US5352488A
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Chemical vapor deposition process employing metal pentadienyl complexes
Assignee: Syracuse University
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Filing: 1993-05-14
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Granted: 1994-10-04
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Expires: 2013-05-14
Abstract
Abstract Vapor deposition of metal films is carried out using as precursors metal compounds or complexes based on open pentadienyls and derivatives. The technique can be used favorably for transition metal depositions, and can be carried out photolytically or thermolytically. In certain cases, oxygen can be substituted for a terminal carbon atom.
Inventors
- 👤 James T. Spencer
- 👤 Richard D. Ernst
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 01:28
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/06; C23C16/18
Claims Analysis
Total Claims: 15
Claim 1
Independent Claim
99 words
Chemical vapor deposition process for depositing a metal film upon a substrate comprising contacting said substrate with a vapor of a precursor of the general formula ##STR4## where M is a nonferrous metallic element; Ln is one or more additional ligands; R 1 , R 2 , R 3 , R 4 and R 5 are substituents selected from the group consisting of hydrogen, lower alkyl, halogenated lower alkyl, alkylated silyl and siloxy; and thermally or photolytically decomposing said precursor in contact with the substrate with sufficient energy to bring about deposition of a film of the metallic element.
Claim 2
Dependent Claim
99 words
Chemical vapor deposition process for depositing a metal film upon a substrate comprising contacting said substrate with a vapor of a precursor of the general formula ##STR4## where M is a nonferrous metallic element; Ln is one or more additional ligands; R 1 , R 2 , R 3 , R 4 and R 5 are substituents selected from the group consisting of hydrogen, lower alkyl, halogenated lower alkyl, alkylated silyl and siloxy; and thermally or photolytically decomposing said precursor in contact with the substrate with sufficient energy to bring about deposition of a film of the metallic element.
Claim 3
Dependent Claim
17 words
The chemical vapor deposition process of claim 1, where said R 1 and R 5 are trimethylsily.
Claim 4
Dependent Claim
34 words
The chemical vapor deposition process of claim 1, wherein said precursor is M(2,4-C 7 H 11 ) 2 , where M is selected from the group consisting of Ti, V, Cr, Ru, and Os.
Claim 5
Dependent Claim
35 words
The chemical vapor deposition process of claim 1 wherein said precursor is M(1,5-(Me 3 Si) 2 C 5 H 5 ) 2 , where M is selected from the group consisting of Ti and Zr.
Claim 6
Dependent Claim
52 words
The chemical vapor deposition process of claim 1 where said precursor is M(2,4-C 7 H 11 ) 2 (L), where M is selected from the group consisting of Hf, Nb, Mo, W, Zr, V, and Ti, and L is a neutral donor ligand selected from the group consisting of phosphine and carbonyl.
Claim 7
Dependent Claim
25 words
The chemical vapor deposition process claim 1, wherein said decomposing is carried out photolytically by directing a laser beam onto selected locations on said substrate.
Claim 8
Dependent Claim
27 words
The chemical vapor deposition process of claim 1 wherein said contacting includes subliming said precursor to form said vapor thereof, and flowing said vapor past said substrate.
Claim 9
Dependent Claim
94 words
Chemical vapor deposition process for depositing a metal film upon a substrate, comprising contacting said substrate with a vapor of a precursor of the general formula ##STR5## where M is a metallic element; Ln is one or more additional ligands; and R 2 , R 3 , R 4 and R 5 are selected from the group that consists of hydrogen, lower alkyls, halogenated lower alkyls, silyls and alkylated silyl; and thermally or photolytically decomposing said precursor at predetermined locations where said precursor contacts the substrate to bring about deposition of the metallic element.
Claim 10
Dependent Claim
94 words
Chemical vapor deposition process for depositing a metal film upon a substrate, comprising contacting said substrate with a vapor of a precursor of the general formula ##STR5## where M is a metallic element; Ln is one or more additional ligands; and R 2 , R 3 , R 4 and R 5 are selected from the group that consists of hydrogen, lower alkyls, halogenated lower alkyls, silyls and alkylated silyl; and thermally or photolytically decomposing said precursor at predetermined locations where said precursor contacts the substrate to bring about deposition of the metallic element.
Claim 11
Dependent Claim
16 words
Chemical vapor deposition process according to claim 8 wherein said metal M is a transition metal.
Claim 12
Dependent Claim
22 words
Chemical vapor deposition process according to claim 9 wherein said metal M is a Group IV B to VIII B transition metal.
Claim 13
Dependent Claim
17 words
Chemical vapor deposition according to claim 10 wherein said metal is a Group VIII B transition metal.
Claim 14
Dependent Claim
16 words
Chemical vapor deposition process according to claim 8, wherein said precursor is a methylated ruthenium bis-(oxopentadienyl).
Claim 15
Dependent Claim
23 words
Chemical vapor deposition process according to claim 1, wherein said metallic element is selected from the metals in the lanthanum and actinium series.
References Cited (Backward Citations)
No citation records indexed.
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