US5338425A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Target units
Assignee: Mitsubishi Materials Corp
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Filing: 1992-06-26
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Granted: 1994-08-16
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Expires: 2012-06-26
Abstract
Abstract The present invention relates to a target unit including a basic body and a target layer mainly comprising Si alloy disposed on an outer peripheral surface of the basic body by a hard-facing method. A target unit in accordance with the present invention has an interposed layer between a basic body and a target layer, in which one side thereof is strongly attached to a peripheral surface of the basic body, while other side thereof is strongly attached to an inner surface of the target layer. Also, a method in accordance with the present invention comprises the steps of: preparing a basic body in the form of a cylinder; applying an interposed layer on a peripheral surface of said basic body by means of hard-facing; and further applying a target layer on a peripheral surface of said interposed layer by means of hard-facing.
Inventors
- 👤 Akifumi Mishima
- 👤 Munenori Mashima
- 👤 Jun Tamura
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-06 19:41
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/3407; C23C14/3414; C23C4/00; C23C4/02; C23C4/12
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
106 words
A sputtering target comprising: a cylindrical substrate having an outer peripheral surface; a target layer provided on said outer peripheral surface of said substrate, said target layer being formed of a silicon alloy containing at least one ingredient selected from the group consisting of Cr, Ti and Zr; and an intermediate layer interposed between said target layer and said substrate; wherein said target layer has an inner portion adjoining said intermediate layer and an outer portion disposed away from said intermediate layer, said at least one ingredient in said silicon alloy being present in a greater concentration in said inner portion than in said outer portion.
Claim 2
Dependent Claim
106 words
A sputtering target comprising: a cylindrical substrate having an outer peripheral surface; a target layer provided on said outer peripheral surface of said substrate, said target layer being formed of a silicon alloy containing at least one ingredient selected from the group consisting of Cr, Ti and Zr; and an intermediate layer interposed between said target layer and said substrate; wherein said target layer has an inner portion adjoining said intermediate layer and an outer portion disposed away from said intermediate layer, said at least one ingredient in said silicon alloy being present in a greater concentration in said inner portion than in said outer portion.
Claim 3
Dependent Claim
43 words
A sputtering target as recited in claim 1, wherein said at least one ingredient in said inner portion of said target layer is present at a concentration gradient which gradually decreases in an outward direction from said intermediate layer to said outer portion.
Claim 4
Dependent Claim
29 words
A sputtering target as recited in claim 1, wherein said substrate is formed of a material selected from the group consisting of stainless steel, copper alloy and oxygen-free copper.
Claim 5
Dependent Claim
30 words
A sputtering target as recited in claim 1, wherein said intermediate layer consists essentially of at least one element selected from the group consisting of Mo, Ti, W, and Ni.
Claim 6
Dependent Claim
17 words
A sputtering target as recited in claim 4, wherein said intermediate layer includes a plurality of sublayers.
Claim 7
Dependent Claim
20 words
A sputtering target as recited in claim 5, wherein said intermediate layer has an outermost sublayer consisting essentially of Ni.
Claim 8
Dependent Claim
105 words
A sputtering target comprising: a cylindrical substrate having an outer peripheral surface; a target layer provided on said outer peripheral surface of said substrate; and an intermediate layer interposed between said target layer and said substrate; wherein said target layer has an inner portion adjoining said intermediate layer and an outer portion disposed away from said intermediate layer, said inner portion being formed of a silicon alloy containing at least one ingredient selected from the group consisting of Cr, Ti and Zr, said outer portion being formed of a silicon alloy containing at least one ingredient selected from the group consisting of B and P.
Claim 9
Dependent Claim
105 words
A sputtering target comprising: a cylindrical substrate having an outer peripheral surface; a target layer provided on said outer peripheral surface of said substrate; and an intermediate layer interposed between said target layer and said substrate; wherein said target layer has an inner portion adjoining said intermediate layer and an outer portion disposed away from said intermediate layer, said inner portion being formed of a silicon alloy containing at least one ingredient selected from the group consisting of Cr, Ti and Zr, said outer portion being formed of a silicon alloy containing at least one ingredient selected from the group consisting of B and P.
Claim 10
Dependent Claim
43 words
A sputtering target as recited in claim 7, wherein said at least one ingredient in said inner portion of said target layer is present at a concentration gradient which gradually decreases in an outward direction from said intermediate layer to said outer portion.
Claim 11
Dependent Claim
29 words
A sputtering target as recited in claim 7, wherein said substrate is formed of a material selected from the group consisting of stainless steel, copper alloy and oxygen-free copper.
Claim 12
Dependent Claim
30 words
A sputtering target as recited in claim 7, wherein said intermediate layer consists essentially of at least one element selected from the group consisting of Mo, Ti, W, and Ni.
Claim 13
Dependent Claim
17 words
A sputtering target as recited in claim 10, wherein said intermediate layer includes a plurality of sublayers.
Claim 14
Dependent Claim
20 words
A sputtering target as recited in claim 11, wherein said intermediate layer has an outermost sublayer consisting essentially of Ni.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1997-08-15 | 1998-02-14 | 1998-08-16 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-08-15 | 2002-02-14 | 2002-08-16 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-08-15 | 2006-02-14 | 2006-08-16 | $7700.00 | Window Closed / Lapsed |