Abstract Proposed is a dry etching method for etching a layer of an aluminum-based material, by means of which resist selectivity and underlying layer selectivity may be improved and maintenance of an etching apparatus may be facilitated. According to the present invention, the etching process is carried out in two steps, that is, a step of removing a native oxide film present on the surface of a layer of an aluminum-based material, using a reducing compound, such as BCl 3 , SiCl 4 or Si 2 S 2 Cl 4 (tetrachlorocyclodisilthiane), and a subsequent step of etching the layer of the aluminum-based material using sulfur chloride such as S 2 Cl 2 . BCl 3 is reacted with residual oxygen in the apparatus to generate a large quantity of solid B 2 O 3 , so that problems were raised in the conventional process in connection with worsened maintenance. However, BCl 3 raises no problem with the present invention because it is used during only a short time period at the beginning of etching. Besides, since the reducing compound is not brought into contact with the underlying SiO 2 interlayer insulating film, underlying layer selectivity is improved. In addition, since sulfur (S) dissociated from sulfur chloride into a plasma is utilized for sidewall protection in the course of etching of the layer of the aluminum-based material, incident ion energies required for anisotropic etching may be diminished and resist selectivity may be improved.
A dry etching method comprising the steps of removing a native oxide film on the surface of a layer of an aluminum-based material to form an exposed layer by using an etching gas containing at least one compound selected from the group consisting of BCl 3 , SiCl 4 and a compound selected from a group consisting of Si 2 S 2 Cl 4 , Si 2 S 2 F 4 , SiSCl 2 , and SiSBr 2 , and then etching said exposed layer of the aluminum-based material by using an etching gas containing at least one sulfur chloride selected from the group consisting of S 3 Cl 2 , S 2 Cl 2 and SCl 2 .
Claim 2
Dependent Claim
119 words
A dry etching method comprising the steps of removing a native oxide film on the surface of a layer of an aluminum-based material to form an exposed layer by using an etching gas containing at least one compound selected from the group consisting of BCl 3 , SiCl 4 and a compound selected from a group consisting of Si 2 S 2 Cl 4 , Si 2 S 2 F 4 , SiSCl 2 , and SiSBr 2 , and then etching said exposed layer of the aluminum-based material by using an etching gas containing at least one sulfur chloride selected from the group consisting of S 3 Cl 2 , S 2 Cl 2 and SCl 2 .
Claim 3
Dependent Claim
106 words
A dry etching method comprising the steps of first removing a native oxide film on a surface of a layer of an aluminum-based material to form an exposed layer by using an etching gas containing at least one compound selected from a group consisting of BCl 3 , SiCl 4 and a compound containing Si, S and a halogen as constituent elements, and then etching said exposed layer of aluminum material by using an etching gas free of BCl 3 and containing at least one sulfur chloride selected from a group consisting of S 3 Cl 2 , S 2 Cl 2 and SCl 2 .
Claim 4
Dependent Claim
106 words
A dry etching method comprising the steps of first removing a native oxide film on a surface of a layer of an aluminum-based material to form an exposed layer by using an etching gas containing at least one compound selected from a group consisting of BCl 3 , SiCl 4 and a compound containing Si, S and a halogen as constituent elements, and then etching said exposed layer of aluminum material by using an etching gas free of BCl 3 and containing at least one sulfur chloride selected from a group consisting of S 3 Cl 2 , S 2 Cl 2 and SCl 2 .