US5290382A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Methods and apparatus for generating a plasma for "downstream" rapid shaping of surfaces of substrates and films
Assignee: Integrated Process Equipment Corp
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Filing: 1991-12-13
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Granted: 1994-03-01
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Expires: 2011-12-13
Abstract
Abstract A gas, which is flowed into a plasma chamber 12 positioned "upstream" from a etching reaction site on a substrate 20, is converted into a plasma and its active species by the application of excitation. The means for excitation may be radio frequency power or microwave power. The excitation is decoupled from the substrate so as to prevent "print through" effects caused by electrical and geometric characteristic of the substrate. The active species are then flowed "downstream" from the plasma chamber 12 to the surface of the substrate 20 through an outlet 16 having an interactive flange 18 attached to the terminal end. The interactive flange 18 provides a surface separate from the substrate to consume the active species. The interactive flange inhibits the etching reaction from occurring outside of the local material removal footprint. The distance between the oulet and surface of the substrate is adjustable to provide a means to control the material removal footprint and removal footprint profile.
Inventors
- 👤 Charles B. Zarowin
- 👤 L. David Bollinger
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 11:37
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/32623; H10; H10P; H10P52/00; H01J37/32009; H01J37/32357; H01J37/32366; H01J37/32633
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
154 words
An apparatus for performing localized plasma assisted chemical etching reactions on the surface of an etchable substrate comprising: a plasma chamber for containing a reactive gas and plasma having an inlet for introducing said reactive gas to said chamber means and an outlet for exhausting said plasma from the plasma chamber; means for applying excitation to said plasma to convert said reactive gas into said plasma wherein the plasma chamber has a toroidal shape and includes a toroidal core and wherein the means for applying excitation to said reactive gas includes a ferromagnetic toroidal coil located proximate said toroidally shaped plasma chamber such that an inductively coupled plasma within said chamber acts as a secondary loop around the toroidal core; and means for local application of said plasma to the surface of said substrate so as to define an etching footprint having a shape substantially defined by the shape of the plasma chamber outlet.
Claim 2
Independent Claim
154 words
An apparatus for performing localized plasma assisted chemical etching reactions on the surface of an etchable substrate comprising: a plasma chamber for containing a reactive gas and plasma having an inlet for introducing said reactive gas to said chamber means and an outlet for exhausting said plasma from the plasma chamber; means for applying excitation to said plasma to convert said reactive gas into said plasma wherein the plasma chamber has a toroidal shape and includes a toroidal core and wherein the means for applying excitation to said reactive gas includes a ferromagnetic toroidal coil located proximate said toroidally shaped plasma chamber such that an inductively coupled plasma within said chamber acts as a secondary loop around the toroidal core; and means for local application of said plasma to the surface of said substrate so as to define an etching footprint having a shape substantially defined by the shape of the plasma chamber outlet.
Claim 3
Dependent Claim
37 words
The apparatus of claim 1, wherein the terminating end of the plasma chamber outlet has flange attached thereto located proximally to the surface to be etched so as to form a consumable reactive surface with the plasma.
Claim 4
Dependent Claim
20 words
The apparatus of claim 2, wherein the flange is constructed out of a material which is interactive with said plasma.
Claim 5
Dependent Claim
11 words
The apparatus of claim 3, wherein the interactive material is carbon.
Claim 6
Dependent Claim
11 words
The apparatus of claim 3, wherein the interactive material is silicon.
Claim 7
Independent Claim
155 words
An apparatus for performing local plasma assisted chemical etching reactions on the surface of a substrate comprising: a plasma chamber for containing a reactive gas and plasma having an inlet for introducing said reactive gas and an outlet for exhausting said plasma from the plasma chamber; rf discharge means for inductively applying rf excitation to said plasma chamber wherein the plasma chamber has a toroidal shape and includes a toroidal core and wherein the means for applying excitation to said reactive gas includes a ferromagnetic toroidal coil located proximate said toroidally shaped plasma chamber such that an inductively coupled plasma within said chamber acts as a secondary loop around the toroidal core; an interactive flange attached to the terminating end of the plasma chamber outlet so as to provide a consumable reactive surface proximally to the substrate surface to prevent plasma from reacting with the substrate surface outside of the area defined by the outlet.
Claim 8
Independent Claim
155 words
An apparatus for performing local plasma assisted chemical etching reactions on the surface of a substrate comprising: a plasma chamber for containing a reactive gas and plasma having an inlet for introducing said reactive gas and an outlet for exhausting said plasma from the plasma chamber; rf discharge means for inductively applying rf excitation to said plasma chamber wherein the plasma chamber has a toroidal shape and includes a toroidal core and wherein the means for applying excitation to said reactive gas includes a ferromagnetic toroidal coil located proximate said toroidally shaped plasma chamber such that an inductively coupled plasma within said chamber acts as a secondary loop around the toroidal core; an interactive flange attached to the terminating end of the plasma chamber outlet so as to provide a consumable reactive surface proximally to the substrate surface to prevent plasma from reacting with the substrate surface outside of the area defined by the outlet.
Claim 9
Dependent Claim
13 words
The apparatus of claim 6, wherein the flange is constructed out of carbon.
Claim 10
Dependent Claim
13 words
The apparatus of claim 6, wherein the flange is constructed out of silicon.
References Cited (Backward Citations)
US4088926A
Cited
US4461954A
Cited
US4350578A
Cited
US4668366A
Cited
JPS61139029A
Cited
US4793975A
Cited
US4859908A
Cited
US4853250A
Cited
US5000771A
Cited
US5144196A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1997-02-28 | 1997-08-30 | 1998-03-01 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-02-28 | 2001-08-30 | 2002-03-01 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-02-28 | 2005-08-30 | 2006-03-01 | $7700.00 | Window Closed / Lapsed |