US5347592A
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Pattern judging method and mask producing method using the pattern judging method
Assignee: Fujitsu Semiconductor Ltd
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Filing: 1992-07-23
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Granted: 1994-09-13
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Expires: 2012-07-23
Abstract
Abstract A pattern judging method which is to be implemented on a computer automatically determines whether or not a pattern should be prohibited from being formed in a mask. The pattern judging method includes the steps of (a) dividing an area of the mask where a desired pattern is to be formed into a plurality of regions, (b) calculating a predetermined physical quantity for each of the regions for a case where one or a plurality of openings corresponding to the desired pattern are formed in the mask, and (c) prohibiting the desired pattern from being formed in the mask if the predetermined quantity calculated in the step (b) exceeds a threshold value for at least one of the regions.
Inventors
- 👤 Hiroshi Yasuda
- 👤 Satoru Yamazaki
- 👤 Kiichi Sakamoto
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 13:02
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/20; G06; G06F; G06F30/00; G06F30/30; G06F30/39; G06F30/398; H; H01; H01J; H01J37/00; H01J37/30; H01J37/302; H01J37/3023; H01J37/3026
Claims Analysis
Total Claims: 17
Claim 1
Independent Claim
135 words
A pattern judging method to be implemented on a computer for automatically determining whether or not a pattern should be formed in a mask, said pattern judging method comprising the steps of: (a) dividing an area of the mask where a desired pattern is to be formed into a plurality of regions; (b) calculating a predetermined physical quantity, based on a charged particle beam being irradiated in a predetermined pattern formed in each of the regions where one or a plurality of openings corresponding to the desired pattern are formed in the mask; and (c) forming the one or plurality of openings corresponding to the predetermined pattern in a corresponding region of the mask if the predetermined quantity calculated in step (b) does not exceed a threshold value for at least one of the regions.
Claim 2
Dependent Claim
135 words
A pattern judging method to be implemented on a computer for automatically determining whether or not a pattern should be formed in a mask, said pattern judging method comprising the steps of: (a) dividing an area of the mask where a desired pattern is to be formed into a plurality of regions; (b) calculating a predetermined physical quantity, based on a charged particle beam being irradiated in a predetermined pattern formed in each of the regions where one or a plurality of openings corresponding to the desired pattern are formed in the mask; and (c) forming the one or plurality of openings corresponding to the predetermined pattern in a corresponding region of the mask if the predetermined quantity calculated in step (b) does not exceed a threshold value for at least one of the regions.
Claim 3
Dependent Claim
36 words
The pattern judging method as claimed in claim 1, wherein said step (a) divides the area of the mask into the regions by forming a bit map which describes each of the regions by one bit.
Claim 4
Dependent Claim
48 words
The pattern judging method as claimed in claim 1, wherein the predetermined physical quantity is selected from a group consisting of a temperature rise at each region caused by a charged particle beam irradiated thereon, a load acting at each region, and a stress generated at each region.
Claim 5
Dependent Claim
53 words
The pattern judging method as claimed in claim 1, wherein the predetermined physical quantity is an arbitrary combination of quantities selected from a group consisting of a temperature rise at each region caused by a charged particle beam irradiated thereon, a load acting at each region, and a stress generated at each region.
Claim 6
Dependent Claim
70 words
The pattern judging method as claimed in claim 1, which further comprises the step of (d) dividing the desired pattern into a plurality of kinds of mutually independent patterns if the predetermined quantity calculated in the step (b) exceeds the threshold value for at least one of the regions, and said steps (a), (b) and (c) are repeated by taking each of the mutually independent patterns as the desired pattern.
Claim 7
Dependent Claim
32 words
The pattern judging method as claimed in claim 5, wherein said step (d) divides the desired pattern into one or a plurality of rectangular patterns and one pattern having an arbitrary shape.
Claim 8
Dependent Claim
52 words
The pattern judging method as claimed in claim 5, wherein said step (d) divides the desired pattern into one or a plurality of patterns which generally extend in a first direction and one or a plurality of patterns which generally extend in a second direction which is perpendicular to the first direction.
Claim 9
Dependent Claim
183 words
A mask producing method for producing a mask which is used for drawing patterns on an object by a charged particle beam transmitted through the patterns of the mask, said mask producing method comprising the steps of: (a) extracting a pattern data related to a desired pattern which is to be formed in the mask; (b) dividing an area of the mask where the desired pattern is to be formed into a plurality of regions; (c) calculating a predetermined physical quantity, based on said charged particle beam being irradiated in a predetermined pattern formed in each of the regions where one or a plurality of openings corresponding to the predetermined pattern are formed in the mask, based on the extracted pattern data; (d) determining whether or not the predetermined quantity calculated in step (c) exceeds a threshold value for all of the regions; and (e) forming the one or plurality of openings corresponding to the predetermined pattern in a corresponding region of the mask if step (d) determines that the predetermined quantity does not exceed the threshold value for each of the regions.
Claim 10
Dependent Claim
183 words
A mask producing method for producing a mask which is used for drawing patterns on an object by a charged particle beam transmitted through the patterns of the mask, said mask producing method comprising the steps of: (a) extracting a pattern data related to a desired pattern which is to be formed in the mask; (b) dividing an area of the mask where the desired pattern is to be formed into a plurality of regions; (c) calculating a predetermined physical quantity, based on said charged particle beam being irradiated in a predetermined pattern formed in each of the regions where one or a plurality of openings corresponding to the predetermined pattern are formed in the mask, based on the extracted pattern data; (d) determining whether or not the predetermined quantity calculated in step (c) exceeds a threshold value for all of the regions; and (e) forming the one or plurality of openings corresponding to the predetermined pattern in a corresponding region of the mask if step (d) determines that the predetermined quantity does not exceed the threshold value for each of the regions.
Claim 11
Dependent Claim
36 words
The mask producing method as claimed in claim 8, wherein said step (b) divides the area of the mask into the regions by forming a bit map which describes each of the regions by one bit.
Claim 12
Dependent Claim
48 words
The mask producing method as claimed in claim 8, wherein the predetermined physical quantity is selected from a group consisting of a temperature rise at each region caused by the charged particle beam irradiated thereon, a load acting at each region, and a stress generated at each region.
Claim 13
Dependent Claim
53 words
The mask producing method as claimed in claim 8, wherein the predetermined physical quantity is an arbitrary combination of quantities selected from a group consisting of a temperature rise at each region caused by the charged particle beam irradiated thereon, a load acting at each region, and a stress generated at each region.
Claim 14
Dependent Claim
75 words
The mask producing method as claimed in claim 8, which further comprises the step of (f) dividing the desired pattern into a plurality of kinds of mutually independent patterns if said step (d) determines that the predetermined quantity calculated in the step (c) exceeds the threshold value for at least one of the regions, and said steps (b), (c) and (d) are repeated by taking each of the mutually independent patterns as the desired pattern.
Claim 15
Dependent Claim
32 words
The mask producing method as claimed in claim 12, wherein said step (f) divides the desired pattern into one or a plurality of rectangular patterns and one pattern having an arbitrary shape.
Claim 16
Dependent Claim
52 words
The mask producing method as claimed in claim 12, wherein said step (f) divides the desired pattern into one or a plurality of patterns which generally extend in a first direction and one or a plurality of patterns which generally extend in a second direction which is perpendicular to the first direction.
Claim 17
Dependent Claim
35 words
The mask producing method as claimed in claim 8, wherein the desired pattern forms a unit of a pattern which is repeatedly used when drawing the patterns on the object by the charged particle beam.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1997-09-12 | 1998-03-14 | 1998-09-13 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-09-12 | 2002-03-14 | 2002-09-13 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-09-12 | 2006-03-14 | 2006-09-13 | $7700.00 | Window Closed / Lapsed |