Centrifugal wafer carrier cleaning apparatus

Claim 2

A centrifugal cleaner for wafer carriers, comprising: a frame; a process chamber bowl supported upon the frame; said process chamber bowl defining a process chamber therewithin; said process chamber bowl further including an entrance port and an exit port; said entrance port being formed through the process chamber bowl to allow installation of wafer carriers into the process chamber therethrough; said exit port being formed through the process chamber bowl to allow removal of wafer carriers from the process chamber therethrough; an entrance door for controllably opening and closing said entrance port; an exit door for controllably opening and closing said exit port; a rotor mounted for rotation within the process chamber; a plurality of wafer carrier supports connected to said rotor for holding wafer carriers during centrifugal cleaning; rotor drive means for controllably rotating said rotor; at least one cleaning liquid spray manifold mounted within the process chamber for spraying a suitable cleaning liquid upon wafer carriers held in the wafer carrier supports; at least one drying gas supply for supplying drying gas to the process chamber to dry said cleaning liquid from wafer carriers.

Claim 3

A centrifugal cleaner for wafer according to claim 1 and wherein the rotor extends upwardly from lower portions of the processing chamber.

Claim 4

A centrifugal cleaner for wafer carriers according to claim 1 and wherein the rotor extends upwardly from lower portions of the processing chamber within a rotor support housing mounted within the processing chamber.

Claim 5

A centrifugal cleaner for wafer carriers according to claim 1 and wherein the rotor extends upwardly from lower portions of the processing chamber within a rotor support housing mounted within the processing chamber; said rotor also including a rotor wheel along upper portions thereof; said rotor further including a rotor cage which is mounted to said rotor wheel and extends downwardly to support said plurality of wafer carrier supports.

Claim 6

A centrifugal cleaner for wafer carriers according to claim 1 and wherein the rotor extends upwardly from lower portions of the processing chamber within a rotor support housing mounted within the processing chamber; said rotor also including a rotor wheel along upper portions thereof; said rotor further including a rotor cage which is mounted to said rotor wheel and extends downwardly; said at least one spray manifold including at least one inner spray manifold which extends upwardly within the processing chamber between the rotor cage and the rotor support housing.

Claim 7

A centrifugal cleaner for wafer carriers according to claim 1 and wherein the rotor extends upwardly from lower portions of the processing chamber within a rotor support housing mounted within the processing chamber; said rotor also including a rotor wheel along upper portions thereof; said rotor further including a rotor cage which is mounted to said rotor wheel and extends downwardly; and wherein there are a plurality of cleaning liquid spray manifolds; said spray manifolds including outer spray manifolds for spraying from outer positions inwardly toward wafer carriers held in the wafer carrier supports, and inner spray manifolds for spraying from inner positions outwardly toward wafer carriers held in the wafer carrier supports; said inner spray manifolds extending upwardly within the processing chamber between the rotor cage and the rotor support housing.

Claim 8

A centrifugal cleaner for wafer carriers according to claim 1 and wherein the rotor extends upwardly from lower portions of the processing chamber; said rotor further including a rotor cage to support said plurality of wafer carrier supports.

Claim 9

A centrifugal cleaner for wafer carriers according to claim 1 and wherein the rotor includes a rotor shaft which extends upwardly from lower portions of the processing chamber; said rotor further including a rotor cage having downwardly extending portions; said at least one spray manifold including at least one inner spray manifold which extends upwardly within the processing chamber between the rotor cage and the rotor shaft.

Claim 10

A centrifugal cleaner for wafer carriers according to claim 1 and wherein the rotor includes a rotor shaft which extends upwardly from lower portions of the processing chamber; said rotor further including a rotor cage having downwardly extending portions; and wherein there are a plurality of cleaning liquid spray manifolds; said spray manifolds including outer spray manifolds positioned outwardly from the rotor cage for spraying from outer positions inwardly toward wafer carriers held in the wafer carrier supports, and inner spray manifolds for spraying from inner positions outwardly toward wafer carriers held in the wafer carrier supports; said inner spray manifolds extending upwardly within the processing chamber between the rotor cage and the rotor shaft.

Claim 11

A centrifugal cleaner for wafer carriers according to claim 1 and further comprising at least one drying gas filter for filtering contaminants from drying gas supplied to the process chamber through said at least one drying gas supply.

Claim 12

A centrifugal cleaner for wafer carriers according to claim 1 and further comprising: at least one drying gas filter for filtering contaminants from drying gas supplied to the process chamber through said at least one drying gas supply; at least one drying gas heater for heating drying gas supplied to the process chamber through said at least one drying gas supply.

Claim 13

A centrifugal cleaner for wafer carriers according to claim 1 and further comprising: a drying gas plenum; at least one drying gas filter for filtering contaminants from drying gas supplied to said drying gas plenum; at least one drying gas heater mounted to the drying gas plenum for heating filtered drying gas; and wherein filtered, heated drying gas from said plenum is supplied to the process chamber through said at least one drying gas supply.

Claim 14

A centrifugal cleaner for wafer carriers according to claim 1 and wherein at least one drying gas supply is approximately aligned with the rotational axis of said rotor.

Claim 15

A centrifugal cleaner for wafer carriers according to claim 1 wherein there are a plurality of cleaning liquid spray manifolds.

Claim 16

A centrifugal cleaner for wafer carriers according to claim 1 and wherein there are a plurality of cleaning liquid spray manifolds; said spray manifolds including outer spray manifolds for spraying from outer positions inwardly toward wafer carriers held in the wafer carrier supports, and inner spray manifolds for spraying from inner positions outwardly toward wafer carriers held in the wafer carrier supports.

Claim 17

A centrifugal cleaner for wafer carriers according to claim 1 wherein there are a plurality of cleaning liquid spray manifolds; and further comprising a plurality of drying gas manifolds for jetting drying gas upon the wafer carrier supports and any wafer carriers held therein to aid in drying cleaning liquid therefrom.

Claim 18

A centrifugal cleaner for wafer carriers according to claim 1 and wherein there are a plurality of cleaning liquid spray manifolds; said spray manifolds including outer spray manifolds for spraying from outer positions inwardly toward wafer carriers held in the wafer carrier supports, and inner spray manifolds for spraying from inner positions outwardly toward wafer carriers held in the wafer carrier supports; and further comprising a plurality of drying gas manifolds for jetting drying gas upon the wafer carrier supports and any wafer carriers held therein to aid in drying cleaning liquid therefrom.

Claim 19

A centrifugal cleaner for wafer carriers according to claim 1 and wherein there are a plurality of cleaning liquid spray manifolds each having an array of nozzles; said spray manifolds including outer spray manifolds for spraying from outer positions inwardly toward wafer carriers held in the wafer carrier supports, and inner spray manifolds for spraying from inner positions outwardly toward wafer carriers held in the wafer carrier supports; and further comprising a plurality of drying gas manifolds for jetting drying gas upon the wafer carrier supports and any wafer carriers held therein to aid in drying cleaning liquid therefrom.

Claim 20

A centrifugal cleaner for wafer carriers according to claim 1 and wherein there are a plurality of cleaning liquid spray manifolds; said spray manifolds including outer spray manifolds for spraying from outer positions inwardly toward wafer carriers held in the wafer carrier supports, and inner spray manifolds for spraying from inner positions outwardly toward wafer carriers held in the wafer carrier supports; and further comprising a plurality of drying gas manifolds for jetting drying gas upon the wafer carrier supports and any wafer carriers held therein to aid in drying cleaning liquid therefrom; said plurality of drying gas manifolds including outer gas manifolds for jetting from outer positions inwardly toward wafer carriers held in the wafer carrier supports, and inner gas manifolds for jetting from inner positions outwardly toward wafer carriers held in the wafer carrier supports.

Claim 21

A centrifugal cleaner for wafer carriers according to claim 1 and further comprising a two phase drain box which drains liquid and exhausts drying gas from near a bottom of the process chamber.

Claim 22

A centrifugal cleaner for wafer carriers according to claim 1 and further comprising a lower baffle spaced from and adjacent to a bottom of the process chamber.

Claim 23

A centrifugal cleaner for wafer carriers according to claim 1 and further defined by said entrance and exit doors being slidable.

Claim 24

A centrifugal cleaner for wafer carriers, comprising: a frame; a process chamber bowl supported upon the frame; said process chamber bowl defining a process chamber therewithin; said process chamber bowl further including an entrance port and an exit port; said entrance port being formed through the process chamber bowl to allow installation of wafer carriers into the process chamber therethrough; said exit port being formed through the process chamber bowl to allow removal of wafer carriers from the process chamber therethrough; an entrance door for controllably opening and closing said entrance port; an exit door for controllably opening and closing said exit port; a rotor mounted for rotation within the process chamber; a plurality of wafer carrier supports connected to said rotor for holding wafer carriers during centrifugal cleaning; rotor drive means for controllably rotating said rotor; at least one cleaning liquid spray manifold mounted within the process chamber for spraying a suitable cleaning liquid upon wafer carriers held in the wafer carrier supports; a liquid drain for draining cleaning liquid from the process chamber; at least one drying gas supply for supplying drying gas to the process chamber to dry said cleaning liquid wafer carriers; at least one drying gas filter for filtering contaminants from drying gas supplied to the process chamber through said at least one drying gas supply; at least one gas exhaust for exhausting drying gas from the process chamber.

Claim 25

A centrifugal cleaner for wafer carriers, comprising: a frame; a process chamber bowl supported upon the frame; said process chamber bowl defining a process chamber therewithin; said process chamber bowl further including an entrance port and an exit port; said entrance port being formed through the process chamber bowl to allow installation of wafer carriers into the process chamber therethrough; said exit port being formed through the process chamber bowl to allow removal of wafer carriers from the process chamber therethrough; an entrance door for controllably opening and closing said entrance port; an exit door for controllably opening and closing said exit port; a rotor mounted for rotation within the process chamber; a plurality of wafer carrier supports connected to said rotor for holding wafer carriers during centrifugal cleaning; rotor drive means for controllably rotating said rotor; at least one cleaning liquid spray manifold mounted within the process chamber for spraying a suitable cleaning liquid upon wafer carriers held in the wafer carrier supports; a liquid drain for draining cleaning liquid from the process chamber; at least one drying gas supply for supplying drying gas to the process chamber to dry said cleaning liquid wafer carriers; at least one drying gas filter for filtering contaminants from drying gas supplied to the process chamber through said at least one drying gas supply; at least one gas exhaust for exhausting drying gas from the process chamber.

Claim 26

A centrifugal cleaner for wafer carriers according to claim 23 and wherein the rotor extends upwardly from lower portions of the processing chamber.

Claim 27

A centrifugal cleaner for wafer carriers according to claim 23 and wherein the rotor extends upwardly from lower portions of the processing chamber within a rotor support housing mounted within the processing chamber.

Claim 28

A centrifugal cleaner for wafer carriers according to claim 23 and wherein the rotor extends upwardly from lower portions of the processing chamber within a rotor support housing mounted within the processing chamber; said rotor also including a rotor wheel along upper portions thereof; said rotor further including a rotor cage which is mounted to said rotor wheel and extends downwardly to support said plurality of wafer carrier supports.

Claim 29

A centrifugal cleaner for wafer carriers according to claim 23 and wherein the rotor extends upwardly from lower portions of the processing chamber within a rotor support housing mounted within the processing chamber; said rotor also including a rotor wheel along upper portions thereof; said rotor further including a rotor cage which is mounted to said rotor wheel and extends downwardly to support said plurality of wafer carrier supports; said at least one spray manifold including at least one inner spray manifold which extends upwardly within the processing chamber between the rotor cage and the rotor support housing.

Claim 30

A centrifugal cleaner for wafer carriers according to claim 23 and wherein the rotor extends upwardly from lower portions of the processing chamber within a rotor support housing mounted within the processing chamber; said rotor also including a rotor wheel along upper portions thereof; said rotor further including a rotor cage which is mounted to said rotor wheel and extends downwardly to support said plurality of wafer carrier supports; and wherein there are a plurality of cleaning liquid spray manifolds; said spray manifolds including outer spray manifolds for spraying from outer positions inwardly toward wafer carriers held in the wafer carrier supports, and inner spray manifolds for spraying from inner positions outwardly toward wafer carriers held in the wafer carrier supports; and inner spray manifolds extending upwardly within the processing chamber between the rotor cage and the rotor support housing.

Claim 31

A centrifugal cleaner for wafer carriers according to claim 23 and wherein the rotor extends upwardly from lower portions of the processing chamber; said rotor further including a rotor cage to support said plurality of wafer carrier supports.

Claim 32

A centrifugal cleaner for wafer carriers according to claim 23 and wherein the rotor includes a rotor shaft which extends upwardly from lower portions of the processing chamber; said rotor further including a rotor cage having downwardly extending portions; said at least one spray manifold including at least one inner spray manifold which extends upwardly within the processing chamber between the rotor cage and the rotor shaft.

Claim 33

A centrifugal cleaner for wafer carriers according to claim 23 and wherein the rotor includes a rotor shaft which extends upwardly from lower portions of the processing chamber; said rotor further including a rotor cage having downwardly extending portions; and wherein there are a plurality of cleaning liquid spray manifolds; said spray manifolds including outer spray manifolds positioned outwardly from the rotor cage for spraying from outer positions inwardly toward wafer carriers held in the wafer carrier supports, and inner spray manifolds for spraying from inner positions outwardly toward wafer carriers held in the wafer carrier supports; said inner spray manifolds extending upwardly within the processing chamber between the rotor cage and the rotor shaft.

Claim 34

A centrifugal cleaner for wafer carriers according to claim 23 and further comprising: at least one drying gas filter for filtering contaminants from drying gas supplied to the process chamber through said at least one drying gas supply; at least one drying gas heater for heating drying gas supplied to the process chamber through said at least one drying gas supply.

Claim 35

A centrifugal cleaner for wafer carriers according to claim 23 and further comprising: a drying gas plenum; at least one drying gas filter for filtering contaminants from drying gas supplied to said drying gas plenum; at least one drying gas heater mounted to the drying gas plenum for heating filtered drying gas; and wherein filtered, heated drying gas from said plenum is supplied to the process chamber through said at least one drying gas supply.

Claim 36

A centrifugal cleaner for wafer carriers according to claim 23 and wherein at least one drying gas supply is approximately aligned with the rotational axis of said rotor.

Claim 37

A centrifugal cleaner for wafer carriers according to claim 23 wherein there are a plurality of cleaning liquid spray manifolds.

Claim 38

A centrifugal cleaner for wafer carriers according to claim 23 and wherein there are a plurality of cleaning liquid spray manifolds; said spray manifolds including outer spray manifolds for spraying from outer positions inwardly toward wafer carriers held in the wafer carrier supports, and inner spray manifolds for spraying from inner positions outwardly toward wafer carriers held in the wafer carrier supports.

Claim 39

A centrifugal cleaner for wafer carriers according to claim 23 wherein there are a plurality of cleaning liquid spray manifolds; and further comprising a plurality of drying gas manifolds for jetting drying gas upon the wafer carrier supports and any wafer carriers held therein to aid in drying cleaning liquid therefrom.

Claim 40

A centrifugal cleaner for wafer carriers according to claim 23 and wherein there are a plurality of cleaning liquid spray manifolds; said spray manifolds including outer spray manifolds for spraying from outer positions inwardly toward wafer carriers held in the wafer carrier supports, and inner spray manifolds for spraying from inner positions outwardly toward wafer carriers held in the wafer carrier supports; and further comprising a plurality of drying gas manifolds for jetting drying gas upon the wafer carrier supports and any wafer carriers held therein to aid in drying cleaning liquid therefrom.

Claim 41

A centrifugal cleaner for wafer carriers according to claim 23 and wherein there are a plurality of cleaning liquid spray manifolds each having an array of nozzles; said spray manifolds including outer spray manifolds for spraying from outer positions inwardly toward wafer carriers held in the wafer carrier supports, and inner spray manifolds for spraying from inner positions outwardly toward wafer carriers held in the wafer carrier supports; and further comprising a plurality of drying gas manifolds for jetting drying gas upon the wafer carrier supports and any wafer carriers held therein to aid in drying cleaning liquid therefrom.

Claim 42

A centrifugal cleaner for wafer carriers according to claim 23 and wherein there are a plurality of cleaning liquid spray manifolds; said spray manifolds including outer spray manifolds for spraying from outer positions inwardly toward wafer carriers held in the wafer carrier supports, and inner spray manifolds for spraying from inner positions outwardly toward wafer carriers held in the wafer carrier supports; and further comprising a plurality of drying gas manifolds for jetting drying gas upon the wafer carrier supports and any wafer carriers held therein to aid in drying cleaning liquid therefrom; said plurality of drying gas manifolds including outer gas manifolds for jetting from outer positions inwardly toward wafer carriers held in the wafer carrier supports, and inner gas manifolds for jetting from inner positions outwardly toward wafer carriers held in the wafer carrier supports.

Claim 43

A centrifugal cleaner for wafer carriers according to claim 23 and further comprising a two phase drain box which drains liquid and exhausts drying gas from near a bottom of the process chamber.

Claim 44

A centrifugal cleaner for wafer carriers according to claim 23 and further comprising a lower baffle spaced from and adjacent to a bottom of the process chamber.

Claim 45

A centrifugal cleaner for wafer carriers according to claim 23 and further defined by said entrance and exit doors being slidable.

Claim 46

A centrifugal cleaner for wafer carriers, comprising: a frame; a process chamber bowl supported upon the frame; said process chamber bowl defining a process chamber therewithin; said process chamber bowl further including an entrance port and an exit port; said entrance port being formed through the process chamber bowl to allow installation of wafer carriers into the process chamber therethrough; said exit port being formed through the process chamber bowl to allow removal of wafer carriers from the process chamber therethrough, respectively; an entrance door for controllably opening and closing said entrance port; an exit door for controllably opening and closing said exit port; an upstanding rotor mounted for rotation within the process chamber; said rotor having a rotor shaft within the process chamber; said rotor also including a rotor cage which has downwardly extending portions; a plurality of wafer carrier supports connected to said rotor cage for holding wafer carriers during centrifugal cleaning; rotor drive means for controllably rotating said rotor; a plurality of cleaning liquid spray manifolds mounted within the process chamber for spraying a suitable cleaning liquid upon wafer carriers held in the wafer carrier supports; said liquid spray manifolds including outer spray manifolds for spraying from outer positions inwardly toward wafer carriers held in the wafer carrier supports, and inner spray manifolds for spraying from inner positions outwardly toward wafer carriers held in the wafer carrier supports; said inner spray manifolds extending upwardly within the processing chamber between the rotor cage and the rotor shaft; a liquid drain for draining liquid from the process chamber; at least one drying gas supply for supplying drying gas to the process chamber to dry said cleaning liquid from wafer carriers; at least one drying gas filter for filtering contaminants from drying gas supplied to the process chamber through said at least one drying gas supply; at least one gas exhaust for exhausting drying gas from the process chamber.

Claim 47

A centrifugal cleaner for wafer carriers, comprising: a frame; a process chamber bowl supported upon the frame; said process chamber bowl defining a process chamber therewithin; said process chamber bowl further including an entrance port and an exit port; said entrance port being formed through the process chamber bowl to allow installation of wafer carriers into the process chamber therethrough; said exit port being formed through the process chamber bowl to allow removal of wafer carriers from the process chamber therethrough, respectively; an entrance door for controllably opening and closing said entrance port; an exit door for controllably opening and closing said exit port; an upstanding rotor mounted for rotation within the process chamber; said rotor having a rotor shaft within the process chamber; said rotor also including a rotor cage which has downwardly extending portions; a plurality of wafer carrier supports connected to said rotor cage for holding wafer carriers during centrifugal cleaning; rotor drive means for controllably rotating said rotor; a plurality of cleaning liquid spray manifolds mounted within the process chamber for spraying a suitable cleaning liquid upon wafer carriers held in the wafer carrier supports; said liquid spray manifolds including outer spray manifolds for spraying from outer positions inwardly toward wafer carriers held in the wafer carrier supports, and inner spray manifolds for spraying from inner positions outwardly toward wafer carriers held in the wafer carrier supports; said inner spray manifolds extending upwardly within the processing chamber between the rotor cage and the rotor shaft; a liquid drain for draining liquid from the process chamber; at least one drying gas supply for supplying drying gas to the process chamber to dry said cleaning liquid from wafer carriers; at least one drying gas filter for filtering contaminants from drying gas supplied to the process chamber through said at least one drying gas supply; at least one gas exhaust for exhausting drying gas from the process chamber.

Claim 48

A centrifugal cleaner for wafer carriers according to claim 44 and further defined by said drying gas supply being positioned to supply drying gas from said drying gas filter toward upper portions of the rotor.

Claim 49

A centrifugal cleaner for wafer carriers according to claim 44 and further defined by said drying gas supply being positioned to supply drying gas from said drying gas filter toward upper portions of the rotor adjacent a rotor wheel which connects the rotor shaft and rotor cage; said rotor wheel being at least partially open to allow the rotor to induce drying gas flow when rotating.

Claim 50

A centrifugal cleaner for wafer carriers according to claim 44 and wherein the rotor extends upwardly from lower portions of the processing chamber within a rotor support housing mounted within the processing chamber.

Claim 51

A centrifugal cleaner for wafer carriers according to claim 44 and further comprising: at least one drying gas filter for filtering contaminants from drying gas supplied to the process chamber through said at least one drying gas supply; at least one drying gas heater for heating drying gas supplied to the process chamber through said at least one drying gas supply.

Claim 52

A centrifugal cleaner for wafer carriers according to claim 44 and further comprising: a drying gas plenum; at least one drying gas filter for filtering contaminants from drying gas supplied to said drying gas plenum; at least one drying gas heater mounted to the drying gas plenum for heating filtered drying gas; and wherein filtered, heated drying gas from said plenum is supplied to the process chamber through said at least one drying gas supply.

Claim 53

A centrifugal cleaner for wafer carriers according to claim 44 and wherein at least one drying gas supply is approximately aligned with the rotational axis of said rotor.

Claim 54

A centrifugal cleaner for wafer carriers according to claim 44 wherein there are a plurality of cleaning liquid spray manifolds; and further comprising a plurality of drying gas manifolds for jetting drying gas upon the wafer carrier supports and any wafer carriers held therein to aid in drying cleaning liquid therefrom.

Claim 55

A centrifugal cleaner for wafer carriers according to claim 44 and further comprising a plurality of drying gas manifolds for jetting drying gas upon the wafer carrier supports and any wafer carriers held therein to aid in drying cleaning liquid therefrom; said plurality of drying gas manifolds including outer gas manifolds for jetting from outer positions inwardly toward wafer carriers held in the wafer carrier supports, and inner gas manifolds for jetting from inner positions outwardly toward wafer carriers held in the wafer carrier supports.

Claim 56

A centrifugal cleaner for wafer carriers according to claim 44 and further comprising a two phase drain box which drains liquid and exhausts drying gas from near a bottom of the process chamber.

Claim 57

A centrifugal cleaner for wafer carriers according to claim 44 and further comprising a lower baffle spaced from and adjacent to a bottom of the process chamber.

Claim 58

A centrifugal cleaner for wafer carriers according to claim 44 and further defined by said entrance and exit doors being slidable.