US5403436A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Plasma treating method using hydrogen gas
Assignee: Fujitsu Semiconductor Ltd
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Filing: 1994-07-11
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Granted: 1995-04-04
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Expires: 2014-07-11
Abstract
Abstract A plasma treating method subjects an object surface to a plasma treating within a chamber. First, first and second gasses are supplied into the chamber, where the first gas includes hydrogen molecules as a main component, the second gas includes a quantity of hydrogen less than that included in the first gas and is selected from a group of materials consisting of organic compounds and inorganic compounds, the organic compounds include hydrogen and oxygen and the inorganic compounds include hydrogen. Second, plasma of a mixed gas which is made up of the first and second gasses is generated within the chamber to subject the object surface to the plasma treating. Preferably, the second gas is water vapor.
Inventors
- 👤 Shuzo Fujimura
- 👤 Tetsuya Takeuchi
- 👤 Takeshi Miyanaga
- 👤 Yoshimasa Nakano
- 👤 Yuji Matoba
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 06:28
CPC Classifications
H; H10; H10P; H10P70/00; H10P70/10; H10P70/12; C; C23; C23C; C23C16/00; C23C16/02; C23C16/0227; C23C16/0245; G; G03; G03F; G03F7/00; G03F7/26; G03F7/36; G03F7/40; H10P50/00; H10P50/20; H10P50/28; H10P50/286; H10P50/287; H10P70/50; H10P70/52; H10P95/00
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
117 words
A plasma etching method for plasma etching a resist layer on a surface of an object within a chamber, said plasma etching method comprising: (a) coating the object surface with a resist layer; (b) supplying an etching gas consisting of first and second gasses into the chamber, said first gas consisting essentially of hydrogen gas, said second gas consisting essentially of a quantity of hydrogen less than that included in the first gas and being provided in the form of water vapor; and (c) irradiating said etching gas with microwaves to generate within the chamber a plasma of said etching gas so as to subject the resist layer on the object surface to the hydrogen plasma etching.
Claim 2
Dependent Claim
117 words
A plasma etching method for plasma etching a resist layer on a surface of an object within a chamber, said plasma etching method comprising: (a) coating the object surface with a resist layer; (b) supplying an etching gas consisting of first and second gasses into the chamber, said first gas consisting essentially of hydrogen gas, said second gas consisting essentially of a quantity of hydrogen less than that included in the first gas and being provided in the form of water vapor; and (c) irradiating said etching gas with microwaves to generate within the chamber a plasma of said etching gas so as to subject the resist layer on the object surface to the hydrogen plasma etching.
Claim 3
Dependent Claim
46 words
The plasma etching method as claimed in claim 1, wherein a ratio H 2 O/(H 2 +H 2 O) of hydrogen (H 2 ) and water vapor (H 2 O) included in the mixed gas is greater than 0 but less than or equal to 30%.
Claim 4
Dependent Claim
24 words
The plasma etching method as claimed in claim 1, wherein said irradiating step is carried out at a pressure of 1 Torr or greater.
Claim 5
Dependent Claim
29 words
The plasma etching method as claimed in claim 1, wherein the object surface is made of a material selected from a group consisting of organic materials, semiconductors and metals.
Claim 6
Dependent Claim
20 words
The plasma etching method as claimed in claim 4, wherein the object surface is made of an irradiated organic material.
Claim 7
Dependent Claim
42 words
The plasma etching method as claimed in claim 4, wherein said irradiating step subjects the object surface which is made of either one of semiconductor and metal to the plasma etching to prepare the object surface for formation of a layer thereon.
Claim 8
Dependent Claim
16 words
The plasma etching method as claimed in claim 1, wherein the object is a silicon substrate.
Claim 9
Dependent Claim
19 words
The plasma etching method as claimed in claim 1, wherein the resist layer is a novolac resin system resist.
Claim 10
Dependent Claim
24 words
The plasma etching method as claimed in claim 3, wherein said irradiating step is carried out at a pressure of 1.8 Torr or greater.
Claim 11
Dependent Claim
42 words
The plasma etching method as claimed in claim 2, wherein the ratio H 2 O/(H 2 +H 2 O) of hydrogen (H 2 ) and water vapor (H 2 O) included in the mixed gas is between approximately 10% and approximately 30%.
Claim 12
Dependent Claim
37 words
The plasma etching method as claimed in claim 10, wherein the ratio H 2 O/(H 2 +H 2 O) of hydrogen H 2 and water vapor (H 2 O) included in the mixed gas is approximately 20%.
Claim 13
Dependent Claim
22 words
The plasma etching method as claimed in claim 10, wherein said etching gas consists solely of said hydrogen gas and water vapor.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-04-03 | 1998-10-03 | 1999-04-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-04-03 | 2002-10-03 | 2003-04-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-04-03 | 2006-10-03 | 2007-04-04 | $7700.00 | Window Closed / Lapsed |