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US5223001A Expired / Lapsed US ⏱️ 0.0 years remaining

Vacuum processing apparatus

Assignee: Tokyo Electron Ltd
•
Filing: 1992-11-19
•
Granted: 1993-06-29
•
Expires: 2012-11-19
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Abstract

Abstract The present invention is a vacuum processing apparatus provided with a vacuum processing chamber which implements a required processing to an object of processing, and a pre-vacuum chamber (load-lock chamber) configured so that it can be internally vacuum exhausted, with an object of processing being carried-in and -out of the vacuum processing chamber via the pre-vacuum chamber, in which a small space which can be airtightly sealed is provided inside the pre-vacuum chamber, so that the object of processing can be temporarily withdrawn into and housed in the small space when there is vacuum exhaust from the pre-vacuum chamber and when there is the introduction of air to the pre-vacuum chamber. Thus, it is possible to prevent the adhesion to the processing object of particles which rise when air is introduced to the load-lock chamber and when air is exhausted from the load-lock chamber, and without having to perform slow exhaust and slow venting, while increases the throughput and the yield at the same time.

Inventors

  • 👤 Hiroaki Saeki

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-03 21:14
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/30; H10P72/33; H10P72/3306; C; C23; C23C; C23C14/00; C23C14/22; C23C14/56; C23C14/564; C23C14/566; H10P72/3308

Claims Analysis

Total Claims: 8
Claim 1
Independent Claim 105 words
A vacuum processing apparatus provided with a vacuum processing chamber which implements a required processing to an object of processing, and a pre-vacuum chamber configured so that it can be internally vacuum exhausted, with an object of processing being carried-in and -out of the vacuum processing chamber via the pre-vacuum chamber, said vacuum processing apparatus comprising a small space which can be airtightly sealed is provided inside said pre-vacuum chamber, so that the object of processing can be temporarily housed into said small space when there is vacuum exhaust from said pre-vacuum chamber and when there is the introduction of air to said pre-vacuum chamber.
Claim 2
Dependent Claim 105 words
A vacuum processing apparatus provided with a vacuum processing chamber which implements a required processing to an object of processing, and a pre-vacuum chamber configured so that it can be internally vacuum exhausted, with an object of processing being carried-in and -out of the vacuum processing chamber via the pre-vacuum chamber, said vacuum processing apparatus comprising a small space which can be airtightly sealed is provided inside said pre-vacuum chamber, so that the object of processing can be temporarily housed into said small space when there is vacuum exhaust from said pre-vacuum chamber and when there is the introduction of air to said pre-vacuum chamber.
Claim 3
Dependent Claim 21 words
The vacuum processing apparatus of claim 1, wherein said small space is provided to an upper portion of said pre-vacuum chamber.
Claim 4
Dependent Claim 22 words
The vacuum processing apparatus of claim 1, wherein an exhaust pipe and a gas introduction pipe are connected to said small space.
Claim 5
Dependent Claim 26 words
The vacuum processing apparatus of claim 1, wherein a carrying-in and a carrying-out opening of said vacuum processing chamber are respectively provided with said pre-vacuum chambers.
Claim 6
Dependent Claim 33 words
The vacuum processing apparatus of claim 1, wherein a gas flow passage connects said small space and said pre-vacuum chamber, and said gas flow passage having a dust removal filter inserted into it.
Claim 7
Dependent Claim 36 words
The vacuum processing apparatus of claim 1, wherein said small space is connected to a gas flow passage and is connected to an exhaust pipe of said pre-vacuum chamber via an externally provided dust removal filter.
Claim 8
Dependent Claim 26 words
The vacuum processing apparatus of claim 1, wherein said object of processing is a semiconductor wafer or a glass substrate for a liquid crystal display (LCD).

References Cited (Backward Citations)

US4824545A Cited
US4828224A Cited
US5084125A Cited
US5139459A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1996-06-28 1996-12-28 1997-06-29 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2000-06-28 2000-12-28 2001-06-29 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2004-06-28 2004-12-28 2005-06-29 $7700.00 Window Closed / Lapsed

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