US5393641A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Radiation-sensitive resin composition
Assignee: Lapis Semiconductor Co Ltd
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Filing: 1994-06-06
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Granted: 1995-02-28
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Expires: 2014-06-06
Abstract
Abstract A novel radiation-sensitive resin composition having high sensitivity and high O 2 -RIE resistance is otained by blending 0.5 g of poly(di-t-butoxysiloxane), 50 mg of triphenylsulfonium trifluoromethanesulfonate as acid-producing agent, and 4 ml of 2-methoxyethyl acetate as solvent.
Inventors
- 👤 Toshio Ito
- 👤 Miwa Sakata
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 21:05
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/0045; G03F7/075; G03F7/0757; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/114; Y10S430/115; Y10S430/122; Y10S430/126; Y10S430/143
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
84 words
A radiation-sensitive resin composition comprising: a linear polysiloxane having a C--O--Si bond in each monomer unit, wherein said polysiloxane is a poly(dialkoxysiloxane) or a poly(diaryloxysiloxane) represented by the following formula (1): ##STR5## where R 1 and R 2 are primary, secondary or tertiary alkyl groups or aryl groups which are identical to or different from one another, R 3 is hydrogen or trimethylsilyl, and n represents degree of polymerization; and an acid-producing agent which decomposes to produce acid due to the action of radiation.
Claim 2
Dependent Claim
84 words
A radiation-sensitive resin composition comprising: a linear polysiloxane having a C--O--Si bond in each monomer unit, wherein said polysiloxane is a poly(dialkoxysiloxane) or a poly(diaryloxysiloxane) represented by the following formula (1): ##STR5## where R 1 and R 2 are primary, secondary or tertiary alkyl groups or aryl groups which are identical to or different from one another, R 3 is hydrogen or trimethylsilyl, and n represents degree of polymerization; and an acid-producing agent which decomposes to produce acid due to the action of radiation.
Claim 3
Dependent Claim
37 words
A radiation-sensitive resin composition as defined in claim 1 characterized in that said acid-producing agent is a sulfonium salt added to said polysiloxane in a proportion of 0.01-50 weight %, based on the weight of the polysiloxane.
Claim 4
Dependent Claim
37 words
A radiation-sensitive resin composition as defined in claim 1 characterized in that said acid-producing agent is an iodonium salt added to said polysiloxane in a proportion of 0.01-50 weight %, based on the weight of the polysiloxane.
Claim 5
Dependent Claim
47 words
A radiation-sensitive resin composition as defined in claim 1 characterized in that said acid-producing agent is an aromatic compound having at least one trichloromethyl group, and is added to said polysiloxane in a proportion of 0.01 to 50 weight %, based on the weight of the polysiloxane.
Claim 6
Dependent Claim
37 words
A radiation-sensitive resin composition as defined in claim 1 characterized in that said acid-producing agent is p-toluenesulfonate, and is added to said polysiloxane in a proportion of 0.01-50 weight %, based on the weight of the polysiloxane.
Claim 7
Dependent Claim
20 words
A radiation-sensitive resin composition as defined in claim 1, wherein said poly(dialkoxysiloxane) is a material obtained by polycondensation of diacetoxy-di-t-butoxysilane.
References Cited (Backward Citations)
JPS55127023A
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JPS6049647A
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JPS60186570A
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JPS6120030A
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JPS61144639A
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JPS61198151A
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US5135838A
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US5120629A
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JPH04212160A
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JPH04159553A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1998-02-27 | 1998-08-29 | 1999-02-28 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-02-27 | 2002-08-29 | 2003-02-28 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-02-27 | 2006-08-29 | 2007-02-28 | $7700.00 | Window Closed / Lapsed |