US5208644A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Interference removal
Assignee: Luxtron Corp
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Filing: 1990-05-18
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Granted: 1993-05-04
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Expires: 2010-05-18
Abstract
Abstract An improved method for minimizing interferences from random noise and correlated fluctuations which obscure electrical signals converted from optical emissions. In particular, an improved method for the removal of interferences from optical emission signals during endpoint determination in dry etching processes for the fabrication of microelectronic devices which derives information in the presence of random noise, correlated fluctuations and periodic modulations of the plasma by maximizing the signal to random noise ratio and minimizing the obscuring effects of correlated fluctuation.
Inventors
- 👤 Herbert E. Litvak
- 👤 Steven C. Leach
- 👤 Edward G. Rogers
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 23:44
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32917; H01J37/32935; G; G01; G01N; G01N21/00; G01N21/62; G01N21/66; G01N21/68; H01J37/32963
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
148 words
In an optical emission detection method which converts a self-emitted light emission intensity to a measurable electrical signal for monitoring a dry etch process for microfabrication an improved method for minimizing interferences comprising the steps of: (a) measuring said electrical signal in separate channels at two or more wavelengths employing a fiber optics bundle having two or more sets of fibers, with the fibers within said sets mixed to minimize any bias in the view of each fiber bundle; (b) normalizing the separate electrical signals from said separate channels; (c) analyzing said electrical signals for random noise, correlated fluctuations, and the dry process monitoring signal; (d) maximizing the signal to random noise ratio of the process monitoring signal; (e) minimizing the obscuring effects of correlated fluctuations from the separate channels by algorithms; thereby providing a resultant signal which is no longer obscured by random noise or correlated fluctuations.
Claim 2
Dependent Claim
148 words
In an optical emission detection method which converts a self-emitted light emission intensity to a measurable electrical signal for monitoring a dry etch process for microfabrication an improved method for minimizing interferences comprising the steps of: (a) measuring said electrical signal in separate channels at two or more wavelengths employing a fiber optics bundle having two or more sets of fibers, with the fibers within said sets mixed to minimize any bias in the view of each fiber bundle; (b) normalizing the separate electrical signals from said separate channels; (c) analyzing said electrical signals for random noise, correlated fluctuations, and the dry process monitoring signal; (d) maximizing the signal to random noise ratio of the process monitoring signal; (e) minimizing the obscuring effects of correlated fluctuations from the separate channels by algorithms; thereby providing a resultant signal which is no longer obscured by random noise or correlated fluctuations.
Claim 3
Dependent Claim
23 words
A method in accordance with claim 1, wherein said dry etch process is a plasma etch which includes periodic modulations of the plasma.
Claim 4
Dependent Claim
22 words
A method in accordance with claim 1, wherein the exposed film area of a surface to be etched is less than 5%.
Claim 5
Dependent Claim
20 words
A method in accordance with claim 1, wherein digital processing is used to maximize the signal to random noise ratio.
Claim 6
Dependent Claim
33 words
A method in accordance with claim 1, wherein the raw measurable electrical signal contains a noise portion and wherein a useful resultant signal is provided from such noise portion of the raw signal.
Claim 7
Dependent Claim
35 words
A method in accordance with claim 1, wherein said interferences are periodically varying low frequency modulations and said separate electrical signals are averaged at a selected wavelength over an integral number of plasma modulation cycles.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1996-05-03 | 1996-11-02 | 1997-05-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2000-05-03 | 2000-11-02 | 2001-05-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2004-05-03 | 2004-11-02 | 2005-05-04 | $7700.00 | Window Closed / Lapsed |