Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
169 words
A semiconductor diode laser comprising a semiconductor body (10) with a substrate (1) of a first conductivity type and a semiconductor layer structure situated thereon and having an active layer (3) arranged between two cladding layers (1, 4) and a pn junction by which electromagnetic radiation can be generated in a strip-shaped active region (3A) of the active layer (3) given a sufficient current strength in the forward bias direction, an end face (20) of the strip-shaped active region (3A) being curved so as to form a lens of a given strength, characterized in that the curved end face (20) is covered with a covering layer (9) of a material having a different refractive index from that of the active region (3A), and the refractive index of the material of the covering layer (9) and the radius of curvature of the end face (20) are so chosen that the scattering of the generated electromagnetic radiation at the curved end face (20) is a minimum at the given lens strength.
Claim 2
Dependent Claim
169 words
A semiconductor diode laser comprising a semiconductor body (10) with a substrate (1) of a first conductivity type and a semiconductor layer structure situated thereon and having an active layer (3) arranged between two cladding layers (1, 4) and a pn junction by which electromagnetic radiation can be generated in a strip-shaped active region (3A) of the active layer (3) given a sufficient current strength in the forward bias direction, an end face (20) of the strip-shaped active region (3A) being curved so as to form a lens of a given strength, characterized in that the curved end face (20) is covered with a covering layer (9) of a material having a different refractive index from that of the active region (3A), and the refractive index of the material of the covering layer (9) and the radius of curvature of the end face (20) are so chosen that the scattering of the generated electromagnetic radiation at the curved end face (20) is a minimum at the given lens strength.
Claim 3
Dependent Claim
44 words
A semiconductor diode laser as claimed in claim 1, characterized in that the end face (20) is curved in lateral direction and the covering layer (9) comprises a semiconductor material having a refractive index smaller than the refractive index of the active region (3A).
Claim 4
Dependent Claim
44 words
A semiconductor diode as claimed in claim 1, characterized in that the difference in refractive index between the active region (3A)and the covering layer (9) is below 2, and the radius of curvature of the curved end face (20) is smaller than 10 μm.
Claim 5
Dependent Claim
46 words
A semiconductor diode laser as claimed in claim 1, characterized in that the difference in refractive index between the active region (3A) and the covering layer (9) is smaller than 1, and the radius of curvature of the curved end face (20) is smaller than 5μ.
Claim 6
Dependent Claim
47 words
A semiconductor diode laser as claimed in claim 1, characterized in that the difference in refractive index between the active region (3A) and the covering layer (9) is smaller than 0.5, and the radius of curvature of the curved end face (20) is smaller than 2.5 μm.
Claim 7
Dependent Claim
49 words
A semiconductor diode laser as claimed in claim 1, characterized in that the semiconductor diode is a laser of the buried ridge type or of the buried hetero type, and the material of the covering layer (9) is the same as the material of the lateral cladding layer (5).
Claim 8
Dependent Claim
77 words
A semiconductor diode laser as claimed in any claim 1, characterized in that the semiconductor diode is a laser of the DFB type and the active layer (3) and a radiation-guiding layer (2) comprise InGaAsP, in that the cladding layers (1, 4, 5) and the covering layer (9) comprise InP, and in that the covering layer (9) is bounded at a side remote from the diode by a cleaving surface (50) provided with an anti-reflection coating (51).
Claim 9
Independent Claim
168 words
A method of manufacturing a semiconductor diode laser comprising the steps of providing a semiconductor layer structure on a substrate (1) of a first conductivity type with an active layer (3) situated between two cladding layers (1, 4) and with a pn junction with which electromagnetic radiation can be generated in a strip-shaped active region (3A) of the active layer (3) given a sufficient current strength in the forward bias direction of the pn junction, curving an end face (20) of the strip-shaped active region (3A) so as to form a lens of a given strength, covering the curved end face (20) with a covering layer (9) of a material having a different refractive index from that of the active region (3A), and choosing the refractive index of the material of the covering layer (9) and the curvature of the end face (20) such that the scattering of the generated electromagnetic radiation at the curved end face (20) is a minimum for the given strength of the lens.
Claim 10
Independent Claim
168 words
A method of manufacturing a semiconductor diode laser comprising the steps of providing a semiconductor layer structure on a substrate (1) of a first conductivity type with an active layer (3) situated between two cladding layers (1, 4) and with a pn junction with which electromagnetic radiation can be generated in a strip-shaped active region (3A) of the active layer (3) given a sufficient current strength in the forward bias direction of the pn junction, curving an end face (20) of the strip-shaped active region (3A) so as to form a lens of a given strength, covering the curved end face (20) with a covering layer (9) of a material having a different refractive index from that of the active region (3A), and choosing the refractive index of the material of the covering layer (9) and the curvature of the end face (20) such that the scattering of the generated electromagnetic radiation at the curved end face (20) is a minimum for the given strength of the lens.
Claim 11
Dependent Claim
112 words
A method as claimed in claim 8, characterized in that a strip-shaped mesa (11A) is formed in the semiconductor layer structure by means of etching after the provision of a mask (11), which mesa comprises at least the upper cladding layer (4) and the active layer (3), the end face (20) is formed and provided with a curvature, after which in a single deposition step a further cladding layer (5) is provided to either side of the strip-shaped mesa (11A) and the covering layer (9) is provided against the curved end face (20), and finally separate diodes are obtained through cleaving, a cleaving surface (50) being made through the covering layer (9).
Claim 12
Dependent Claim
160 words
A method as claimed in claim 8, characterized in that a strip-shaped mesa (11A) is formed in the semiconductor layer structure by etching after the provision of a first mask (11), which mesa comprises at least a portion of the upper cladding layer (4), after which in a deposition step a further cladding layer (5) is provided on either side of the mesa (11A), and subsequently after the provision of a second mask (3 strip-shaped) an opening is etched into the semiconductor layer structure at the area of the mesa (11A), whereby at least the upper cladding layer (4) and the active layer (3) are removed and the end face (20) of the mesa is shaped and provided with a curvature, after which the covering layer (9) is provided against the end face (20) by means of a further deposition step, and finally separate diodes are obtained through cleaving, a cleaving surface (50) being effected through the covering layer (9).