharge comprising: (a) introducing a first reactive gas comprising a hydrogen silicide into a first chamber; (b) introducing a second reactive gas comprising at least one gas selected from the group consisting of oxygen and an oxygen containing compound into said first chamber; (c) admitting microwaves into said first chamber; (d) producing a magnetic field in said first chamber, said magnetic field and said microwaves being sufficient to produce a region of electron cyclotron resonance in said first chamber which produces a plasma of both said reactive gases; (e) exposing a substrate to said plasma of both gases in said region, thereby deposition a first coating of SiO x on said substrate; (f) removing or redistributing foreign particles from the surface of said substrate and (g) repeating steps (a) through (e) above, thereby depositing a second coating of SiO x on said substrate.
Claim 3
Dependent Claim
12 words
The process of claim 1 wherein said substrate is a three-dimensional object.
Claim 4
Dependent Claim
12 words
The process of claim 2 wherein said substrate is blood collection tube.
Claim 5
Dependent Claim
22 words
The process of claim 1 wherein a gaseous monomer selected from the group of silicon hydrocarbons is introduced into the plasma discharge.
Claim 6
Dependent Claim
20 words
The method according to claim 1, wherein said foreign surface particles are removed and/or redistributed with a pressurized gas stream.
Claim 7
Dependent Claim
18 words
The method of claim 5 wherein said pressurized gas stream is nitrogen or argon at about 25 psi.
Claim 8
Dependent Claim
17 words
The method of claim 1, wherein said foreign surface particles are removed and/or redistributed with ultrasonic vibrations.
Claim 9
Dependent Claim
18 words
The method of claim 1, wherein said foreign surface particles are removed and/or redistributed by wiping said substrate.
Claim 10
Dependent Claim
22 words
The method of claim 1, wherein a gaseous monomer selected from the group of silicon hydrocarbons is introduced into the plasma discharge.
References Cited (Backward Citations)
No citation records indexed.
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| 3.5 Years (Year 4) | 1998-11-20 | 1999-05-22 | 1999-11-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-11-20 | 2003-05-22 | 2003-11-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-11-20 | 2007-05-22 | 2007-11-21 | $7700.00 | Window Closed / Lapsed |