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US5218471A Expired / Lapsed US ⏱️ 0.0 years remaining

High-efficiency, multilevel, diffractive optical elements

Assignee: Massachusetts Institute of Technology
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Filing: 1991-12-02
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Granted: 1993-06-08
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Expires: 2011-12-02
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Abstract

Abstract The method utilizes high resolution lithography, mask aligning, and reactive ion etching. In particular, at least two binary amplitude masks are generated. A photoresist layer on an optical element substrate is exposed through the first mask and then etched. The process is then repeated for the second and subsequent masks to create a multistep configuration. The resulting optical element is highly efficient.

Inventors

  • 👤 Gary J. Swanson
  • 👤 Wilfrid B. Veldkamp

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-03 01:02
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70308; G02; G02B; G02B27/00; G02B27/42; G02B27/4205; G02B27/4211; G02B27/4216; G02B27/4222; G02B3/00; G02B3/02; G02B3/08; G02B5/00; G02B5/18; G02B5/1847; G02B5/1857; G02B5/1876; G03F1/00; G03F7/0005; G03F7/001

Claims Analysis

Total Claims: 13
Claim 1
Independent Claim 60 words
Method for making high-efficiency, multilevel, diffractive optical elements comprising: generating at least one binary amplitude mask including multilevel information, the mask being configured to provide 2 N levels where N is the number of masks; and utilizing the masks' information for constructing 2 N levels in the optical element, the depths of the levels being related by a fixed ratio.
Claim 2
Dependent Claim 60 words
Method for making high-efficiency, multilevel, diffractive optical elements comprising: generating at least one binary amplitude mask including multilevel information, the mask being configured to provide 2 N levels where N is the number of masks; and utilizing the masks' information for constructing 2 N levels in the optical element, the depths of the levels being related by a fixed ratio.
Claim 3
Dependent Claim 14 words
The method of claim 1 wherein the masks are made by lithographic pattern generators.
Claim 4
Dependent Claim 11 words
The method of claim 1 including three masks and eight levels.
Claim 5
Dependent Claim 59 words
The method of claim 1 wherein the binary amplitude masks are defined by calculating equiphase boundaries utilizing the equation ##EQU5## and the algorithm ______________________________________ Equi-phase Phase Boundaries Etch Mask # N (l = 0, ±1, ±2, . . . ) Depth θ ______________________________________ 1 φ(x,y) = (l + 1)π π ##STR5## π/2 3 ##STR6## π/4 4 ##STR7## π/8 ______________________________________
Claim 6
Dependent Claim 15 words
The method of claim 1 wherein the masks are made by electron beam pattern generators.
Claim 7
Dependent Claim 12 words
The method of claim 1 wherein the optical element is a lens.
Claim 8
Dependent Claim 13 words
The method of claim 1 wherein the optical element corrects for spherical aberration.
Claim 9
Dependent Claim 14 words
The method of claim 1 wherein the optical element is corrected for chromatic aberration.
Claim 10
Dependent Claim 33 words
Method for making high-efficiency multilevel diffractive optical elements comprising: making a master optical element according to the method of claim 1; and using the master optical element to emboss multiple replicated optical components.
Claim 11
Dependent Claim 20 words
The method of claim 9 wherein the master optical element is copied in metal which is used for the embossing.
Claim 12
Dependent Claim 43 words
Method for making a high efficiency, multi-level, diffractive optical element comprising: providing a substrate including at least two initial levels; generating at least one binary amplitude mask including multi-level information; and utilizing the mask to double the number of levels in the element.
Claim 13
Dependent Claim 43 words
Method for making a high efficiency, multi-level, diffractive optical element comprising: providing a substrate including at least two initial levels; generating at least one binary amplitude mask including multi-level information; and utilizing the mask to double the number of levels in the element.

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1996-06-07 1996-12-07 1997-06-08 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2000-06-07 2000-12-07 2001-06-08 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2004-06-07 2004-12-07 2005-06-08 $7700.00 Window Closed / Lapsed

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