US5228206A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Cluster tool dry cleaning system
Assignee: PRIMAXX ACQUISITION CORP
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Filing: 1992-01-15
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Granted: 1993-07-20
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Expires: 2012-01-15
Abstract
Abstract A cluster tool module for dry process cleaning of substrates. A substrate process reactor body assembly includes a gas inlet and gas outlet on opposing sides of a ceramic reactor body. A linear xenon flash lamp in a light bar provides a UV source for uniform distribution over a substrate by use of a light filter. Infrared heating is also provided by a plurality of infrared lamps in the light box. A moisturizer is provided for safe introduction of water vapor into the gas flow.
Inventors
- 👤 Robert W. Grant
- 👤 Richard E. Novak
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-06 16:17
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/04; H10P72/0402; H10P72/0406; F; F26; F26B; F26B21/00; F26B21/30; F26B21/33; F26B21/40; F26B3/00; F26B3/28; F26B3/283
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
53 words
Cluster tool dry cleaning system comprising: a. a ceramic reactor body including a gas inlet, a gas outlet and wafer orifice; b. a light box over said ceramic reactor body; c. a light source means in said light box; and, d. means for supporting and rotating a wafer or substrate in said body.
Claim 2
Dependent Claim
53 words
Cluster tool dry cleaning system comprising: a. a ceramic reactor body including a gas inlet, a gas outlet and wafer orifice; b. a light box over said ceramic reactor body; c. a light source means in said light box; and, d. means for supporting and rotating a wafer or substrate in said body.
Claim 3
Dependent Claim
66 words
Cluster tool dry cleaning system comprising: a. a ceramic reactor body including a gas inlet, a gas outlet and wafer orifice; b. a light box over said ceramic reactor body; c. a UV source means in said light box; d. an IR source means in said light box; e. a moisturizing means; and, f. means for supporting and rotating a wafer or substrate in said body.
Claim 4
Dependent Claim
66 words
Cluster tool dry cleaning system comprising: a. a ceramic reactor body including a gas inlet, a gas outlet and wafer orifice; b. a light box over said ceramic reactor body; c. a UV source means in said light box; d. an IR source means in said light box; e. a moisturizing means; and, f. means for supporting and rotating a wafer or substrate in said body.
Claim 5
Dependent Claim
12 words
The system of claim 2 including means for dispersing said UV radiation.
Claim 6
Dependent Claim
64 words
Cluster tool dry cleaning system comprising: a. a small ceramic reactor body including a gas inlet, a gas outlet and wafer orifice; b. a light box over said ceramic reactor body; c. a UV source means in said light box; d. an IR source means in said light box; e. a moisturizing means; and, f. means for supporting and rotating a wafer or substrate.
Claim 7
Dependent Claim
64 words
Cluster tool dry cleaning system comprising: a. a small ceramic reactor body including a gas inlet, a gas outlet and wafer orifice; b. a light box over said ceramic reactor body; c. a UV source means in said light box; d. an IR source means in said light box; e. a moisturizing means; and, f. means for supporting and rotating a wafer or substrate.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1996-07-19 | 1997-01-18 | 1997-07-20 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2000-07-19 | 2001-01-18 | 2001-07-20 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2004-07-19 | 2005-01-18 | 2005-07-20 | $7700.00 | Window Closed / Lapsed |