Abstract A method is provided for pre-process denudation and process-induced gettering of a CZ silicon wafer having one or more monolithic devices embodied therein. Pre-process denudation is performed in a hydrogen ambient to out-diffuse oxygen as well as to maintain interstitial silicon flux away from the substrate surface. Process-induced gettering is performed at a low temperature to ensure stacking faults and surface irregularities do not arise from interstitial silicon bonding at the surface prior to gate oxidation. The third step of the denudation/gettering cycle involving precipitate growth is thereby delayed or forestalled until the field oxide is grown. Any changes or movement in oxygen and/or interstitial silicon within or near the substrate surface occurring after polysilicon deposition will have minimal effect upon the established gate oxide. Accordingly, gate oxide integrity (e.g., breakdown voltage and uniformity) are enhanced by the present process.
A method for minimizing flux of oxygen atoms and interstitial silicon atoms toward a front side surface of a silicon substrate during and after denudation and before a polysilicon layer is placed upon a gate oxide, said method comprising the steps of: prior to processing a silicon substrate, denuding by heating to a temperature exceeding 1100° C. in the presence of a hydrogen ambient a plurality of oxygen atoms from a surface area within said silicon substrate; prior to placing polysilicon upon said silicon substrate, processing said silicon substrate at temperatures less than 1000° C. (i) to minimize formation of and movement of oxygen atoms and interstitial silicon atoms from the silicon substrate to the surface of the substrate, and (ii) to form a patterned field oxide upon said substrate, MeV implanted well regions underlying spaces between said patterned field oxide and a gate oxide upon the well regions; and depositing polysilicon upon said gate oxide and thereafter continuing processing said silicon substrate at temperatures above 1000° C. to provide gettering sites within said substrate.
Claim 2
Independent Claim
175 words
A method for minimizing flux of oxygen atoms and interstitial silicon atoms toward a front side surface of a silicon substrate during and after denudation and before a polysilicon layer is placed upon a gate oxide, said method comprising the steps of: prior to processing a silicon substrate, denuding by heating to a temperature exceeding 1100° C. in the presence of a hydrogen ambient a plurality of oxygen atoms from a surface area within said silicon substrate; prior to placing polysilicon upon said silicon substrate, processing said silicon substrate at temperatures less than 1000° C. (i) to minimize formation of and movement of oxygen atoms and interstitial silicon atoms from the silicon substrate to the surface of the substrate, and (ii) to form a patterned field oxide upon said substrate, MeV implanted well regions underlying spaces between said patterned field oxide and a gate oxide upon the well regions; and depositing polysilicon upon said gate oxide and thereafter continuing processing said silicon substrate at temperatures above 1000° C. to provide gettering sites within said substrate.