US5286534A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process for plasma deposition of a carbon rich coating
Assignee: 3M Co
•
Filing: 1993-03-31
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Granted: 1994-02-15
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Expires: 2013-03-31
Abstract
Abstract The present invention provides a magnetic recording medium that includes a polymeric flexible substrate and a magnetic layer coating thereon, with a binderless carbon rich layer adhered to the magnetic layer. The present invention also provides a process for the plasma deposition of the carbon rich coating onto a magnetic medium comprising the steps of: a. providing a magnetic medium in a vacuum chamber; b. generating carbon rich plasma in the vacuum chamber by injecting a plasma gas suitable to provide a carbon rich coating into an elongated hollow cathode; and providing a sufficient voltage to create and maintain plasma; and maintaining a vacuum in the vacuum chamber sufficient for the plasma; and c. exposing the magnetic medium to the plasma while the magnetic medium is influenced by a radio frequency bias electrode to accelerate the plasma towards the magnetic medium and deposit the carbon rich coating on the magnetic medium.
Inventors
- 👤 Gunter A. Kohler
- 👤 Richard W. Duerst
- 👤 Daniel P. Stubbs
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 21:50
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/22; C23C16/26; C23C16/44; C23C16/50; C23C16/513; G; G11; G11B; G11B5/00; G11B5/62; G11B5/72; G11B5/725; G11B5/7253; G11B5/7257; G11B5/727; G11B5/84; G11B5/8408
Claims Analysis
Total Claims: 15
Claim 1
Independent Claim
120 words
A process for the plasma deposition of a carbon rich coating onto a substrate comprising the steps of: A. providing a substrate in a vacuum chamber; B. generating a carbon rich plasma in the vacuum chamber by: 1) injecting a plasma gas, suitable to provide a carbon rich coating, into an elongated hollow cathode; 2) providing a sufficient voltage to create and maintain a carbon rich plasma in the hollow cathode; 3) maintaining a vacuum in said vacuum chamber sufficient for said plasma; C. exposing said substrate to said plasma while said substrate is in close proximity to a radio frequency bias means, whereby said plasma is accelerated towards said substrate and is deposited thereon as a carbon rich coating.
Claim 2
Dependent Claim
120 words
A process for the plasma deposition of a carbon rich coating onto a substrate comprising the steps of: A. providing a substrate in a vacuum chamber; B. generating a carbon rich plasma in the vacuum chamber by: 1) injecting a plasma gas, suitable to provide a carbon rich coating, into an elongated hollow cathode; 2) providing a sufficient voltage to create and maintain a carbon rich plasma in the hollow cathode; 3) maintaining a vacuum in said vacuum chamber sufficient for said plasma; C. exposing said substrate to said plasma while said substrate is in close proximity to a radio frequency bias means, whereby said plasma is accelerated towards said substrate and is deposited thereon as a carbon rich coating.
Claim 3
Dependent Claim
13 words
The process of claim 1 wherein the substrate is a magnetic recording medium.
Claim 4
Dependent Claim
31 words
The process of claim 2 wherein the magnetic medium contacts said radio frequency bias means during deposition of the plasma and said radio frequency bias means is an electrically conductive plate.
Claim 5
Dependent Claim
37 words
The process of claim 2 wherein said magnetic medium comprises a flexible non-magnetic substrate, and a polymeric binder containing a magnetizable pigment, wherein said carbon rich layer is coated onto said polymeric binder containing a magnetizable pigment.
Claim 6
Dependent Claim
22 words
The process of claim 1 wherein the voltage created and maintained in said vacuum chamber is generated by a pulsed DC-power supply.
Claim 7
Dependent Claim
28 words
The process of claim 1 wherein the voltage created and maintained in the hollow cathode is -200 to -4,000 volts and the current is 250 to 3,000 mA.
Claim 8
Dependent Claim
24 words
The process of claim 1 wherein the hollow cathode comprises a refractory material selected from the group consisting of graphite, molybdenum, tungsten, and tantalum.
Claim 9
Dependent Claim
20 words
The process of claim 1 wherein the elongated hollow cathode has a length of diameter ratio of 15:1 to 1:1.
Claim 10
Dependent Claim
35 words
The process of claim 1 wherein said plasma gas includes a gas selected from the group consisting of saturated and unsaturated hydrocarbons, nitrogen containing hydrocarbons, oxygen containing hydrocarbons, halogen containing hydrocarbons, and silicon containing hydrocarbons.
Claim 11
Dependent Claim
20 words
The process of claim 1 wherein the vacuum in the vacuum chamber is maintained at about 1 to 300 mTorr.
Claim 12
Dependent Claim
28 words
The process of claim 1 wherein the plasma gas is injected into the hollow cathode at a total feed gas flow rate of about 10 to 500 sccm.
Claim 13
Dependent Claim
30 words
The process of claim 1 wherein the radio frequency bias means has a frequency of 100 KHz to 400 KHz and a bias voltage of 100 volts to 1500 volts.
Claim 14
Dependent Claim
20 words
The process of claim 1 further including one or more additional hollow cathodes that generates one or more additional plasmas.
Claim 15
Dependent Claim
18 words
The process of claim 13, wherein more than one type of coating is deposited onto said magnetic medium.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1997-02-14 | 1997-08-16 | 1998-02-15 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-02-14 | 2001-08-16 | 2002-02-15 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-02-14 | 2005-08-16 | 2006-02-15 | $7700.00 | Window Closed / Lapsed |