US5332444A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Gas phase cleaning agents for removing metal containing contaminants from integrated circuit assemblies and a process for using the same
Assignee: Versum Materials US LLC
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Filing: 1992-11-25
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Granted: 1994-07-26
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Expires: 2012-11-25
Abstract
Abstract This invention is a vapor-phase process for cleaning metal-containing contaminants from the surfaces of integrated circuits and semiconductors between the numerous fabricating steps required to manufacture the finished electronic devices. The process employs cleaning agents comprising an effective amount of hexamethyldisilazane. The process comprises contacting the surface to be cleaned with an effective amount of the desired cleaning agent at a temperature sufficient to form volatile metal-ligand complexes on the surface of the substrate to be cleaned. The volatile metal-ligand complexes are sublimed from the surfaces of the substrate providing a clean, substantially residue-free surface.
Inventors
- 👤 Mark A. George
- 👤 David A. Bohling
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 02:12
CPC Classifications
H; H10; H10P; H10P70/00; H10P70/20; H10P70/10; H10P70/12; C; C11; C11D; C11D17/00; C11D7/00; C11D7/22; C11D7/32; C23; C23F; C23F1/00; C23F1/10; C23F1/12; H10P72/00; H10P72/04; H10P72/0402; H10P72/0406; H10P95/00; C11D2111/00; C11D2111/10; C11D2111/14; C11D2111/22
Claims Analysis
Total Claims: 27
Claim 1
Independent Claim
47 words
A cleaning agent for removing metal-containing contaminants from a surface of a substrate, the cleaning agent comprising an effective amount of hexamethyldisilazane which is dispersed in a reducing atmosphere wherein the cleaning agent and the metal-containing contaminants are capable of reacting to form a volatile metal-ligand complex.
Claim 2
Dependent Claim
47 words
A cleaning agent for removing metal-containing contaminants from a surface of a substrate, the cleaning agent comprising an effective amount of hexamethyldisilazane which is dispersed in a reducing atmosphere wherein the cleaning agent and the metal-containing contaminants are capable of reacting to form a volatile metal-ligand complex.
Claim 3
Dependent Claim
21 words
The cleaning agent of claim 1 wherein the reducing atmosphere is selected from the group consisting of hydrogen, ammonia and silane.
Claim 4
Dependent Claim
63 words
A process for cleaning metal-containing contaminants from a surface of a substrate comprising contacting the surface of the substrate with an effective amount of a cleaning agent comprising hexamethyldisilazane in the vapor phase at a temperature sufficient to form a volatile metal-ligand complex; and subliming the volatile metal-ligand complex from the surface of the substrate to provide a cleaned surface of the substrate.
Claim 5
Dependent Claim
63 words
A process for cleaning metal-containing contaminants from a surface of a substrate comprising contacting the surface of the substrate with an effective amount of a cleaning agent comprising hexamethyldisilazane in the vapor phase at a temperature sufficient to form a volatile metal-ligand complex; and subliming the volatile metal-ligand complex from the surface of the substrate to provide a cleaned surface of the substrate.
Claim 6
Dependent Claim
26 words
The process of claim 3 wherein the substrate to be cleaned is selected from the group consisting of silicon, silicon oxide, borophosphosilicate glass and phospho-silicate glass.
Claim 7
Dependent Claim
43 words
The process of claim 3 wherein the contacting of the surface of the substrate with an effective amount of the cleaning agent is conducted in the presence of energy generated by an energy source capable of promoting formation of the volatile metal-ligand complex.
Claim 8
Dependent Claim
36 words
The process of claim 5 wherein the energy source is selected from the group consisting of an ion gun, RF plasma generator, microwave plasma generator, D.C. discharge generator, a deep ultraviolet generator and a tungsten filament.
Claim 9
Dependent Claim
81 words
A process for cleaning metal-containing contaminants from a surface of a substrate comprising contacting the surface of the substrate with an activating reagent under conditions sufficient to form an activated metal-containing compound; reacting the activated metal-containing compound with a cleaning agent comprising an effective amount of hexamethyldisilazane in the vapor phase at a temperature sufficient to form a volatile metal-ligand complex; and subliming the volatile metal-ligand complex from the surface of the substrate to provide a cleaned surface of the substrate.
Claim 10
Dependent Claim
81 words
A process for cleaning metal-containing contaminants from a surface of a substrate comprising contacting the surface of the substrate with an activating reagent under conditions sufficient to form an activated metal-containing compound; reacting the activated metal-containing compound with a cleaning agent comprising an effective amount of hexamethyldisilazane in the vapor phase at a temperature sufficient to form a volatile metal-ligand complex; and subliming the volatile metal-ligand complex from the surface of the substrate to provide a cleaned surface of the substrate.
Claim 11
Dependent Claim
26 words
The process of claim 7 wherein the substrate to be cleaned is selected from the group consisting of silicon, silicon oxide, borophosphosilicate glass and phospho-silicate glass.
Claim 12
Dependent Claim
23 words
The process of claim 7 wherein the activating reagent is an ion source capable of promoting the formation of the activated metal-containing compound.
Claim 13
Dependent Claim
15 words
The process of claim 9 wherein the ion source is generated by an ion gun.
Claim 14
Dependent Claim
32 words
The process of claim 7 wherein the activating reagent is hydrogen or ammonia which has been subjected to an energy source capable of converting the hydrogen or ammonia into an excited state.
Claim 15
Dependent Claim
43 words
The process of claim 11 wherein the hydrogen or ammonia is converted into an excited state by being subjected to energy generated by an RF plasma generator, a microwave plasma generator, a D.C. discharge generator, a deep ultraviolet generator and a tungsten filament.
Claim 16
Dependent Claim
29 words
The process of claim 12 wherein the metal-containing contaminants to be cleaned from the surface of the substrate comprise an oxide, an hydroxide or a salt of a metal.
Claim 17
Dependent Claim
86 words
A process for cleaning alkali metal-containing contaminants from a surface of a substrate comprising contacting the surface of the substrate with an activating reagent under conditions sufficient to form an activated alkali metal-containing compound; reacting the activated alkali metal-containing compound with a cleaning agent comprising an effective amount of hexamethyldisilazane in the vapor phase at a temperature sufficient to form a volatile alkali metal-ligand complex; and subliming the volatile alkali metal-ligand complex from the surface of the substrate to provide a cleaned surface of the substrate.
Claim 18
Dependent Claim
86 words
A process for cleaning alkali metal-containing contaminants from a surface of a substrate comprising contacting the surface of the substrate with an activating reagent under conditions sufficient to form an activated alkali metal-containing compound; reacting the activated alkali metal-containing compound with a cleaning agent comprising an effective amount of hexamethyldisilazane in the vapor phase at a temperature sufficient to form a volatile alkali metal-ligand complex; and subliming the volatile alkali metal-ligand complex from the surface of the substrate to provide a cleaned surface of the substrate.
Claim 19
Dependent Claim
26 words
The process of claim 14 wherein the substrate to be cleaned is selected from the group consisting of silicon, silicon oxide, borophosphosilicate glass and phospho-silicate glass.
Claim 20
Dependent Claim
23 words
The process of claim 14 wherein the activating reagent is an ion source capable of promoting the formation of the activated metal-containing compound.
Claim 21
Dependent Claim
15 words
The process of claim 16 wherein the ion source is generated by an ion gun.
Claim 22
Dependent Claim
32 words
The process of claim 14 wherein the activating reagent is hydrogen or ammonia which has been subjected to an energy source capable of converting the hydrogen or ammonia into an excited state.
Claim 23
Dependent Claim
43 words
The process of claim 18 wherein the hydrogen or ammonia is converted into an excited state by being subjected to energy generated by an RF plasma generator, a microwave plasma generator, a D.C. discharge generator, a deep ultraviolet generator and a tungsten filament.
Claim 24
Dependent Claim
41 words
The process of claim 19 wherein the alkali metal-containing contaminants to be cleaned from the surface of the substrate comprise an oxide, an hydroxide or a salt of an alkali metal selected from the group consisting of lithium, sodium and potassium.
Claim 25
Dependent Claim
47 words
A cleaning agent for removing metal-containing contaminants from a surface of a substrate, the cleaning agent comprising an effective amount of hexamethyldisilazane which is dispersed in an inert atmosphere wherein the cleaning agent and the metal-containing contaminants are capable of reacting to form a volatile metal-ligand complex.
Claim 26
Dependent Claim
47 words
A cleaning agent for removing metal-containing contaminants from a surface of a substrate, the cleaning agent comprising an effective amount of hexamethyldisilazane which is dispersed in an inert atmosphere wherein the cleaning agent and the metal-containing contaminants are capable of reacting to form a volatile metal-ligand complex.
Claim 27
Dependent Claim
21 words
The cleaning agent of claim 21 wherein the inert atmosphere is selected from the group consisting of nitrogen, argon and helium.
References Cited (Backward Citations)
US4592926A
Cited
US5094701A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1997-07-25 | 1998-01-24 | 1998-07-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-07-25 | 2002-01-24 | 2002-07-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-07-25 | 2006-01-24 | 2006-07-26 | $7700.00 | Window Closed / Lapsed |