US5411769A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of producing micromechanical devices
Assignee: Texas Instruments Inc
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Filing: 1993-09-29
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Granted: 1995-05-02
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Expires: 2013-09-29
Abstract
Abstract It is possible to use an oriented monolayer to limit the Van der Waals forces between two elements by passivation. The invention disclosed here details how to do so by building the device to be passivated, cleaning the surface to be passivated, activating the surface, heating it along with the material to be used as the monolayer, exposing a vapor of the material to the surface and evacuating the excess material, leaving only the monolayer.
Inventors
- 👤 Larry J. Hornbeck
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 15:26
CPC Classifications
B; B81; B81B; B81B3/00; B81B3/0002; B81B3/0005; B81C; B81C1/00; B81C1/00912; B81C1/0096; G; G02; G02B; G02B26/00; G02B26/08; G02B26/0816; G02B26/0833; G02B26/0841; B81B2201/00; B81B2201/04; B81B2201/042; B81C2201/00; B81C2201/11; B81C2201/112; B82; B82Y; B82Y10/00; B82Y30/00
Claims Analysis
Total Claims: 22
Claim 1
Independent Claim
79 words
A method for producing a low surface energy wear resistant thin film on the surface of a micromechanical device comprising the steps of: a) cleaning said device; b) activating the surface of said cleaned device; c) heating said activated surface; d) heating a source material to produce a vapor, wherein said source material is a long-chain aliphatic halogenated polar compound; and e) exposing said activated surface to said source material vapor to deposit a passivating layer on said surface.
Claim 2
Independent Claim
79 words
A method for producing a low surface energy wear resistant thin film on the surface of a micromechanical device comprising the steps of: a) cleaning said device; b) activating the surface of said cleaned device; c) heating said activated surface; d) heating a source material to produce a vapor, wherein said source material is a long-chain aliphatic halogenated polar compound; and e) exposing said activated surface to said source material vapor to deposit a passivating layer on said surface.
Claim 3
Dependent Claim
17 words
The method of claim 1 wherein said exposing step deposits an oriented monolayer of said source material.
Claim 4
Dependent Claim
14 words
The method of claim 1 wherein said micromechanical device is a deformable mirror device.
Claim 5
Dependent Claim
20 words
The method of claim 1 wherein said activating step comprises the step of placing said device into an oxygen plasma.
Claim 6
Dependent Claim
60 words
The method of claim 1 wherein said step of heating said device surface and said source material, and said step of exposing the device surface to a source material vapor comprises the steps of placing said device and said source material in a covered container and then placing said covered container in a vacuum oven and heating said vacuum oven.
Claim 7
Dependent Claim
16 words
The method of claim 1 wherein said long-chain aliphatic halogenated polar compound is perfluordecanoic acid (PFDA).
Claim 8
Dependent Claim
20 words
The method of claim 1 further comprising the step of removing excess long-chain aliphatic halogenated polar compound from said device.
Claim 9
Dependent Claim
26 words
The method of claim 7 wherein said step of removing excess long-chain aliphatic halogenated polar compound from said device comprises evacuating a chamber containing said device.
Claim 10
Independent Claim
67 words
A method for producing a low surface energy wear resistant thin film on the surface of a micromechanical device comprising the steps of: a) cleaning said device; b) activating the surface of said cleaned device; c) heating said activated surface; d) heating a source material to produce a vapor; and e) exposing said activated surface to said vapor to deposit a passivating layer on said activated surface.
Claim 11
Independent Claim
67 words
A method for producing a low surface energy wear resistant thin film on the surface of a micromechanical device comprising the steps of: a) cleaning said device; b) activating the surface of said cleaned device; c) heating said activated surface; d) heating a source material to produce a vapor; and e) exposing said activated surface to said vapor to deposit a passivating layer on said activated surface.
Claim 12
Dependent Claim
16 words
The method of claim 9 wherein said exposing step deposits an oriented monolayer of source material.
Claim 13
Dependent Claim
13 words
The method of claim 9 wherein said device is a deformable mirror device.
Claim 14
Dependent Claim
17 words
The method of claim 9 further comprising the step of removing excess source material from said device.
Claim 15
Dependent Claim
23 words
The method of claim 12 wherein said step of removing excess source material from said device comprises evacuating a chamber containing said device.
Claim 16
Dependent Claim
60 words
The method of claim 9 wherein said step of heating said device surface and said source material, and said step of exposing the device surface to a source material vapor comprises the steps of placing said device and said source material in a covered container and then placing said covered container in a vacuum oven and heating said vacuum oven.
Claim 17
Dependent Claim
20 words
The method of claim 9 wherein said activating step comprises the step of placing said device in an oxygen plasma.
Claim 18
Independent Claim
101 words
A method for producing a low surface energy wear resistant oriented monolayer on the surface of a deformable micromirror device comprising the steps of: a) cleaning said device; b) placing said cleaned device in an oxygen plasma to activate the surface of said cleaned device; c) placing said device and a long-chain aliphatic halogenated polar compound in a covered container; d) heating said covered container in a vacuum oven to produce a vapor of said long-chain aliphatic halogenated polar compound; e) exposing said activated surface to said long-chain aliphatic halogenated polar compound vapor to deposit a passivating layer on said surface.
Claim 19
Independent Claim
101 words
A method for producing a low surface energy wear resistant oriented monolayer on the surface of a deformable micromirror device comprising the steps of: a) cleaning said device; b) placing said cleaned device in an oxygen plasma to activate the surface of said cleaned device; c) placing said device and a long-chain aliphatic halogenated polar compound in a covered container; d) heating said covered container in a vacuum oven to produce a vapor of said long-chain aliphatic halogenated polar compound; e) exposing said activated surface to said long-chain aliphatic halogenated polar compound vapor to deposit a passivating layer on said surface.
Claim 20
Dependent Claim
15 words
The method of claim 16 wherein said long-chain aliphatic halogenated polar compound is perfluordecanoic acid.
Claim 21
Dependent Claim
20 words
The method of claim 16 further comprising the step of removing excess long-chain aliphatic halogenated polar compound from said device.
Claim 22
Dependent Claim
26 words
The method of claim 18 wherein said step of removing excess long-chain aliphatic halogenated polar compound from said device comprises evacuating a chamber containing said device.
References Cited (Backward Citations)
No citation records indexed.
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| 3.5 Years (Year 4) | 1998-05-01 | 1998-10-31 | 1999-05-02 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-05-01 | 2002-10-31 | 2003-05-02 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-05-01 | 2006-10-31 | 2007-05-02 | $7700.00 | Window Closed / Lapsed |