Method for patterning metal oxide thin film

Claim 1

A method for patterning a metal oxide thin film comprising the steps of: (1) preparing a mixture comprising (a) at least one member selected from alkoxide of an element selected from the following Group A and alkoxyalcoholate of an element selected from the following Group A, and (b) at least one member selected from alcohol selected from the following Group B and alkoxyalcohol selected from the following Group B: Group A: lithium, beryllium, boron, sodium, aluminum, potassium, calcium, scandium, titanium, vanadium, chromium, manganese, iron, cobalt, nickel, copper, zinc, gallium, germanium, arsenic, selenium, rubidium, strontium, zirconium, niobium, rhodium, palladium, cadmium, indium, tin, antimony, tellurium, cesium, barium, lanthanum, cerium, praseodymium, neodymium, europium, gadolinium, terbium, holmium, ytterbium, ruthenium, hafnium, tantalum, platinum, lead, bismuth, and thorium, Group B: methanol, ethanol, propanol, butanol, methoxyethanol, ethoxyethanol, propoxyethanol, and butoxyethanol; (2) mixing an acid-generating agent which generates an acid under light, laser beams, electron beams or X-rays with the mixture; (3) applying the mixture to a substrate to form a thin film and drying the thin film; (4) selectively irradiating the thin film formed on the substrate with light, laser beams, electron beams or X-rays to accelerate the gelation. (5) removing the non-irradiated thin film in the step (4) by etching; and (6) burning the remaining thin film in the step (5).

Claim 2

A method for patterning a metal oxide thin film comprising the steps of: (1) preparing a mixture comprising (a) at least one member selected from alkoxide of an element selected from the following Group A and alkoxyalcoholate of an element selected from the following Group A, and (b) at least one member selected from alcohol selected from the following Group B and alkoxyalcohol selected from the following Group B: Group A: lithium, beryllium, boron, sodium, aluminum, potassium, calcium, scandium, titanium, vanadium, chromium, manganese, iron, cobalt, nickel, copper, zinc, gallium, germanium, arsenic, selenium, rubidium, strontium, zirconium, niobium, rhodium, palladium, cadmium, indium, tin, antimony, tellurium, cesium, barium, lanthanum, cerium, praseodymium, neodymium, europium, gadolinium, terbium, holmium, ytterbium, ruthenium, hafnium, tantalum, platinum, lead, bismuth, and thorium, Group B: methanol, ethanol, propanol, butanol, methoxyethanol, ethoxyethanol, propoxyethanol, and butoxyethanol; (2) mixing an acid-generating agent which generates an acid under light, laser beams, electron beams or X-rays with the mixture; (3) applying the mixture to a substrate to form a thin film and drying the thin film; (4) selectively irradiating the thin film formed on the substrate with light, laser beams, electron beams or X-rays to accelerate the gelation. (5) removing the non-irradiated thin film in the step (4) by etching; and (6) burning the remaining thin film in the step (5).

Claim 4

A method for patterning a barium titanate thin film comprising the steps of: (1) preparing a mixture comprising at least one compound selected from the following Group E, at least one compound selected from the following Group C, and at least one compound selected from the following Group D: Group E: barium methoxide, barium ethoxide, barium propoxide, barium butoxide, barium methoxyethoxide, and barium ethoxyethoxide, Group C: titanium methoxide, titanium ethoxide, titanium propoxide, titanium butoxide, titanium methoxyethoxide, and titanium ethoxyethoxide, Group D: methanol, ethanol, propanol, butanol, methoxyethanol, and ethoxyethanol; (2) mixing an acid-generating agent which generates an acid under light, laser beams, electron beams or X-rays with the mixture; (3) applying the mixture to a substrate to form a thin film and drying the thin film; (4) selectively irradiating the thin film formed on the substrate with light, laser beams, electron beams or X-rays to accelerate the gelation; (5) removing the non-irradiated thin film in the step (4) by etching; and (6) burning the remaining thin film in the step (5).

Claim 5

A method for patterning a barium titanate thin film comprising the steps of: (1) preparing a mixture comprising at least one compound selected from the following Group E, at least one compound selected from the following Group C, and at least one compound selected from the following Group D: Group E: barium methoxide, barium ethoxide, barium propoxide, barium butoxide, barium methoxyethoxide, and barium ethoxyethoxide, Group C: titanium methoxide, titanium ethoxide, titanium propoxide, titanium butoxide, titanium methoxyethoxide, and titanium ethoxyethoxide, Group D: methanol, ethanol, propanol, butanol, methoxyethanol, and ethoxyethanol; (2) mixing an acid-generating agent which generates an acid under light, laser beams, electron beams or X-rays with the mixture; (3) applying the mixture to a substrate to form a thin film and drying the thin film; (4) selectively irradiating the thin film formed on the substrate with light, laser beams, electron beams or X-rays to accelerate the gelation; (5) removing the non-irradiated thin film in the step (4) by etching; and (6) burning the remaining thin film in the step (5).

Claim 6

A method for patterning a lead titanate thin film comprising the steps of: (1) preparing a mixture comprising at least one compound selected from the following Group F, at least one compound selected from the following Group G, and at least one compound selected from the following Group D: Group F: lead methoxide, lead ethoxide, lead propoxide, and lead butoxide, Group G: titanium methoxide, titanium ethoxide, titanium propoxide, and titanium butoxide, Group D: methanol, ethanol, propanol, butanol, methoxyethanol, and ethoxyethanol; (2) mixing an acid-generating agent which generates an acid under light, laser beams, electron beams or X-rays with the mixture; (3) applying the mixture to a substrate to form a thin film and drying the thin film; (4) selectively irradiating the thin film formed on the substrate with light, laser beams, electron beams or X-rays to accelerate the gelation; (5) removing the non-irradiated thin film in the step (4) by etching; and (6) burning the remaining thin film in the step (5).

Claim 7

A method for patterning a lead titanate thin film comprising the steps of: (1) preparing a mixture comprising at least one compound selected from the following Group F, at least one compound selected from the following Group G, and at least one compound selected from the following Group D: Group F: lead methoxide, lead ethoxide, lead propoxide, and lead butoxide, Group G: titanium methoxide, titanium ethoxide, titanium propoxide, and titanium butoxide, Group D: methanol, ethanol, propanol, butanol, methoxyethanol, and ethoxyethanol; (2) mixing an acid-generating agent which generates an acid under light, laser beams, electron beams or X-rays with the mixture; (3) applying the mixture to a substrate to form a thin film and drying the thin film; (4) selectively irradiating the thin film formed on the substrate with light, laser beams, electron beams or X-rays to accelerate the gelation; (5) removing the non-irradiated thin film in the step (4) by etching; and (6) burning the remaining thin film in the step (5).

Claim 10

A method for patterning an ITO thin film comprising the steps of: (1) preparing a mixture comprising at least one compound selected from the following Group J, at least one compound selected from the following Group K, and at least one compound selected from the following Group D; Group J: indium methoxide, indium ethoxide, indium propoxide, indium butoxide, indium methoxyethoxide, and indium ethoxyethoxide, Group K: tin methoxide, tin ethoxide, tin propoxide, tin butoxide, tin methoxyethoxide, and tin ethoxyethoxide, Group D: methanol, ethanol, propanol, butanol, methoxyethanol, and ethoxyethanol; (2) mixing an acid-generating agent which generates an acid under light, laser beams, electron beams or X-rays with the mixture; (3) applying the mixture to a substrate to form a thin film and drying the thin film; (4) selectively irradiating the thin film formed on the substrate with light laser beams, electron beams or X-rays to accelerate the gelation; (5) removing the non-irradiated thin film in the step (4) by etching; and (6) burning the remaining thin film in the step (5).

Claim 11

A method for patterning an ITO thin film comprising the steps of: (1) preparing a mixture comprising at least one compound selected from the following Group J, at least one compound selected from the following Group K, and at least one compound selected from the following Group D; Group J: indium methoxide, indium ethoxide, indium propoxide, indium butoxide, indium methoxyethoxide, and indium ethoxyethoxide, Group K: tin methoxide, tin ethoxide, tin propoxide, tin butoxide, tin methoxyethoxide, and tin ethoxyethoxide, Group D: methanol, ethanol, propanol, butanol, methoxyethanol, and ethoxyethanol; (2) mixing an acid-generating agent which generates an acid under light, laser beams, electron beams or X-rays with the mixture; (3) applying the mixture to a substrate to form a thin film and drying the thin film; (4) selectively irradiating the thin film formed on the substrate with light laser beams, electron beams or X-rays to accelerate the gelation; (5) removing the non-irradiated thin film in the step (4) by etching; and (6) burning the remaining thin film in the step (5).

Claim 12

A method for patterning a lithium-containing composite oxide thin film comprising the steps of: (1) preparing a mixture comprising at least one compound selected from the following Group L, at least one compound selected from the following Group M, and at least one compound selected from the following Group D: Group L: niobium methoxide, niobium ethoxide, niobium propoxide, niobium butoxide, niobium methoxyethoxide, and niobium ethoxyethoxide, Group M: lithium methoxide, lithium ethoxide, lithium propoxide, lithium butoxide, lithium methoxyethoxide, and lithium ethoxyethoxide, Group D: methanol, ethanol, propanol, butanol, methoxyethanol, and ethoxyethanol; (2) mixing an acid-generating agent which generates an acid under light, laser beams, electron beams or X-rays with the mixture; (3) applying the mixture to a substrate to form a thin film and drying the thin film; (4) selectively irradiating the thin film formed on the substrate with light, laser beams, electron beams or X-rays to accelerate the gelation; (5) removing the non-irradiated thin film in the step (4) by etching; and (6) burning the remaining thin film in the step (5).

Claim 13

A method for patterning a lithium-containing composite oxide thin film comprising the steps of: (1) preparing a mixture comprising at least one compound selected from the following Group L, at least one compound selected from the following Group M, and at least one compound selected from the following Group D: Group L: niobium methoxide, niobium ethoxide, niobium propoxide, niobium butoxide, niobium methoxyethoxide, and niobium ethoxyethoxide, Group M: lithium methoxide, lithium ethoxide, lithium propoxide, lithium butoxide, lithium methoxyethoxide, and lithium ethoxyethoxide, Group D: methanol, ethanol, propanol, butanol, methoxyethanol, and ethoxyethanol; (2) mixing an acid-generating agent which generates an acid under light, laser beams, electron beams or X-rays with the mixture; (3) applying the mixture to a substrate to form a thin film and drying the thin film; (4) selectively irradiating the thin film formed on the substrate with light, laser beams, electron beams or X-rays to accelerate the gelation; (5) removing the non-irradiated thin film in the step (4) by etching; and (6) burning the remaining thin film in the step (5).

Claim 14

A method for patterning a lithium-containing composite oxide thin film comprising the steps of: (1) preparing a mixture comprises at least one alkoxide or alkoxyalcoholate of an element selected from the following Group N, at least one compound selected from the following Group M, and at least one compound selected from the following Group D; Group N: niobium, tantalum, manganese, and iron Group M: lithium methoxide, lithium ethoxide, lithium propoxide, lithium butoxide, lithium methoxyethoxide, and lithium ethoxyethoxide, Group D: methanol, ethanol, propanol, butanol, methoxyethanol, and ethoxyethanol; (2) mixing an acid-generating agent which generates an acid under light, laser beams, electron beams or X-rays with the mixture; (3) applying the mixture to a substrate to form a thin film and drying the thin film; (4) selectively irradiating the thin film formed on the substrate with light laser beams, electron beams or X-rays to accelerate the gelation; (5) removing the non-irradiated thin film in the step (4) by etching; and (6) burning the remaining thin film in the step (5).

Claim 15

A method for patterning a lithium-containing composite oxide thin film comprising the steps of: (1) preparing a mixture comprises at least one alkoxide or alkoxyalcoholate of an element selected from the following Group N, at least one compound selected from the following Group M, and at least one compound selected from the following Group D; Group N: niobium, tantalum, manganese, and iron Group M: lithium methoxide, lithium ethoxide, lithium propoxide, lithium butoxide, lithium methoxyethoxide, and lithium ethoxyethoxide, Group D: methanol, ethanol, propanol, butanol, methoxyethanol, and ethoxyethanol; (2) mixing an acid-generating agent which generates an acid under light, laser beams, electron beams or X-rays with the mixture; (3) applying the mixture to a substrate to form a thin film and drying the thin film; (4) selectively irradiating the thin film formed on the substrate with light laser beams, electron beams or X-rays to accelerate the gelation; (5) removing the non-irradiated thin film in the step (4) by etching; and (6) burning the remaining thin film in the step (5).