US5433170A
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Metal-organic chemical vapor-phase deposition process for fabricating light-emitting devices
Assignee: Sony Corp
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Filing: 1994-11-04
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Granted: 1995-07-18
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Expires: 2014-11-04
Abstract
Abstract A metal-organic chemical vapor-phase deposition process for fabricating a layer of a Group II-VI compound semiconductor using an organometallic compound based on bis(cyclopentadienyl)magnesium having a vapor pressure in the range of from 1.3×10 Pa to 1.3×10 2 Pa at a temperature of 330° K. The present invention also provides a light-emitting device which is fabricated by means of the metal-organic vapor-phase deposition process above. The process according to the present invention provides a magnesium-containing compound semiconductor layer having an accurately controlled composition, and it readily enables the fabrication of a compound semiconductor layer having a grated structure.
Inventors
- 👤 Atsushi Toda
- 👤 Takeharu Asano
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 19:19
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/22; C23C16/30; C23C16/305; C23C16/306; C30; C30B; C30B25/00; C30B25/02; C30B29/00; C30B29/10; C30B29/46; C30B29/48; H; H10; H10H; H10H20/00; H10H20/01; H10H20/011; H10H20/012; H10H20/0125; H10H20/80; H10H20/81; H10H20/822; H10H20/823; Y; Y10; Y10S; Y10S438/00; Y10S438/93
Claims Analysis
Total Claims: 23
Claim 1
Independent Claim
53 words
A metal-organic chemical vapor deposition process for fabricating a layer of a Group II-VI compound semiconductor using an organometallic compound based on bis(cyclopentadienyl)magnesium selected from the group consisting of bis(methylcyclopentadienyl)magnesium and bis(isopropylcyclopentadieny1)magnesium having a vapor pressure in the range of from 1.3×10 Pa to 1.3×10 2 Pa at a temperature of 330° K.
Claim 2
Dependent Claim
53 words
A metal-organic chemical vapor deposition process for fabricating a layer of a Group II-VI compound semiconductor using an organometallic compound based on bis(cyclopentadienyl)magnesium selected from the group consisting of bis(methylcyclopentadienyl)magnesium and bis(isopropylcyclopentadieny1)magnesium having a vapor pressure in the range of from 1.3×10 Pa to 1.3×10 2 Pa at a temperature of 330° K.
Claim 3
Dependent Claim
34 words
A metal-organic chemical vapor-phase deposition process as claimed in claim 1, wherein, the layer of the Group II-VI compound semiconductor is grown at a temperature in the range of from 400° to 600° C.
Claim 4
Dependent Claim
64 words
A metal-organic chemical vapor-phase deposition process as claimed in claim 1, wherein, the layer of the Group II-VI compound semiconductor is deposited by supplying a gaseous starting material containing the element belonging to Group VI of periodic table and a gaseous starting material containing the element belonging to Group II at a ratio of the former to the latter of from 2 to 50.
Claim 5
Dependent Claim
48 words
A metal-organic chemical vapor-phase deposition process as claimed in claim 1, wherein, the organometallic compound based on bis(cyclopentadienyl)magnesium is vaporized by maintaining said organometallic compound at a temperature not lower than the melting point but at a temperature not higher than the boiling point of said organometallic compound.
Claim 6
Dependent Claim
22 words
A metal-organic chemical vapor-phase deposition process as claimed in claim 1, wherein, the layer of the Group II-VI compound semiconductor comprises ZnMgSSe.
Claim 7
Dependent Claim
42 words
A metal-organic chemical vapor-phase deposition process as claimed in claim 5, wherein, the layer of the Group II-VI compound semiconductor comprises a heterojunction between Z 1-X Mg X SSe and Zn 1-Y Mg Y SSe, where X not being equal to Y.
Claim 8
Dependent Claim
113 words
A metal-organic chemical vapor deposition process for fabricating a layer of a quaternary mixed crystal compound semiconductor comprising two kinds of elements belonging to Group II of periodic table, wherein at least one of the Group II is selected from the group consisting of bis(methylcyclopentadienyl)magnesium and bis(isopropylcyclopentadienyl)magnesium and two kinds of elements belonging to Group (IV) VI of the periodic table, wherein, the composition of the compound semiconductor layer is varied by changing the gas flow ratio of one of the two kinds of gaseous materials containing the group VI elements while maintaining the gas flow rate of the two kinds of gaseous materials containing the Group II elements to a constant value.
Claim 9
Dependent Claim
113 words
A metal-organic chemical vapor deposition process for fabricating a layer of a quaternary mixed crystal compound semiconductor comprising two kinds of elements belonging to Group II of periodic table, wherein at least one of the Group II is selected from the group consisting of bis(methylcyclopentadienyl)magnesium and bis(isopropylcyclopentadienyl)magnesium and two kinds of elements belonging to Group (IV) VI of the periodic table, wherein, the composition of the compound semiconductor layer is varied by changing the gas flow ratio of one of the two kinds of gaseous materials containing the group VI elements while maintaining the gas flow rate of the two kinds of gaseous materials containing the Group II elements to a constant value.
Claim 10
Dependent Claim
113 words
A metal-organic chemical vapor deposition process for fabricating a layer of a quaternary mixed crystal compound semiconductor comprising two kinds of elements belonging to Group II of periodic table, wherein at least one of the Group II is selected from the group consisting of bis(methylcyclopentadienyl)magnesium and bis(isopropylcyclopentadienyl)magnesium and two kinds of elements belonging to Group (IV) VI of the periodic table, wherein, the composition of the compound semiconductor layer is varied by changing the gas flow ratio of one of the two kinds of gaseous materials containing the group II elements while maintaining the gas flow rate of the two kinds of gaseous materials containing the Group VI elements to a constant value.
Claim 11
Dependent Claim
113 words
A metal-organic chemical vapor deposition process for fabricating a layer of a quaternary mixed crystal compound semiconductor comprising two kinds of elements belonging to Group II of periodic table, wherein at least one of the Group II is selected from the group consisting of bis(methylcyclopentadienyl)magnesium and bis(isopropylcyclopentadienyl)magnesium and two kinds of elements belonging to Group (IV) VI of the periodic table, wherein, the composition of the compound semiconductor layer is varied by changing the gas flow ratio of one of the two kinds of gaseous materials containing the group II elements while maintaining the gas flow rate of the two kinds of gaseous materials containing the Group VI elements to a constant value.
Claim 12
Dependent Claim
55 words
A metal-organic chemical vapor-phase deposition process as claimed in claim 7, wherein, one of the two kinds of gaseous materials containing the Group II elements of the periodic table is a gaseous material comprising an organometallic compound based on bis(cyclopentadienyl)magnesium having a vapor pressure of from 1.3×10 Pa to 1.3×10 2 Pa at 330° K.
Claim 13
Dependent Claim
55 words
A metal-organic chemical vapor-phase deposition process as claimed in claim 8, wherein, one of the two kinds of gaseous materials containing the Group II elements of the periodic table is a gaseous material comprising an organometallic compound based on bis(cyclopentadienyl)magnesium having a vapor pressure of from 1.3×10 Pa to 1.3×10 2 Pa at 330° K.
Claim 14
Dependent Claim
20 words
A metal-organic chemical vapor-phase deposition process as claimed in claim 9, wherein, the organometallic compound based on bis(cyclopentadienyl)magnesium is bis(methylcyclopentadienyl)magnesium.
Claim 15
Dependent Claim
20 words
A metal-organic chemical vapor-phase deposition process as claimed in claim 10, wherein, the organometallic compound based on bis(cyclopentadienyl)magnesium is bis(methylcyclopentadienyl)magnesium.
Claim 16
Dependent Claim
20 words
A metal-organic chemical vapor-phase deposition process as claimed in claim 9, wherein, the organometallic compound based on bis(cyclopentadienyl)magnesium is bis(isopropylcyclopentadienyl)magnesium.
Claim 17
Dependent Claim
20 words
A metal-organic chemical vapor-phase deposition process as claimed in claim 10, wherein, the organometallic compound based on bis(cyclopentadienyl)magnesium is bis(isopropylcyclopentadienyl)magnesium.
Claim 18
Dependent Claim
45 words
A metal-organic chemical vapor-phase deposition process as claimed in claim 9, wherein, the two kinds of elements belonging to Group II of periodic table are zinc and magnesium, and the two kinds of elements belonging to Group VI of periodic table are sulfur and selenium.
Claim 19
Dependent Claim
45 words
A metal-organic chemical vapor-phase deposition process as claimed in claim 10, wherein, the two kinds of elements belonging to Group II of periodic table are zinc and magnesium, and the two kinds of elements belonging to Group VI of periodic table are sulfur and selenium.
Claim 20
Dependent Claim
20 words
A process for fabricating a light-emitting element including the steps of metal-organic chemical vapor-phase deposition as claimed in claim 1.
Claim 21
Dependent Claim
27 words
A process for fabricating a light-emitting element as claimed in claim 17, wherein, the layer of the compound semiconductor constituting the light-emitting element comprises a double heterostructure.
Claim 22
Dependent Claim
27 words
A process for fabricating a light-emitting element as claimed in claim 17, wherein, the layer of the compound semiconductor constituting the light-emitting element comprises a grated structure.
Claim 23
Dependent Claim
28 words
A process for fabricating a light-emitting element as claimed in claim 17, wherein, the layer of the compound semiconductor constituting the light-emitting element comprises a separate confinement heterostructure.
References Cited (Backward Citations)
US4881979A
Cited
US5311533A
Cited
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