US5336369A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of making a cantilever stylus for an atomic force microscope
Assignee: Panasonic Holdings Corp
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Filing: 1993-05-27
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Granted: 1994-08-09
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Expires: 2013-05-27
Abstract
Abstract A method of making a cantilever stylus for an atomic force microscope comprises forming a film on a surface of a substrate, the film comprising a stylus material that is different from the material of the substrate. A resist thin film of a material different from the stylus material is formed on the surface of the stylus material so as to have a tip. The stylus material is then etched with an isotropic etching technique to a depth of etching greater than the radius of curvature of the tip of the resist film so that the stylus material, having two opposite principal surfaces, has a tip formed on one of the principal surfaces with a radius of curvature less than 0.1 μm which protrudes beyond a tip of the other principal surface. At least the resist thin film and the substrate at the tips of the principal surfaces of the stylus material are then removed.
Inventors
- 👤 Hiroyuki Kado
- 👤 Takao Tohda
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 00:53
CPC Classifications
G; G01; G01Q; G01Q60/00; G01Q60/24; G01Q60/38; Y; Y10; Y10S; Y10S977/00; Y10S977/84; Y10S977/849; Y10S977/86; Y10S977/875; Y10S977/878; Y10T; Y10T29/00; Y10T29/49; Y10T29/49002; Y10T29/49007
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
147 words
A method of making a cantilever stylus, comprising: forming a film on a surface of a substrate, the film comprising a stylus material different from the material of the substrate; forming a resist thin film of a material different from the stylus material on a surface of the stylus material so that the resist thin film has a tip; etching the stylus material with an isotropic etching technique to a depth of etching greater than the radius of curvature of the tip of the resist thin film such that the stylus material, having two principal surfaces, has a tip formed on one of the principal surfaces with a radius of curvature less than 0.1 μm which protrudes beyond a tip of the other principal surface; and removing at least the resist thin film and the substrate at the tips of the principal surfaces of the stylus material.
Claim 2
Independent Claim
147 words
A method of making a cantilever stylus, comprising: forming a film on a surface of a substrate, the film comprising a stylus material different from the material of the substrate; forming a resist thin film of a material different from the stylus material on a surface of the stylus material so that the resist thin film has a tip; etching the stylus material with an isotropic etching technique to a depth of etching greater than the radius of curvature of the tip of the resist thin film such that the stylus material, having two principal surfaces, has a tip formed on one of the principal surfaces with a radius of curvature less than 0.1 μm which protrudes beyond a tip of the other principal surface; and removing at least the resist thin film and the substrate at the tips of the principal surfaces of the stylus material.
Claim 3
Dependent Claim
43 words
The method of claim 1, wherein in the step of etching, stylus material between the substrate and the resist thin film is removed so that a space is formed adjacent to the remaining stylus material between the substrate and the resist thin film.
Claim 4
Dependent Claim
50 words
The method of claim 2, and further comprising the step of forming an inclined surface on one portion of the substrate inclined relative to another portion of the substrate, and wherein the tips of the principal surfaces of the stylus material are formed on the inclined surface of the substrate.
Claim 5
Dependent Claim
50 words
The method of claim 1, and further comprising the step of forming an inclined surface on one portion of the substrate inclined relative to another portion of the substrate, and wherein the tips of the principal surfaces of the stylus material are formed on the inclined surface of the substrate.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1997-08-08 | 1998-02-07 | 1998-08-09 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-08-08 | 2002-02-07 | 2002-08-09 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-08-08 | 2006-02-07 | 2006-08-09 | $7700.00 | Window Closed / Lapsed |