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US5236552A Expired / Lapsed US ⏱️ 0.0 years remaining

Photoresist stripping method

Assignee: Nokia Bell Labs
•
Filing: 1992-04-13
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Granted: 1993-08-17
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Expires: 2012-04-13
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Abstract

Abstract A bath (19) for stripping a cured electrophoretic resist coating (13) consists of a mixture comprising 0.2-50% of a fluoro-containing acetic acid, less than one percent corrosion inhibitors, and 50-99.8% of an amide solvent, preferably a cyclic amide. The amide solvent is preferably N-methylpyrrolidone, and the acid is preferably trifluoroacetic acid.

Inventors

  • 👤 Treliant Fang

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-04 16:25
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/42; G03F7/422; G03F7/426

Claims Analysis

Total Claims: 14
Claim 1
Independent Claim 90 words
A method for making an electronic device comprising the steps of: coating part of a substrate with a photoresist coating; selectively exposing the photoresist to actinic light; developing the photoresist coating in accordance with said selective exposure to actinic light; using the developed photoresist coating as a mask to permit selective operation on part of the underlying substrate; and removing the developed photoresist coating by exposing the coating to a mixture comprising 0.2-50% of a fluoro-containing organic acid, less than one percent corrosion inhibitors, and 50-99.8% of an amide solvent.
Claim 2
Independent Claim 90 words
A method for making an electronic device comprising the steps of: coating part of a substrate with a photoresist coating; selectively exposing the photoresist to actinic light; developing the photoresist coating in accordance with said selective exposure to actinic light; using the developed photoresist coating as a mask to permit selective operation on part of the underlying substrate; and removing the developed photoresist coating by exposing the coating to a mixture comprising 0.2-50% of a fluoro-containing organic acid, less than one percent corrosion inhibitors, and 50-99.8% of an amide solvent.
Claim 3
Dependent Claim 12 words
The method of claim 1 wherein: the photoresist is an electrophoretic photoresist.
Claim 4
Dependent Claim 34 words
The method of claim 1 wherein: the substrate comprises a polymer coating on a solid body, and a metal layer coated on the polymer coating; and the photoresist is coated on the metal layer.
Claim 5
Dependent Claim 23 words
The method of claim 3 wherein: the step of selectively operating on the substrate comprises the step of selectively etching said metal coating.
Claim 6
Dependent Claim 13 words
The method of claim 1 wherein: the fluoro-containing organic acid comprises trifluoroacetic acid.
Claim 7
Dependent Claim 24 words
The method of claim 1 wherein: the amide solvent is selected from the group consisting of dimethyl formamide, dimethyl acetamide, N-methylpyrrolidone, and N-cyclohexyl pyrrolidone.
Claim 8
Dependent Claim 11 words
The method of claim 6 wherein: the amide solvent comprises N-methylpyrrolidone.
Claim 9
Dependent Claim 25 words
The method of claim 7 wherein: the mixture consists of 0.2-50% trifluoroacetic acid, less than one percent of a corrosion inhibitor, and 50-99.8% of N-methylpyrrolidone.
Claim 10
Dependent Claim 11 words
The method of claim 8 wherein: the corrosion inhibitor is 2-mercaptobenzimidazole.
Claim 11
Dependent Claim 12 words
The method of claim 9 wherein: the photoresist is an electrophoretic photoresist.
Claim 12
Dependent Claim 15 words
The method of claim 10 wherein: the electrophoretic photoresist is coated on a metal layer.
Claim 13
Dependent Claim 15 words
The method of claim 11 wherein: the metal layer is coated on a polymer layer.
Claim 14
Dependent Claim 20 words
The method of claim 12 wherein: the polymer layer is a triazine-based polymer and the photoresist is a polymethylmethacrylate-based polymer.

References Cited (Backward Citations)

US3813309A Cited
US3740252A Cited
US4601972A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1996-08-16 1997-02-15 1997-08-17 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2000-08-16 2001-02-15 2001-08-17 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2004-08-16 2005-02-15 2005-08-17 $7700.00 Window Closed / Lapsed

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