Device for decontaminating a semiconductor wafer container

Claim 2

A decontamination device for a wafer container having a chamber for storing semiconductor wafers and inner surfaces surrounding said chamber, said container having movable portions manipulatable between a container open condition and a container closed condition, said device comprising: a support/containment assembly having a substantially sealed containment compartment and a support element which at least initially provides a support for said wafer container; a manipulating assembly, movably mounted in said support/containment assembly, and provided with a manipulator which manipulates said wafer container between said open condition and said closed condition and which places said chamber, when such wafer container is in said open condition, in a position whereat it forms a portion of said containment compartment and is in flow communicating what said containment compartment; and a gas flow assembly, mounted on said support/containment assembly, which supplies a substantially continuous flow of circulation gas throughout said containment compartment and throughout said container chamber when it is in flow communication with said containment compartment, a manifold within said containment compartment movable with respect to said containment compartment which dispenses blow-off gas provided from said gas flow assembly, said manifold being sized to fit within said chamber of said wafer container; said manipulating assembly also positions said manifold within said chamber and in close proximity to said inner surfaces whereby said blow-off gas contacts said inner surfaces and whereby particles adhered to said surfaces will be released and entrained by said continuous flow of circulating gas.

Claim 3

A decontamination device as set forth in claim 1 wherein said gas flow assembly includes an ionization element which periodically ionizes the gas flows through said containment compartment whereby statically charged containment particles adhered to said inner surfaces of said wafer container will be released and entrained by said flow of circulation gas.

Claim 4

A decontamination device as set forth in claim 1 wherein said gas flow assembly further includes: a blower which induces the circulation gas to circulate through said containment compartment; a filter, sealably connected to the outlet of said blower, which filters said circulation gas thereby creating a flow of filtered circulation gas; a circulation gas supply which supplies said filtered circulation gas to said manifold; and a blow-off gas supply which supplies said blow-off gas to said manifold.

Claim 5

A decontamination device as set forth in claim 1 wherein said manipulating assembly comprises a first manipulating assembly including: a container-manipulating mechanism which manipulates said wafer container; and a manifold-manipulating mechanism which positions said manifold within such chamber and in close proximity to said inner surfaces.

Claim 6

A decontamination device for a wafer container having a chamber for storing semiconductor wafers and inner surfaces surrounding said chamber, said container having movable portions manipulatable between a container open condition and a container closed condition, said device comprising: a support/containment assembly having a substantially sealed containment compartment and a support element which at least initially provides a support for said wafer container; a manipulating assembly, movably mounted in said support/containment assembly, and provided with a manipulator which manipulates such wafer container between said open condition and said closed condition and which places said chamber, when said wafer container is in said open condition, in a position whereat it forms an extension of id containment compartment nd is in communication with said containment compartment; and a gas flow assembly, mounted on said support/containment assembly, which supplies a substantially continuous flow of circulation gas throughout said containment compartment and throughout said container chamber when it is in flow communication with said containment compartment, a manifold within said containment compartment movable with respect to said containment compartment which dispenses said circulation gas and blow off gas provided from said gas flow assembly, said manifold comprising a main body and a bottom extension, said main body being sized to fit within said chamber of said wafer container; said manipulating assembly also positions said main body portion of said manifold within said chamber and in close proximity to said inner surfaces whereby said blow-off gas contacts said inner surfaces and whereby particles adhered to said surfaces will be released and entrained by said continuous flow of circulation gas; and wherein said gas flow assembly further includes a blower which induces said circulation gas to circulate through said containment compartment, a filter which is sealably connected to the outlet of said blower and which filters said circulation gas thereby creating a flow of filtered circulation gas, a circulation gas supply which supplies said filtered circulation gas to said manifold; and a blow-off gas supply which supplies said blow-off gas to said manifold.

Claim 7

A decontamination device for a wafer container having a chamber for storing semiconductor wafers and inner surfaces surrounding said chamber, said container having movable portions manipulatable between a container open condition and a container closed condition, said device comprising: a support/containment assembly having a substantially sealed containment compartment and a support element which at least initially provides a support for said wafer container; a manipulating assembly, movably mounted in said support/containment assembly, and provided with a manipulator which manipulates such wafer container between said open condition and said closed condition and which places said chamber, when said wafer container is in said open condition, in a position whereat it forms an extension of id containment compartment nd is in communication with said containment compartment; and a gas flow assembly, mounted on said support/containment assembly, which supplies a substantially continuous flow of circulation gas throughout said containment compartment and throughout said container chamber when it is in flow communication with said containment compartment, a manifold within said containment compartment movable with respect to said containment compartment which dispenses said circulation gas and blow off gas provided from said gas flow assembly, said manifold comprising a main body and a bottom extension, said main body being sized to fit within said chamber of said wafer container; said manipulating assembly also positions said main body portion of said manifold within said chamber and in close proximity to said inner surfaces whereby said blow-off gas contacts said inner surfaces and whereby particles adhered to said surfaces will be released and entrained by said continuous flow of circulation gas; and wherein said gas flow assembly further includes a blower which induces said circulation gas to circulate through said containment compartment, a filter which is sealably connected to the outlet of said blower and which filters said circulation gas thereby creating a flow of filtered circulation gas, a circulation gas supply which supplies said filtered circulation gas to said manifold; and a blow-off gas supply which supplies said blow-off gas to said manifold.

Claim 8

A decontamination device for a wafer container having a chamber for storing semiconductor wafers and inner surfaces surrounding said chamber, said container having movable portions manipulatable between a container open condition and a container closed condition, said device comprising: a support/containment assembly having a substantially sealed containment compartment and a support element which at least initially provides a support for said wafer container; a manipulating assembly, movable mounted in said support/containment assembly, and provided with a manipulator which manipulates said wager container between said open condition and said closed condition and which places said chamber, when such wafer container is in said open condition, in a position whereat it forms an extension of said containment compartment nd is in flow communication with said containment compartment; and a gas flow assembly, mounted on said support/containment assembly, which supplies a substantially continuous flow of circulation gas throughout said containment compartment and throughout said container chamber when it is in flow communication with said containment compartment, a manifold within said containment compartment movable with respect to said containment compartment which dispenses said circulation gas and glow off gas provided from said gas flow assembly, said manifold comprising a main body and a bottom extension, said main body being sized to fit within said chamber of said wafer container; said manipulating assembly also position said main body portion of said manifold within said chamber and in close proximity to said inner surfaces whereby said blow-off gas contacts said inner surfaces and whereby particles adhered to said surfaces will be released and entrained by said continuous flow of circulation gas; and wherein said gas flow assembly further includes a blower which induces said circulation gas to circulate through said containment compartment, a filer which is sealably connected to the outlet of said blower and which filers said circulation gas thereby creating a flow of filtered circulation gas, a circulation gas supply which supplies said filtered circulation gas to said manifold; and a blow-off gas supply which supplies said blow-off gas to said manifold; and wherein said manifold further comprises a circulation gas dispenser located on said main body, a top blow-off gas dispenser located on a top portion of said main body, a side blow-off gas dispenser located on said portions of said main body, a bottom blow-off gas dispenser located on said bottom extension a top ionization element located within said main body, and a bottom ionization element located within in said bottom extension.

Claim 9

A decontamination device for a wafer container having a chamber for storing semiconductor wafers and inner surfaces surrounding said chamber, said container having movable portions manipulatable between a container open condition and a container closed condition, said device comprising: a support/containment assembly having a substantially sealed containment compartment and a support element which at least initially provides a support for said wafer container; a manipulating assembly, movable mounted in said support/containment assembly, and provided with a manipulator which manipulates said wager container between said open condition and said closed condition and which places said chamber, when such wafer container is in said open condition, in a position whereat it forms an extension of said containment compartment nd is in flow communication with said containment compartment; and a gas flow assembly, mounted on said support/containment assembly, which supplies a substantially continuous flow of circulation gas throughout said containment compartment and throughout said container chamber when it is in flow communication with said containment compartment, a manifold within said containment compartment movable with respect to said containment compartment which dispenses said circulation gas and glow off gas provided from said gas flow assembly, said manifold comprising a main body and a bottom extension, said main body being sized to fit within said chamber of said wafer container; said manipulating assembly also position said main body portion of said manifold within said chamber and in close proximity to said inner surfaces whereby said blow-off gas contacts said inner surfaces and whereby particles adhered to said surfaces will be released and entrained by said continuous flow of circulation gas; and wherein said gas flow assembly further includes a blower which induces said circulation gas to circulate through said containment compartment, a filer which is sealably connected to the outlet of said blower and which filers said circulation gas thereby creating a flow of filtered circulation gas, a circulation gas supply which supplies said filtered circulation gas to said manifold; and a blow-off gas supply which supplies said blow-off gas to said manifold; and wherein said manifold further comprises a circulation gas dispenser located on said main body, a top blow-off gas dispenser located on a top portion of said main body, a side blow-off gas dispenser located on said portions of said main body, a bottom blow-off gas dispenser located on said bottom extension a top ionization element located within said main body, and a bottom ionization element located within in said bottom extension.

Claim 10

A decontamination device for a wafer container having a chamber for storing semiconductor wafers and inner surfaces surrounding said chamber, said container having movable portions manipulatable between a container open condition and a container closed condition, said device comprising: a support/containment assembly having a substantially sealed containment compartment and a support element which at least initially provides a support for said wafer container; a manipulating assembly, movably mounted in said support/containment assembly, which manipulates said wafer container between said open condition and said closed condition and which places said chamber, when said wafer container is in said open condition, in a position whereat it forms an extension of said containment compartment and is in flow communication with said containment compartment; and a gas flow assembly, mounted on said support/containment assembly, which supplies a substantially continuous flow of circulation gas throughout said containment compartment and throughout said container chamber when it is in flow communication with said containment compartment, a manifold within said containment compartment movable with respect to said containment compartment for dispensing blow-off gas provided from said gas flow assembly, said manifold being sized to fit within such chamber of such wafer container; said manipulating assembly also positions said manifold within said chamber and in close proximity to said inner surfaces whereby said blow-off gas contacts said inner surfaces and whereby particles adhered to said surfaces will be released and entrained by said continuous flow of circulating gas; wherein said manipulating assembly comprises a first manipulating assembly including a container-manipulating mechanism which manipulates said wafer container, and a manifold-manipulating mechanism which positions said manifold within said chamber and in close proximity to said inner surfaces; and wherein said manipulating assembly further comprises a second manipulating assembly which mounts said manifold on said first manipulating assembly.

Claim 11

A decontamination device for a wafer container having a chamber for storing semiconductor wafers and inner surfaces surrounding said chamber, said container having movable portions manipulatable between a container open condition and a container closed condition, said device comprising: a support/containment assembly having a substantially sealed containment compartment and a support element which at least initially provides a support for said wafer container; a manipulating assembly, movably mounted in said support/containment assembly, which manipulates said wafer container between said open condition and said closed condition and which places said chamber, when said wafer container is in said open condition, in a position whereat it forms an extension of said containment compartment and is in flow communication with said containment compartment; and a gas flow assembly, mounted on said support/containment assembly, which supplies a substantially continuous flow of circulation gas throughout said containment compartment and throughout said container chamber when it is in flow communication with said containment compartment, a manifold within said containment compartment movable with respect to said containment compartment for dispensing blow-off gas provided from said gas flow assembly, said manifold being sized to fit within such chamber of such wafer container; said manipulating assembly also positions said manifold within said chamber and in close proximity to said inner surfaces whereby said blow-off gas contacts said inner surfaces and whereby particles adhered to said surfaces will be released and entrained by said continuous flow of circulating gas; wherein said manipulating assembly comprises a first manipulating assembly including a container-manipulating mechanism which manipulates said wafer container, and a manifold-manipulating mechanism which positions said manifold within said chamber and in close proximity to said inner surfaces; and wherein said manipulating assembly further comprises a second manipulating assembly which mounts said manifold on said first manipulating assembly.

Claim 12

A decontamination device as set forth in claim 7 wherein said support/containment assembly supports the portions of said wafer container forming such chamber in a substantially stationary manner and wherein said manifold-manipulating mechanism includes an elevator which vertically moves said manifold past said inner surfaces of said chamber.

Claim 13

A decontamination device as set forth in claim 8 wherein said second manipulating assembly includes a loading mechanism which moves said manifold from a rest position horizontally offset from said elevator to a transfer position vertically aligned with said elevator.

Claim 14

A decontamination device as set forth in claim 9 wherein said loading mechanism includes a cylinder-position unit having a piston and a load arm having a first end and an opposite end, said load arm including a holding device for said manifold at said first end and said load arm being operatively connected to the piston of said cylinder-piston unit at the opposite end whereby when said piston is retracted said manifold is placed in said rest position and when piston is extended said manifold is placed in said transfer position.

Claim 15

A decontamination device as set forth in claim 10 wherein said elevator includes a horizontal platform which holds said manifold and wherein said elevator moves said horizontal platform between: a manifold-loading level whereat said manifold is positioned slightly above, and vertically aligned with, said horizontal platform; a manifold-unloading level whereat said manifold may be positioned horizontally aligned with said load arm; an upper blow-off level whereat said manifold may be positioned within such chamber of such container; and a container-manipulating level whereat said first manipulating assembly is positioned to manipulate such container.

Claim 16

A decontamination device for a wafer container having a chamber for storing semiconductor wafers and inner surfaces surrounding said chamber, said container having a top portion and a removable bottom portion and being manipulable between a container open condition by removing the bottom portion whereby the portions are detached from each other and a container closed condition whereat said portions are connected to each other, said device comprising: a support/containment assembly having a substantially sealed containment compartment and a support element which at least initially provides a support for said wafer container; a manipulating assembly movably mounted in said support/containment assembly and provided with a manipulator for manipulating said wafer container sin such a manner that said top portion is detached from said bottom portion and said chamber is placed in a position whereat it forms an extension of said containment compartment and is in flow communication with said containment compartment; and a gas flow assembly, mounted on said support/containment assembly, for supplying a substantially continuous flow of circulating gas throughout said containment compartment ad throughout said container chamber when it is in flow communication with said containment compartment, a movable manifold within said containment compartment which dispenses blow-off gas provided from said gas flow assembly, said manifold being sized to fit within said chamber of said wafer container; said manipulating assembly also positions said manifold within said chamber and in close proximity to said inner surfaces whereby said blow-off gas contacts said inner surfaces and whereby particles adhered to said surfaces will be released and entrained by said continuous flow of circulation gas.

Claim 17

A decontamination device for a wafer container having a chamber for storing semiconductor wafers and inner surfaces surrounding said chamber, said container having a top portion and a removable bottom portion and being manipulable between a container open condition by removing the bottom portion whereby the portions are detached from each other and a container closed condition whereat said portions are connected to each other, said device comprising: a support/containment assembly having a substantially sealed containment compartment and a support element which at least initially provides a support for said wafer container; a manipulating assembly movably mounted in said support/containment assembly and provided with a manipulator for manipulating said wafer container sin such a manner that said top portion is detached from said bottom portion and said chamber is placed in a position whereat it forms an extension of said containment compartment and is in flow communication with said containment compartment; and a gas flow assembly, mounted on said support/containment assembly, for supplying a substantially continuous flow of circulating gas throughout said containment compartment ad throughout said container chamber when it is in flow communication with said containment compartment, a movable manifold within said containment compartment which dispenses blow-off gas provided from said gas flow assembly, said manifold being sized to fit within said chamber of said wafer container; said manipulating assembly also positions said manifold within said chamber and in close proximity to said inner surfaces whereby said blow-off gas contacts said inner surfaces and whereby particles adhered to said surfaces will be released and entrained by said continuous flow of circulation gas.

Claim 18

A method of using the decontamination device set forth in claim 3 to decontaminate a wafer container having a chamber for storing semiconductor wafers and inner surfaces surrounding said chamber, said container being manipulatable between a container open condition and a container closed condition, said method comprising the steps of: providing a substantial sealed containment compartment; continuously supplying and filtering a flow of circulation gas throughout the containment compartment; manipulating the wafer container between said closed condition and said open condition and placing the chamber, when said wafer container is in said open condition, in a position whereat it forms an extension of said sealed containment compartment and is in communication with the sealed containment compartment whereby the circulation gas flows throughout the chamber; connecting a manifold to a supply of blow-off gas; inserting the manifold within the chamber of the wafer container; and periodically supplying a flow of blow-off gas and directing the blow-off gas toward the inner surfaces of the wafer container whereby the blow-off gas will contact the inner surfaces and whereby particles adhered to said surfaces will be released and entrained by the continuous flow of circulation gas.

Claim 19

A decontamination device for a wafer container having a chamber for storing semiconductor wafers and inner surfaces surrounding such chamber, such container including a top portion and a bottom portion, the container being placed in an open condition when the portions are connected to each other and being placed in a closed condition when id portions are detached from each other, said device comprising: a support/containment assembly which provided a substantially sealed containment compartment nd which at least initially provides a support for such wafer container; a manipulating assembly, mounted on said support/containment assembly, which manipulates such wafer container whereby such top portion is detached from such bottom portion and such chamber is placed in communication with said containment compartment; and a gas flow assembly, mounted on said support/containment assembly, which supplies a substantially continuous flow of circulation gas throughout said containment compartment nd throughout such chamber when in communication with said containment compartment and which periodically supplies a flow of blow-off gas; wherein said manipulating assembly also positions said gas flow assembly within such chamber and in close proximity to such inner surfaces.

Claim 20

A decontamination device for a wafer container having a chamber for storing semiconductor wafers and inner surfaces surrounding such chamber, such container including a top portion and a bottom portion, the container being placed in an open condition when the portions are connected to each other and being placed in a closed condition when id portions are detached from each other, said device comprising: a support/containment assembly which provided a substantially sealed containment compartment nd which at least initially provides a support for such wafer container; a manipulating assembly, mounted on said support/containment assembly, which manipulates such wafer container whereby such top portion is detached from such bottom portion and such chamber is placed in communication with said containment compartment; and a gas flow assembly, mounted on said support/containment assembly, which supplies a substantially continuous flow of circulation gas throughout said containment compartment nd throughout such chamber when in communication with said containment compartment and which periodically supplies a flow of blow-off gas; wherein said manipulating assembly also positions said gas flow assembly within such chamber and in close proximity to such inner surfaces.