Semiconductor device having stable breakdown voltage in wiring area

Claim 2

A semiconductor device comprising: a first conductivity type first semiconductor layer having one major surface and another major surface; a first conductivity type second semiconductor layer being formed on said one major surface of said first semiconductor layer and having lower impurity concentration than said first semiconductor layer; a second conductivity type third semiconductor layer being implanted in a surface of said second semiconductor layer; a first main electrode being formed on said third semiconductor layer; and a second main electrode being formed on said another major surface of said first semiconductor layer, the thickness of said third semiconductor layer, and the thickness and impurity concentration of said second semiconductor layer being so set as to satisfy the following conditional expression: D>W assuming that D represents the thickness of said second semiconductor layer being located under said third semiconductor layer, BV represents a reverse bias voltage being applied across said first and second main electrodes in an actual operation, KS represents the relative dielectric constant of a semiconductor material in said second semiconductor layer, ε0 represents the dielectric constant of a vacuum, q represents the amount of charges of electrons, N represents impurity concentration of said second semiconductor layer, and W represents extension of a depletion layer in reverse bias setting of a P-N junction formed in the interface between said second and third semiconductor layers, being determined by the following equation (1): ##EQU7##

Claim 3

A semiconductor device in accordance with claim 1, further comprising: a first conductivity type fourth semiconductor layer being selectively implanted in a surface of said third semiconductor layer, an insulating film formed on a surface portion of said third semiconductor layer being located between said fourth and second semiconductor layers, and a control electrode being formed on said insulating film, said first main electrode being an electrode formed on said third and fourth semiconductor layers, said semiconductor device further comprising a second conductivity type semiconductor substrate being formed on said another major surface of said first semiconductor layer, said second main electrode being an electrode formed on said semiconductor substrate.

Claim 4

A semiconductor device in accordance with claim 2, wherein a surface portion of said third semiconductor layer being located under said insulating film serves as a channel region in a MOS operation with said control electrode serving as a gate electrode.

Claim 5

A semiconductor device in accordance with claim 3, wherein said third semiconductor layer includes a plurality of third semiconductor layers, and said fourth semiconductor layer is implanted in a surface of each of said third semiconductor layers.

Claim 6

A semiconductor device in accordance with claim 4, wherein said first main electrode is an emitter electrode and said second main electrode is a collector electrode.

Claim 7

A semiconductor device in accordance with claim 5, wherein said first conductivity type is an N-type and said second conductivity type is a P-type.

Claim 8

A semiconductor device comprising: a first conductivity type first semiconductor layer having one major surface and another major surface; a first conductivity type intermediate semiconductor layer being formed on said one major surface of said first semiconductor layer and having lower impurity concentration than said first semiconductor layer; a first conductivity type second semiconductor layer being formed on said intermediate semiconductor layer and having lower impurity concentration than said intermediate semiconductor layer; a second conductivity type third semiconductor layer being implanted in a surface of said second semiconductor layer; a first main electrode being formed on said third semiconductor layer; and a second main electrode being formed on said another major surface of said first semiconductor layer, the thickness of said third semiconductor layer, the thickness and impurity concentration of said second semiconductor layer, and the thickness and impurity concentration of said intermediate semiconductor layer being so set as to satisfy the following conditional expression: D'>W' assuming that D' represents the total thickness of said semiconductor layer being located under said third semiconductor layer and said intermediate semiconductor layer, BV represents a reverse bias voltage being applied across said first and second main electrodes in an actual operation, KS represents the relative dielectric constant of a semiconductor material in said second semiconductor layer, ε0 represents the dielectric constant of a vacuum, q represents the amount of charges of electrons, N1 represents impurity concentration of said first semiconductor layer, N2 represents impurity concentration of said second semiconductor layer, BV1 represents a reverse bias voltage being shared across said second and third semiconductor layers, and W' represents extension of a depletion layer in reverse bias setting of a P-N junction formed in the interface between said second and third semiconductor layers, being determined by the following equations (2): ##EQU8##

Claim 9

A semiconductor device comprising: a first conductivity type first semiconductor layer having one major surface and another major surface; a first conductivity type intermediate semiconductor layer being formed on said one major surface of said first semiconductor layer and having lower impurity concentration than said first semiconductor layer; a first conductivity type second semiconductor layer being formed on said intermediate semiconductor layer and having lower impurity concentration than said intermediate semiconductor layer; a second conductivity type third semiconductor layer being implanted in a surface of said second semiconductor layer; a first main electrode being formed on said third semiconductor layer; and a second main electrode being formed on said another major surface of said first semiconductor layer, the thickness of said third semiconductor layer, the thickness and impurity concentration of said second semiconductor layer, and the thickness and impurity concentration of said intermediate semiconductor layer being so set as to satisfy the following conditional expression: D'>W' assuming that D' represents the total thickness of said semiconductor layer being located under said third semiconductor layer and said intermediate semiconductor layer, BV represents a reverse bias voltage being applied across said first and second main electrodes in an actual operation, KS represents the relative dielectric constant of a semiconductor material in said second semiconductor layer, ε0 represents the dielectric constant of a vacuum, q represents the amount of charges of electrons, N1 represents impurity concentration of said first semiconductor layer, N2 represents impurity concentration of said second semiconductor layer, BV1 represents a reverse bias voltage being shared across said second and third semiconductor layers, and W' represents extension of a depletion layer in reverse bias setting of a P-N junction formed in the interface between said second and third semiconductor layers, being determined by the following equations (2): ##EQU8##