US5344491A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Apparatus for metal plating
Assignee: NEC Corp
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Filing: 1993-01-04
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Granted: 1994-09-06
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Expires: 2013-01-04
Abstract
Abstract Plating cups 2 each hold therein respective semiconductor substrates to be plated. The temperatures of the plating solution in the plating cups are controlled at optimum levels by controlling the operations of heaters 13 and 16, based on the temperature of the plating cups as measured by thermometers 5 mounted on the plating cups 2. Metal ion concentration in the solution and the pH level and specific gravity of the solution are measured by an atomic absorption spectrometer 17, a pH gauge 18, and a gravimeter 19, respectively, for determining necessary amount of replenishing metal ions and solution from a solution level regulator 21, thereby maintaining the relevant parameters of the solution within a permissible range.
Inventors
- 👤 Mariko Katou
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 07:42
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/04; H10P72/0448; C; C25; C25D; C25D21/00; C25D21/02; C25D21/12; C25D5/00; C25D5/60; C25D5/615; C25D5/617; C25D7/00; C25D7/12; C25D7/123
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
293 words
An apparatus for metal plating, comprising: a multiplicity of substrate supporting members for supporting between electrodes a multiplicity of semiconductor substrates; said substrate supporting members comprising at least one cylindrical member; supporting pins for supporting said semiconductor substrates at an upper end of said at least one cylindrical member; a multiplicity of cathode electrodes, there being one cathode electrode for each semiconductor substrate, above and in contact with an upper surface of said semiconductor substrates and a multiplicity of anode electrodes beneath each of said semiconductor substrate, a plating bath having therein said substrate supporting members; solution circulation means for circulating said plating solution past said semiconductor substrates; said solution circulation means including means for ejecting said plating solution from a bottom of said cylindrical member onto a lower surface of each semiconductor substrate and for enabling said plating solution to overflow from the upper end of said cylindrical member, thermometers mounted on each of said substrate supporting members for measuring the temperatures of the plating solution near said semiconductor substrates; solution sampling means mounted on each of said substrate supporting members for sampling plating solution near said semiconductor substrates; heating means mounted in said plating bath for heating said plating solution; heating control means for controlling the operation of said heating means in response to the signal measured by said thermometers so as to regulate the temperature of said plating solution within a predetermined range; solution monitoring means for monitoring said plating solution by testing the samples of said plating solution to determine the concentrations of the components of said plating solution; and solution replenishment means for replenishing a necessary amount of said components in said plating solution, on a basis of the measurements of said samples by said solution monitoring means.
Claim 2
Independent Claim
293 words
An apparatus for metal plating, comprising: a multiplicity of substrate supporting members for supporting between electrodes a multiplicity of semiconductor substrates; said substrate supporting members comprising at least one cylindrical member; supporting pins for supporting said semiconductor substrates at an upper end of said at least one cylindrical member; a multiplicity of cathode electrodes, there being one cathode electrode for each semiconductor substrate, above and in contact with an upper surface of said semiconductor substrates and a multiplicity of anode electrodes beneath each of said semiconductor substrate, a plating bath having therein said substrate supporting members; solution circulation means for circulating said plating solution past said semiconductor substrates; said solution circulation means including means for ejecting said plating solution from a bottom of said cylindrical member onto a lower surface of each semiconductor substrate and for enabling said plating solution to overflow from the upper end of said cylindrical member, thermometers mounted on each of said substrate supporting members for measuring the temperatures of the plating solution near said semiconductor substrates; solution sampling means mounted on each of said substrate supporting members for sampling plating solution near said semiconductor substrates; heating means mounted in said plating bath for heating said plating solution; heating control means for controlling the operation of said heating means in response to the signal measured by said thermometers so as to regulate the temperature of said plating solution within a predetermined range; solution monitoring means for monitoring said plating solution by testing the samples of said plating solution to determine the concentrations of the components of said plating solution; and solution replenishment means for replenishing a necessary amount of said components in said plating solution, on a basis of the measurements of said samples by said solution monitoring means.
Claim 3
Dependent Claim
36 words
The plating apparatus according to claim 1, wherein said plating bath is divided into a multiplicity of sub-baths having substrate supporting members and solution circulation means for independent circulation of the plating solution in said sub-baths.
Claim 4
Dependent Claim
53 words
The plating apparatus according to claim 1, wherein said solution circulation means comprises pipes for circulating said plating solution, filters mounted in said pipes outside said plating bath for filtering said plating solution, and pumps for circulating said plating solution through said filters before returning said plating solution back to said plating bath.
Claim 5
Dependent Claim
41 words
The plating apparatus according to claim 1, wherein said heating means comprises; a heater for heating the entire plating solution in said plating bath; and a multiplicity of temperature adjustment heaters each mounted on respective one of said substrate supporting members.
Claim 6
Dependent Claim
72 words
The plating apparatus according to claim 1, wherein said solution monitoring means comprises; an atomic absorption spectrometer for detecting atomic spectrum indicative of the metal ion concentrations in the plating solution; a specific gravimeter for measuring the specific gravitation of said plating solution; a pH gauge for measuring the pH level of said placing solution; a particle density counter for counting the number of minute foreign particles floating in said plating solution.
Claim 7
Dependent Claim
53 words
The plating apparatus according to claim 5, wherein said solution replenishing means replenishes necessary amount of plating solution, pH adjusting compounds, and pure water into the plating bath so that the metal ion concentration, pH level, and specific gravity of the plating solution may be maintained at an optimum level at all time.
Claim 8
Dependent Claim
60 words
The plating apparatus according to claim 5, further comprising: a particle density counter for counting foreign particles in said plating solution; and an alarm means connected with said particle density counter for providing warning, on the basis of the output from said particle density counter, that the density of minute foreign particles in the plating solution exceeds a predetermined value.
Claim 9
Dependent Claim
145 words
A plating apparatus, comprising: a plating bath having at least one cathode electrode and at least one anode electrode; at least one cylindrical plating cup in said plating bath for accommodating a plating solution; a multiplicity of support pins on top of said plating cup for supporting a plating substrate; a pump for pumping said plating solution in said plating cup onto said plating substrate; a temperature sensor in said plating cup for monitoring a temperature of said plating solution in said cup; solution sampling means in said plating cup for sampling said plating solution in said plating cup; temperature controller means responsive to the temperature sensed by said temperature sensor for controlling the temperature of said plating solution pumped onto said substrate; and solution replenishment means responsive to data obtained by said solution sampling means for replenishing said plating solution in said plating bath.
Claim 10
Dependent Claim
145 words
A plating apparatus, comprising: a plating bath having at least one cathode electrode and at least one anode electrode; at least one cylindrical plating cup in said plating bath for accommodating a plating solution; a multiplicity of support pins on top of said plating cup for supporting a plating substrate; a pump for pumping said plating solution in said plating cup onto said plating substrate; a temperature sensor in said plating cup for monitoring a temperature of said plating solution in said cup; solution sampling means in said plating cup for sampling said plating solution in said plating cup; temperature controller means responsive to the temperature sensed by said temperature sensor for controlling the temperature of said plating solution pumped onto said substrate; and solution replenishment means responsive to data obtained by said solution sampling means for replenishing said plating solution in said plating bath.
Claim 11
Dependent Claim
61 words
A plating apparatus as claimed in claim 8, further comprising: means for returning said plating solution from said plating bath to said pump, and wherein; said temperature controller means includes a first controller for controlling the temperature of said plating solution in said plating bath and a second temperature controller for controlling the temperature of said solution in said plating cup.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1997-09-05 | 1998-03-07 | 1998-09-06 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-09-05 | 2002-03-07 | 2002-09-06 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-09-05 | 2006-03-07 | 2006-09-06 | $7700.00 | Window Closed / Lapsed |