US5229230A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Photomask
Assignee: Mitsubishi Electric Corp
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Filing: 1991-06-18
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Granted: 1993-07-20
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Expires: 2011-06-18
Abstract
Abstract In a photomask, a rectangular pattern to be transferred to a resist film and a plurality of auxiliary patterns are provided in a light shielding layer which is formed on a transparent plate. The auxiliary patterns are spaced from the rectangular light-transmission pattern so that the Fresnel diffraction light from the auxiliary patterns and the zero-order diffraction light from the rectangular light-transmission pattern intensify each other at a position where a pattern corresponding to the rectangular light-transmission pattern is formed on the resist film. Thus, the light intensity of the pattern on the resist film is increased.
Inventors
- 👤 Kazuya Kamon
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 03:52
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/26; G03F1/30; G03F1/36; G03F7/00; G03F7/70; G03F7/70216; G03F7/70283; G03F1/32
Claims Analysis
Total Claims: 12
Claim 1
Independent Claim
117 words
A photomask for use within transferring a predetermined rectangular pattern to a resist film through a lithography technique; said photomask comprising: a transparent plate; and a light shielding layer formed on said transparent plate, said light shielding layer being provided with a rectangular light-transmission pattern corresponding to a rectangular pattern to be transferred to a resist film and a plurality of auxiliary patterns, wherein said auxiliary patterns are spaced from said rectangular light-transmission pattern so that the Fresnel diffraction light from said auxiliary patterns and the zero-order diffraction light from said rectangular light-transmission pattern are added to each other at a position where a pattern corresponding to said rectangular light-transmission pattern is formed on said resist film.
Claim 2
Dependent Claim
117 words
A photomask for use within transferring a predetermined rectangular pattern to a resist film through a lithography technique; said photomask comprising: a transparent plate; and a light shielding layer formed on said transparent plate, said light shielding layer being provided with a rectangular light-transmission pattern corresponding to a rectangular pattern to be transferred to a resist film and a plurality of auxiliary patterns, wherein said auxiliary patterns are spaced from said rectangular light-transmission pattern so that the Fresnel diffraction light from said auxiliary patterns and the zero-order diffraction light from said rectangular light-transmission pattern are added to each other at a position where a pattern corresponding to said rectangular light-transmission pattern is formed on said resist film.
Claim 3
Dependent Claim
21 words
A photomask in accordance with claim 1, wherein said auxiliary patterns are located symmetrically with respect to said rectangular light-transmission pattern.
Claim 4
Dependent Claim
33 words
A photomask in accordance with claim 2, wherein a phase shift member is filled in each of said auxiliary patterns, said phase shift member shifting the phase of light transmitted said auxiliary patterns.
Claim 5
Dependent Claim
22 words
A photomask in accordance with claim 3, wherein each of said auxiliary patterns is smaller than said rectangular light-transmission pattern in size.
Claim 6
Dependent Claim
24 words
A photomask in accordance with claim 1, wherein said auxiliary patterns are located on a normal line of sides of said rectangular light-transmission pattern.
Claim 7
Dependent Claim
81 words
A photomask for use within transferring a predetermined rectangular pattern to a resist film through a lithography technique; said photomask comprising: a transparent plate; and a light shielding layer formed on said transparent plate, said light shielding layer being provided with a rectangular light-transmission pattern corresponding to a rectangular pattern to be transferred to a resist film, a first auxiliary pattern, and a second auxiliary pattern, wherein said first and second auxiliary patterns are located serially from said rectangular light-transmission pattern.
Claim 8
Dependent Claim
81 words
A photomask for use within transferring a predetermined rectangular pattern to a resist film through a lithography technique; said photomask comprising: a transparent plate; and a light shielding layer formed on said transparent plate, said light shielding layer being provided with a rectangular light-transmission pattern corresponding to a rectangular pattern to be transferred to a resist film, a first auxiliary pattern, and a second auxiliary pattern, wherein said first and second auxiliary patterns are located serially from said rectangular light-transmission pattern.
Claim 9
Dependent Claim
27 words
A photomask in accordance with claim 6, wherein said first and second auxiliary patterns are located on a normal line of sides of said rectangular light-transmission pattern.
Claim 10
Dependent Claim
55 words
A photomask in accordance with claim 6, wherein said first auxiliary pattern is located so that the first-order diffraction light from said first auxiliary pattern is added to the zero-order diffraction light from said rectangular light-transmission pattern at a position where a pattern corresponding to said rectangular light-transmission pattern is formed on said resist film.
Claim 11
Dependent Claim
40 words
A photomask in accordance with claim 8, wherein said second auxiliary pattern is located so that the second-order diffraction light from said second auxiliary pattern is added to the zero-order diffraction light from said rectangular light-transmission pattern at said position.
Claim 12
Dependent Claim
33 words
A photomask in accordance with claim 9, wherein a phase shift member is filled in said first auxiliary pattern, said phase shift member shifting the phase of light transmitted said first auxiliary pattern.
References Cited (Backward Citations)
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| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 1996-07-19 | 1997-01-18 | 1997-07-20 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2000-07-19 | 2001-01-18 | 2001-07-20 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2004-07-19 | 2005-01-18 | 2005-07-20 | $7700.00 | Window Closed / Lapsed |