US5230847A
Expired / Lapsed
US
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Method of forming refractory metal free standing shapes
Assignee: LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
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Filing: 1991-06-21
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Granted: 1993-07-27
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Expires: 2011-06-21
Abstract
Abstract The present invention provides a method of forming a free standing shape made of a material containing refractory metal, which entails providing a mandrel in a CVD enclosure, injecting a refractory halide gas and a reducing gas in the enclosure, reacting the gases in the enclosure to generate a material containing refractory metal, growing a layer of the material containing refractory metal on the mandrel and removing the mandrel to obtain the free standing shape, wherein the reducing gases is a silicon hydride gas or a mixture thereof.
Inventors
- 👤 Pierre Jalby
- 👤 Pierre Claverie
- 👤 Frederic Rotman
- 👤 Masao Kimura
- 👤 Jean-Marie Friedt
- 👤 Juichi Arai
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-09 03:39
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/22; C23C16/30; C23C16/42; C23C16/01; C23C16/06; C23C16/08; C23C16/14; Y; Y10; Y10T; Y10T29/00; Y10T29/49; Y10T29/4998; Y10T29/49982
Claims Analysis
Total Claims: 16
Claim 1
Independent Claim
178 words
A method of forming a free standing shape made of a material containing refractor metal, which comprises: a) providing a mandrel in a CVD enclosure, b) injecting a refractor metal halide gas selected from the group consisting of WF 6 , MoF 6 , TaF 5 , WCl 6 , MoCl 6 and TaCl 5 and mixtures thereof, and a reducing gas in said enclosure, c) reacting said gases in said CVD enclosure at a temperature of about 20° C. to about 750° C. during deposition, and at a pressure of about 1.33 l Pascal to about atmospheric pressure, d) growing a layer of said material containing refractory metal on said mandrel, and then e) removing the mandrel to obtain the free standing shape, wherein the reducing gas is a silicon hydride gas selected from the group consisting of SiH 4 , Si 2 H 6 and Sui 3 H 8 and mixtures thereof, and wherein a ratio of flow rates between the silicon hydride gas and the metal halide gas is between about 0.2 and about 25.
Claim 2
Independent Claim
178 words
A method of forming a free standing shape made of a material containing refractor metal, which comprises: a) providing a mandrel in a CVD enclosure, b) injecting a refractor metal halide gas selected from the group consisting of WF 6 , MoF 6 , TaF 5 , WCl 6 , MoCl 6 and TaCl 5 and mixtures thereof, and a reducing gas in said enclosure, c) reacting said gases in said CVD enclosure at a temperature of about 20° C. to about 750° C. during deposition, and at a pressure of about 1.33 l Pascal to about atmospheric pressure, d) growing a layer of said material containing refractory metal on said mandrel, and then e) removing the mandrel to obtain the free standing shape, wherein the reducing gas is a silicon hydride gas selected from the group consisting of SiH 4 , Si 2 H 6 and Sui 3 H 8 and mixtures thereof, and wherein a ratio of flow rates between the silicon hydride gas and the metal halide gas is between about 0.2 and about 25.
Claim 3
Dependent Claim
30 words
The method according to claim 1, wherein the mandrel is made of a material selected from the group consisting of metals and alloys thereof which are easily dissolved in acids.
Claim 4
Dependent Claim
20 words
The method according to claim 2, wherein the metal is selected from the group consisting of copper and alloys thereof.
Claim 5
Dependent Claim
16 words
The method according to claim 1, wherein the mandrel is made of an easily machinable material.
Claim 6
Dependent Claim
13 words
The method according to claim 4, wherein the mandrel is made of carbon.
Claim 7
Dependent Claim
26 words
The method according to claim 1, wherein the silicon hydride gas is silane gas (SiH 4 ) and the metal halide gas is WF 6 gas.
Claim 8
Dependent Claim
39 words
The method according to claim 6, wherein the ratio of flowrates of SiH 4 gas is comprised between about 0.5 and about 0.8 in order to obtain a substantially pure tungsten free standing shape metal silicide MSiz wherein 0.01≦z<0.1.
Claim 9
Dependent Claim
37 words
The method according to claim 6, wherein the ratio of flowrates of SiH 4 to WF 6 is comprised between about 0.8 and 25 in order to obtain a layer of WSiz wherein 0.1<z≦3 having anti-corrosion properties.
Claim 10
Dependent Claim
19 words
The method according to claim 6, wherein the temperature is comprised between about 300° C. and about 600° C.
Claim 11
Dependent Claim
23 words
The method according to claim 1, wherein the silicon hydride gas is SiH 4 and the metal halide gas is MoF 6 gas.
Claim 12
Dependent Claim
24 words
The method according to claim 10, wherein the ratio of flowrates of SiH 4 to MoF 6 is comprised between about 2 to 25.
Claim 13
Dependent Claim
54 words
The method according to claim 1, wherein further comprises two steps, a first step for the completion on the mandrel of a first layer of substantially pure refractory metal silicide MSiz with 0.01≦z≦0.1, and a second step for the completion on said first layer of a second layer of metal silicide MSiz with 0.1<z≦3.
Claim 14
Dependent Claim
54 words
The method according to claim 1, wherein further comprises two steps, a first step for the completion on the mandrel of a first layer of metal silicide MSiz with 0.1<z≦3 and a second step for the completion on said first layer of a second layer of substantially pure refractor metal silicide MSiz with 0.01≦z≦0.1.
Claim 15
Dependent Claim
40 words
The method according to claim 1, wherein at least one gaseous substance at the reaction temperature is simultaneously injected in the CVD enclosure with silicon hydride and metallic halide at least during a part of the injection of said gases.
Claim 16
Dependent Claim
37 words
The method according to claim 14, wherein said gaseous substance is selected from the group consisting of hydrocarbons of the formula C n H m and metallic carbonyl compounds of the formula R n (CO) m .
References Cited (Backward Citations)
US3072983A
Cited
US4202080A
Cited
JPS60145376A
Cited
US4851295A
Cited
EP0247783A2
Cited
US4756927A
Cited
US4849260A
Cited
US4830891A
Cited
JPS63286574A
Cited
US5055246A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 1996-07-26 | 1997-01-25 | 1997-07-27 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2000-07-26 | 2001-01-25 | 2001-07-27 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2004-07-26 | 2005-01-25 | 2005-07-27 | $7700.00 | Window Closed / Lapsed |