Method of forming diamond or diamond containing carbon film

Claim 1

A method of forming a diamond film or a diamond containing carbon film on a substrate comprising the steps of: introducing a first gas containing hydrogen, oxygen, or a mixture thereof into a plasma generating chamber maintained at a reduced pressure; introducing a microwave into said plasma generating chamber in order to excite said first gas; directing ionized or activated particles of said gas to a substrate surface placed in a reaction chamber; introducing a second gas containing a carbon compound whose molecules have a diamond structure to said reaction chamber; and depositing a diamond containing carbon film on said substrate, wherein said second gas is introduced in the vicinity of said substrate through an inlet port provided in a part of a substrate holder having said substrate thereon.

Claim 2

A method of forming a diamond film or a diamond containing carbon film on a substrate comprising the steps of: introducing a first gas containing hydrogen, oxygen, or a mixture thereof into a plasma generating chamber maintained at a reduced pressure; introducing a microwave into said plasma generating chamber in order to excite said first gas; directing ionized or activated particles of said gas to a substrate surface placed in a reaction chamber; introducing a second gas containing a carbon compound whose molecules have a diamond structure to said reaction chamber; and depositing a diamond containing carbon film on said substrate, wherein said second gas is introduced in the vicinity of said substrate through an inlet port provided in a part of a substrate holder having said substrate thereon.

Claim 7

A method of forming a diamond film or a diamond containing carbon film on a substrate comprising the steps of: introducing a gas containing hydrogen, oxygen, or a mixture thereof into a plasma generating chamber maintained at a reduced pressure; establishing a magnetic field and introducing a microwave into said plasma generating chamber in order to excite said gas; directing ionized or activated particles of said gas to a substrate placed on a substrate holder in a reaction chamber; introducing a carbon compound gas to said reaction chamber; and depositing a diamond or diamond containing carbon film on said substrate, wherein said carbon compound is an organic material whose molecules have a diamond structure; said substrate holder carrying said substrate is rotated during the deposition; and said carbon compound gas is introduced into said reaction chamber through an inlet port provided in said substrate holder.

Claim 8

A method of forming a diamond film or a diamond containing carbon film on a substrate comprising the steps of: introducing a gas containing hydrogen, oxygen, or a mixture thereof into a plasma generating chamber maintained at a reduced pressure; establishing a magnetic field and introducing a microwave into said plasma generating chamber in order to excite said gas; directing ionized or activated particles of said gas to a substrate placed on a substrate holder in a reaction chamber; introducing a carbon compound gas to said reaction chamber; and depositing a diamond or diamond containing carbon film on said substrate, wherein said carbon compound is an organic material whose molecules have a diamond structure; said substrate holder carrying said substrate is rotated during the deposition; and said carbon compound gas is introduced into said reaction chamber through an inlet port provided in said substrate holder.

Claim 12

A method of depositing diamond on a substrate comprising the steps of: inputting into a reaction chamber a reactive gas containing at least a carbon compound whose molecules have a diamond structure; introducing a microwave into said reaction chamber in order to excite said reactive gas; and depositing a diamond or a diamond containing carbon film on a substrate placed in said reaction chamber, wherein said carbon compound is selected from the group consisting of 1-adamantanol and 2-adamantanol and said substrate is maintained at a temperature not higher than 700° C. during depositing, and wherein said reactive gas is introduced into said reaction chamber through an inlet port provided in a part of a substrate holder having said substrate thereon.

Claim 13

A method of depositing diamond on a substrate comprising the steps of: inputting into a reaction chamber a reactive gas containing at least a carbon compound whose molecules have a diamond structure; introducing a microwave into said reaction chamber in order to excite said reactive gas; and depositing a diamond or a diamond containing carbon film on a substrate placed in said reaction chamber, wherein said carbon compound is selected from the group consisting of 1-adamantanol and 2-adamantanol and said substrate is maintained at a temperature not higher than 700° C. during depositing, and wherein said reactive gas is introduced into said reaction chamber through an inlet port provided in a part of a substrate holder having said substrate thereon.

Claim 15

A method of depositing diamond or diamond containing carbon on a substrate comprising the steps of: introducing a first gas containing oxygen, hydrogen, or a mixture thereof into a plasma forming chamber; establishing a magnetic field in said plasma forming chamber; introducing a microwave into said plasma forming chamber in order to convert said first gas to plasma in the presence of said magnetic field; directing activated or ionized particles of said first gas from said plasma forming chamber to a deposition chamber provided adjacent to said plasma forming chamber; inputting a second gas containing a carbon compound whose molecules have a diamond structure into said deposition chamber; and depositing diamond or a diamond containing carbon on a substrate placed in said deposition chamber, wherein said second gas is introduced into said reaction chamber through an inlet port provided in a part of a substrate holder having said substrate thereon.

Claim 16

A method of depositing diamond or diamond containing carbon on a substrate comprising the steps of: introducing a first gas containing oxygen, hydrogen, or a mixture thereof into a plasma forming chamber; establishing a magnetic field in said plasma forming chamber; introducing a microwave into said plasma forming chamber in order to convert said first gas to plasma in the presence of said magnetic field; directing activated or ionized particles of said first gas from said plasma forming chamber to a deposition chamber provided adjacent to said plasma forming chamber; inputting a second gas containing a carbon compound whose molecules have a diamond structure into said deposition chamber; and depositing diamond or a diamond containing carbon on a substrate placed in said deposition chamber, wherein said second gas is introduced into said reaction chamber through an inlet port provided in a part of a substrate holder having said substrate thereon.

Claim 18

A method of claims 1, 10 or 12, further comprising the step of applying a positive DC bias voltage to said substrate.

Claim 19

A method of forming a diamond film or a diamond containing carbon film on a substrate comprising the steps of: introducing a gas containing hydrogen, oxygen, or a mixture thereof into a plasma generating chamber maintained at a reduced pressure; establishing a magnetic field and introducing a microwave into said plasma generating chamber in order to excite said gas; directing ionized or activated particles of said gas to a substrate placed on a substrate holder in a reaction chamber; introducing a carbon compound gas comprising a carbon compound to said reaction chamber; and depositing a diamond or diamond containing carbon film on said substrate, wherein said carbon compound is an organic material whose molecules have a diamond structure and said carbon compound gas is introduced into said reaction chamber through an inlet port provided in said substrate holder.

Claim 20

A method of forming a diamond film or a diamond containing carbon film on a substrate comprising the steps of: introducing a gas containing hydrogen, oxygen, or a mixture thereof into a plasma generating chamber maintained at a reduced pressure; establishing a magnetic field and introducing a microwave into said plasma generating chamber in order to excite said gas; directing ionized or activated particles of said gas to a substrate placed on a substrate holder in a reaction chamber; introducing a carbon compound gas comprising a carbon compound to said reaction chamber; and depositing a diamond or diamond containing carbon film on said substrate, wherein said carbon compound is an organic material whose molecules have a diamond structure and said carbon compound gas is introduced into said reaction chamber through an inlet port provided in said substrate holder.