US5203911A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Controlled electroless plating
Assignee: Shipley Co Inc
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Filing: 1991-06-24
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Granted: 1993-04-20
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Expires: 2011-06-24
Abstract
Abstract A composition for electrolessly depositing thin metal coatings in selective patterns of fine dimension. The electroless plating solutions of the invention are characterized by a low metal content and preferably, freedom from alkali or alkaline earth metal ions.
Inventors
- 👤 Prasit Sricharoenchaikit
- 👤 Gary S. Calabrese
- 👤 Michael Gulla
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 02:13
CPC Classifications
C; C23; C23C; C23C18/00; C23C18/16; C23C18/52
Claims Analysis
Total Claims: 18
Claim 1
Independent Claim
87 words
An aqueous electroless metal plating solution comprising a source of metal ions, a complexing agent for said metal ions, a reducing agent capable of reducing said metal ions to metallic form in the presence of a catalytic surface and a pH adjustor, said metal ions being present in a concentration ranging between about 0.001 and 0.01 moles per liter and said remaining solution components being present in solution in a concentration whereby the rate at which metal plates from solution does not exceed 100 Angstroms per minute.
Claim 2
Dependent Claim
87 words
An aqueous electroless metal plating solution comprising a source of metal ions, a complexing agent for said metal ions, a reducing agent capable of reducing said metal ions to metallic form in the presence of a catalytic surface and a pH adjustor, said metal ions being present in a concentration ranging between about 0.001 and 0.01 moles per liter and said remaining solution components being present in solution in a concentration whereby the rate at which metal plates from solution does not exceed 100 Angstroms per minute.
Claim 3
Dependent Claim
42 words
The solution of claim 1 where solution components are present in solution in a concentration whereby the rate varies between about 5 and 50 Angstroms per minute and the plating solution is free of particulates having a major dimension exceeding 1.0 microns.
Claim 4
Dependent Claim
40 words
The solution of claim 1 where solution components are present in solution in a concentration whereby the rate does not exceed 10 Angstroms per minute and the plating solution is free of particulates having a major dimension exceeding 0.1 microns.
Claim 5
Dependent Claim
21 words
The solution of claim 1 where said metal ions are selected from the group of nickel, cobalt, copper and mixtures thereof.
Claim 6
Dependent Claim
12 words
The solution of claim 4 where said metal ions are nickel ions.
Claim 7
Dependent Claim
14 words
The solution of claim 1 essentially free of alkali and alkaline earth metal ions.
Claim 8
Dependent Claim
24 words
The solution of claim 1 where the reducing agent is one that does not codeposit with the metal to be plated in appreciable quantity.
Claim 9
Dependent Claim
21 words
The solution of claim 1 where the reducing agent is selected from the group consisting of amine boranes and ammonium borohydride.
Claim 10
Dependent Claim
10 words
The solution of claim 1 having an essentially neutral pH.
Claim 11
Dependent Claim
87 words
An aqueous electroless nickel plating solution comprising a source of nickel ions, a complexing agent for said nickel ions, a reducing agent capable of reducing said nickel ions to metallic form in the presence of a catalytic surface and a pH adjustor, said nickel ions being present in a concentration ranging between about 0.001 and 0.01 moles per liter and said remaining solution components being present in solution in a concentration whereby the rate at which nickel plates from solution does not exceed 100 Angstroms per minute.
Claim 12
Dependent Claim
87 words
An aqueous electroless nickel plating solution comprising a source of nickel ions, a complexing agent for said nickel ions, a reducing agent capable of reducing said nickel ions to metallic form in the presence of a catalytic surface and a pH adjustor, said nickel ions being present in a concentration ranging between about 0.001 and 0.01 moles per liter and said remaining solution components being present in solution in a concentration whereby the rate at which nickel plates from solution does not exceed 100 Angstroms per minute.
Claim 13
Dependent Claim
27 words
The solution of claim 10 where solution components are present in solution in a concentration whereby the rate varies between about 5 and 50 Angstroms per minute.
Claim 14
Dependent Claim
24 words
The solution of claim 10 where solution components are present in solution in a concentration whereby the rate does not exceed 10 Angstroms minute
Claim 15
Dependent Claim
14 words
The solution of claim 10 essentially free of alkali and alkaline earth metal ions.
Claim 16
Dependent Claim
20 words
The solution of claim 10 where the reducing agent is one that does not codeposit with nickel in appreciable quantity.
Claim 17
Dependent Claim
13 words
The solution of claim 10 where the reducing agent is an amine borane.
Claim 18
Dependent Claim
10 words
The solution of claim 10 having an essentially neutral pH.
References Cited (Backward Citations)
US3431120A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1996-04-19 | 1996-10-19 | 1997-04-20 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2000-04-19 | 2000-10-19 | 2001-04-20 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2004-04-19 | 2004-10-19 | 2005-04-20 | $7700.00 | Window Closed / Lapsed |