US5382545A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Interconnection process with self-aligned via plug
Assignee: United Microelectronics Corp
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Filing: 1993-11-29
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Granted: 1995-01-17
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Expires: 2013-11-29
Abstract
Abstract A device and a method of formation on a substrate of a semiconductor interconnection via structure for semiconductor devices is provided. Initially, form a first metal layer on the substrate, a first dielectric layer upon the first metal layer, and a mask upon the dielectric layer with a metal etching pattern therein. Then, etch through the first dielectric layer and the first metal layer to the substrate forming trenches between metal lines formed from the first metal layer covered with the dielectric layer. Next, form a first etch stop layer upon the surface of the first dielectric layer and planarize it, a second dielectric layer above the etch stop layer, and a second etch stop layer on the second dielectric layer. Then, pattern the second dielectric and the second etch stop layer and etch to form a via hole down to a surface of the first metal layer. Then, form a second metal layer and a metal plug in the via hole extending into contact with the first metal layer.
Inventors
- 👤 Gary Hong
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 05:57
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/01; H10W20/071; H10W20/031; H10W20/063; H10W20/0633; H10W20/069; H10W20/0693; H10W20/40; H10W20/41; H10W20/42
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
197 words
A method of formation on a substrate of a device with a semiconductor interconnection via structure for semiconductor devices, comprising, a) forming a first metal layer on said substrate, b) forming a first dielectric layer upon said first metal layer, c) forming a mask upon said dielectric layer with a metal etching pattern therein, d) etching through said first dielectric layer and said first metal layer to said substrate forming trenches between metal lines formed from said first metal layer covered with said dielectric layer, e) forming a first etch stop layer upon the surface of the said first dielectric layer, f) planarizing said etch stop layer, g) forming of a second dielectric layer above said etch stop layer, h) forming a second etch stop layer on said second dielectric layer, i) patterning with a photolithographic mask through which said second dielectric and said second etch stop layer can be etched to form a via hole, j) etching said via hole through said photolithographic mask down to a surface of said first metal layer, and k) forming a second metal layer and a metal plug into said via hole extending into contact with said first metal layer.
Claim 2
Independent Claim
197 words
A method of formation on a substrate of a device with a semiconductor interconnection via structure for semiconductor devices, comprising, a) forming a first metal layer on said substrate, b) forming a first dielectric layer upon said first metal layer, c) forming a mask upon said dielectric layer with a metal etching pattern therein, d) etching through said first dielectric layer and said first metal layer to said substrate forming trenches between metal lines formed from said first metal layer covered with said dielectric layer, e) forming a first etch stop layer upon the surface of the said first dielectric layer, f) planarizing said etch stop layer, g) forming of a second dielectric layer above said etch stop layer, h) forming a second etch stop layer on said second dielectric layer, i) patterning with a photolithographic mask through which said second dielectric and said second etch stop layer can be etched to form a via hole, j) etching said via hole through said photolithographic mask down to a surface of said first metal layer, and k) forming a second metal layer and a metal plug into said via hole extending into contact with said first metal layer.
Claim 3
Dependent Claim
26 words
A method in accordance with claim 1 wherein said first metal layer has a thickness within a range between about 1,000 Å and about 10,000 Å.
Claim 4
Dependent Claim
18 words
A method in accordance with claim 1 wherein said first dielectric layer comprises silicon dioxide (SiO 2 ).
Claim 5
Dependent Claim
41 words
A method in accordance with claim 2 wherein said first dielectric layer comprises silicon dioxide (SiO 2 ) having a thickness within a range between about 1,000 Å and about 10,000 Å deposited by means of a low temperature CVD process.
Claim 6
Dependent Claim
17 words
A method in accordance with claim 1 wherein said etch stop layer comprises silicon rich oxide (SRO).
Claim 7
Dependent Claim
17 words
A method in accordance with claim 3 wherein said etch stop layer comprises silicon rich oxide (SRO).
Claim 8
Dependent Claim
17 words
A method in accordance with claim 4 wherein said etch stop layer comprises silicon rich oxide (SRO).
Claim 9
Dependent Claim
20 words
A method in accordance with claim 7 wherein said SRO is deposited by means of low pressure chemical vapor deposition.
Claim 10
Dependent Claim
15 words
A method in accordance with claim 1 wherein said second dielectric layer comprises silicon dioxide.
Claim 11
Dependent Claim
44 words
A method in accordance with claim 8 wherein said second dielectric layer comprises silicon dioxide SiO 2 about with a thickness range between about 2,000 Å and about 6,000 Å is deposited upon first SRO layer by means of a low temperature CVD process.
Claim 12
Dependent Claim
15 words
A method in accordance with claim 1 wherein said second etch stop layer comprises SRO.
Claim 13
Dependent Claim
44 words
A method in accordance with claim 11 wherein said second etch stop layer comprises SRO about with a thickness range between about 2,000 Å and about 6,000 Å is deposited upon said second dielectric layer by means of a low temperature oxide CVD process.
Claim 14
Dependent Claim
19 words
A method in accordance with claim 12 wherein said second etch stop layer has a thickness of 500 Å.
References Cited (Backward Citations)
US4076860A
Cited
US5187121A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 1998-01-16 | 1998-07-18 | 1999-01-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2002-01-16 | 2002-07-18 | 2003-01-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2006-01-16 | 2006-07-18 | 2007-01-17 | $7700.00 | Window Closed / Lapsed |