US5425611A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Substrate handling and processing system
Assignee: Intevac Inc
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Filing: 1994-04-13
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Granted: 1995-06-20
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Expires: 2014-04-13
Abstract
Abstract This invention relates to a system for handling and processing thin substrates, such as substrates for magnetic disks. The system includes a main chamber, entrance and output load locks, a buffer chamber, substrate load/unload structure, and a plurality of substrate processing stations positioned contiguous with the main vacuum chamber. The system further includes a transport for moving a plurality of cassettes carrying vertically oriented substrates into the entrance load lock, to the buffer chamber where the substrates are transferred into the main chamber, and to the output load lock where processed substrates are placed back in the cassettes. The substrates are transferred to and from the cassettes to and from the substrate load/unload structure by way of dedicated lift blades. The system further employs a simple three-step transfer of the substrates from processing station to processing station which greatly increases the throughput potential compared to prior art systems which rely on complex substrate handling and transfer.
Inventors
- 👤 John L. Hughes
- 👤 Eric C. Lawson
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 18:52
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/30; H10P72/32; H10P72/3202; G; G11; G11B; G11B23/00; G11B5/00; G11B5/84; G11B5/8404; H10P72/3206; H10P72/3218; H10P72/33; H10P72/3311; H10P72/3314; Y; Y10; Y10S; Y10S414/00; Y10S414/135; Y10S414/137; Y10S414/138; Y10S414/139; Y10S414/14
Claims Analysis
Total Claims: 3
Claim 1
Independent Claim
334 words
A substrate handling and processing system, said system comprising a vacuum sealable processing chamber having a plurality of treatment stations disposed therein, a transport assembly disposed within said processing chamber, said transport assembly being capable of circular indexing and vertical motion within said processing chamber, load and unload means positioned adjacent to said transport assembly to load a substrate onto said assembly at a transfer position for transfer of said substrate to a first treatment station, means at said transfer position to vertically transport a substrate to said transport assembly from a cassette and to a cassette from said transport assembly via a vertical transport means, said transport assembly including a lift blade to support and move said substrates vertically from and to a cassette in position on said horizontal path with negligible blockage of either surface of said substrate in position on said lift blade, said cassette being positioned within said processing chamber on a horizontal transport path to carry the substrates through said processing chamber beneath said treatment stations, said path permitting passage therethrough at least at said transfer positions beneath said processing stations of said lift blade to vertically transport substrates to or from processing between said treatment stations and a cassette, means associated with said transport assembly in its upward position at said first treatment station to cause circular indexing of said transport assembly to move a substrate on said transport assembly from said first treatment station to at least a second treatment station while still in an upward position, means thereafter to move said substrate from the treatment station to the transfer station to unload said substrate at said transfer station onto said lift blade to downwardly transport said substrate to a (said) cassette in position on said horizontal transport path at a transfer position beneath said treatment station, and means to seal each treatment station when said transport assembly has a substrate positioned for treatment within, isolating said treatment station from other treatment stations of said processing chamber.
Claim 2
Dependent Claim
334 words
A substrate handling and processing system, said system comprising a vacuum sealable processing chamber having a plurality of treatment stations disposed therein, a transport assembly disposed within said processing chamber, said transport assembly being capable of circular indexing and vertical motion within said processing chamber, load and unload means positioned adjacent to said transport assembly to load a substrate onto said assembly at a transfer position for transfer of said substrate to a first treatment station, means at said transfer position to vertically transport a substrate to said transport assembly from a cassette and to a cassette from said transport assembly via a vertical transport means, said transport assembly including a lift blade to support and move said substrates vertically from and to a cassette in position on said horizontal path with negligible blockage of either surface of said substrate in position on said lift blade, said cassette being positioned within said processing chamber on a horizontal transport path to carry the substrates through said processing chamber beneath said treatment stations, said path permitting passage therethrough at least at said transfer positions beneath said processing stations of said lift blade to vertically transport substrates to or from processing between said treatment stations and a cassette, means associated with said transport assembly in its upward position at said first treatment station to cause circular indexing of said transport assembly to move a substrate on said transport assembly from said first treatment station to at least a second treatment station while still in an upward position, means thereafter to move said substrate from the treatment station to the transfer station to unload said substrate at said transfer station onto said lift blade to downwardly transport said substrate to a (said) cassette in position on said horizontal transport path at a transfer position beneath said treatment station, and means to seal each treatment station when said transport assembly has a substrate positioned for treatment within, isolating said treatment station from other treatment stations of said processing chamber.
Claim 3
Dependent Claim
56 words
The substrate handling and processing system of claim 1 including: means for maintaining a vacuum environment in each of said treatment stations and said processing chamber during operation of said system; and means associated with each treatment station to permit removal thereof without disruption of the vacuum at said other treatment stations and said processing chamber.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-06-19 | 1998-12-19 | 1999-06-20 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-06-19 | 2002-12-19 | 2003-06-20 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-06-19 | 2006-12-19 | 2007-06-20 | $7700.00 | Window Closed / Lapsed |