US5194346A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of fabricating phase shifting reticles with an accurate phase shift layer
Assignee: Micron Technology Inc
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Filing: 1991-04-15
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Granted: 1993-03-16
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Expires: 2011-04-15
Abstract
Abstract A method of fabricating phase shifting reticles that can be used as a mask in photolithographic processes such as semiconductor wafer patterning. An opaque film such as chromium is first deposited on a transparent substrate. The opaque film is then patterned with openings by a first photolithographic process. A phase shifter material such as (SiO 2 ) is then blanket deposited into the openings and over the opaque film. The phase shifter material is then polished by chemical mechanical planarization (CMP) to a thickness "T" which is selected to produce a 180° phase shift. The phase shifter material is then photopatterned and selectively etched by a second photolithographic process to remove all of the phase shifter material except in every other opening formed in the opaque film. This forms a repetitive pattern of alternating phase shifters and light transmission openings through the opaque film.
Inventors
- 👤 J. Brett Rolfson
- 👤 David A. Cathey, Jr.
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-04 22:19
CPC Classifications
G; G03; G03F; G03F1/00; G03F1/26; G03F1/30
Claims Analysis
Total Claims: 20
Claim 1
Independent Claim
112 words
A method of forming a phase shifting reticle for semiconductor manufacture comprising: depositing an opaque material on a transparent substrate; forming a repetitive pattern of openings through the opaque material to the substrate; blanket depositing a phase shifter material over the opaque material and into the openings; polishing and planarizing the phase shift material to a thickness "T"; and patterning the layer of phase shifter material and selectively etching the phase shifter material to provide a phase shifter in every other opening previously formed in the opaque material so that a repetitive pattern of phase shifters and light transmission openings having opaque light blockers on either side is formed on the substrate.
Claim 2
Independent Claim
112 words
A method of forming a phase shifting reticle for semiconductor manufacture comprising: depositing an opaque material on a transparent substrate; forming a repetitive pattern of openings through the opaque material to the substrate; blanket depositing a phase shifter material over the opaque material and into the openings; polishing and planarizing the phase shift material to a thickness "T"; and patterning the layer of phase shifter material and selectively etching the phase shifter material to provide a phase shifter in every other opening previously formed in the opaque material so that a repetitive pattern of phase shifters and light transmission openings having opaque light blockers on either side is formed on the substrate.
Claim 3
Dependent Claim
36 words
The method as recited in claim 1 and wherein: the thickness "T" of the phase shifter material and index of refraction of the phase shifter material are selected to provide a phase shift of approximately 180°.
Claim 4
Dependent Claim
26 words
The method as recited in claim 1 further comprising: directing an incident light through the reticle through a lens and onto a wafer to be photopatterned.
Claim 5
Dependent Claim
27 words
The method as recited in claim 1 and wherein: the pattern of openings through the opaque material to the substrate is formed by a first photolithographic process.
Claim 6
Independent Claim
164 words
A method of forming a phase shifting reticle for use in semiconductor photolithography comprising: depositing an opaque material on a transparent substrate; patterning by a first photolithography process a repetitive pattern of openings through the opaque material to the substrate with each opening having solid opaque sections on either side; blanket depositing a phase shifter material over the solid opaque sections and into the openings with phase shifter material having a refractive index different than air; polishing and planarizing the phase shifter material by chemical mechanical planarization (CMP) to a thickness "T" with the phase shifter material and thickness "T" selected for providing a 180° phase shift; patterning by a second photolithography process and etching the phase shifter material to remove the phase shifter material except in every other opening formed in the opaque material wherein phase shifters are formed of a thickness "T"; whereby an repetitive pattern of alternating phase shifters and light transmission openings having light blockers on either side is formed.
Claim 7
Independent Claim
164 words
A method of forming a phase shifting reticle for use in semiconductor photolithography comprising: depositing an opaque material on a transparent substrate; patterning by a first photolithography process a repetitive pattern of openings through the opaque material to the substrate with each opening having solid opaque sections on either side; blanket depositing a phase shifter material over the solid opaque sections and into the openings with phase shifter material having a refractive index different than air; polishing and planarizing the phase shifter material by chemical mechanical planarization (CMP) to a thickness "T" with the phase shifter material and thickness "T" selected for providing a 180° phase shift; patterning by a second photolithography process and etching the phase shifter material to remove the phase shifter material except in every other opening formed in the opaque material wherein phase shifters are formed of a thickness "T"; whereby an repetitive pattern of alternating phase shifters and light transmission openings having light blockers on either side is formed.
Claim 8
Dependent Claim
14 words
The method as recited in claim 5 and wherein; the transparent substrate is quartz.
Claim 9
Dependent Claim
15 words
The method as recited in claim 6 and wherein: the opaque material is chromium (CR).
Claim 10
Dependent Claim
17 words
The method as recited in claim 7 and wherein: the phase shifter material is (SiO 2 ).
Claim 11
Independent Claim
180 words
A method of forming a phase shifting reticle for use in semiconductor photolithography comprising: depositing a film of opaque material on a transparent quartz substrate; photopatterning and etching the film of opaque material with a pattern of openings through the opaque material to the substrate by a first photolithography process; blanket depositing a phase shifter material into the openings; chemically mechanically planarizing (CMP) the phase shifter material to a thickness "T"; coating the phase shifter material with a patterned resist and selectively removing the phase shifter material except in every other opening formed in the opaque material by an etch process selected to remove only the phase shifter material; whereby a phase shift reticle having a repetitive pattern of alternating light transmission openings and phase shifters separated by opaque light blockers is formed, with the thickness "T" and index of refraction of the phase shifters selected to provide a phase shift difference between light passed through the phase shifters and through the light transmission openings of about 180° such that diffracted light is substantially canceled in a dark area therebetween.
Claim 12
Independent Claim
180 words
A method of forming a phase shifting reticle for use in semiconductor photolithography comprising: depositing a film of opaque material on a transparent quartz substrate; photopatterning and etching the film of opaque material with a pattern of openings through the opaque material to the substrate by a first photolithography process; blanket depositing a phase shifter material into the openings; chemically mechanically planarizing (CMP) the phase shifter material to a thickness "T"; coating the phase shifter material with a patterned resist and selectively removing the phase shifter material except in every other opening formed in the opaque material by an etch process selected to remove only the phase shifter material; whereby a phase shift reticle having a repetitive pattern of alternating light transmission openings and phase shifters separated by opaque light blockers is formed, with the thickness "T" and index of refraction of the phase shifters selected to provide a phase shift difference between light passed through the phase shifters and through the light transmission openings of about 180° such that diffracted light is substantially canceled in a dark area therebetween.
Claim 13
Dependent Claim
41 words
The method as recited in claim 9 and wherein: the thickness "T" is determined by the formula ##EQU3## where T=thickness of phase shift material i=an odd integer λ=wavelength of exposure light n=refractive index of phase shifter material at the exposure wavelength.
Claim 14
Dependent Claim
59 words
The method as recited in claim 10 and further comprising: directing an incident light through the phase shift reticle onto a target wafer in a photolithography process to produce alternating dark areas by diffraction of light waves between a light transmission opening and an adjacent phase shifter in order to improve the resolution and depth of the photolithography process.
Claim 15
Dependent Claim
28 words
The method as recited in claim 10 and wherein: the substrate is quartz, the opaque material is chromium (CR), and the phase shifter material is (SiO 2 ).
Claim 16
Dependent Claim
11 words
The method as recited in claim 10 and wherein: thickness "T"=3800Å.
Claim 17
Independent Claim
181 words
A method of forming a phase shifting reticle for use in semiconductor photolithography comprising: depositing an opaque material on a transparent substrate; depositing a photosensitive resist onto the opaque material, patterning the resist, and etching a pattern of first openings into the opaque material; blanket depositing (SiO 2 ) as a phase shifter material over the opaque material and into the openings; chemically mechanically planarizing (CMP) the (SiO 2 ) to a thickness of "T" to produce a phase shift of about 180°; depositing a photosensitive resist onto the phase shifter material patterning the resist and selectively etching away the phase shifter material except in every other opening, whereby a repetitive pattern is formed on the substrate including an opaque light blocker, a light transmission opening, a light blocker, and a phase shifter; whereby incident light may be directed through the substrate and light diffracted through a phase shifter section will be canceled by light diffracted through a light transmission opening to form a dark area therebetween for improving a resolution of an image on a target wafer to be photopatterned.
Claim 18
Independent Claim
181 words
A method of forming a phase shifting reticle for use in semiconductor photolithography comprising: depositing an opaque material on a transparent substrate; depositing a photosensitive resist onto the opaque material, patterning the resist, and etching a pattern of first openings into the opaque material; blanket depositing (SiO 2 ) as a phase shifter material over the opaque material and into the openings; chemically mechanically planarizing (CMP) the (SiO 2 ) to a thickness of "T" to produce a phase shift of about 180°; depositing a photosensitive resist onto the phase shifter material patterning the resist and selectively etching away the phase shifter material except in every other opening, whereby a repetitive pattern is formed on the substrate including an opaque light blocker, a light transmission opening, a light blocker, and a phase shifter; whereby incident light may be directed through the substrate and light diffracted through a phase shifter section will be canceled by light diffracted through a light transmission opening to form a dark area therebetween for improving a resolution of an image on a target wafer to be photopatterned.
Claim 19
Dependent Claim
24 words
The method as recited in claim 14 and wherein: a 5× reduction lens is placed between the reticle and a wafer to be photopatterned.
Claim 20
Dependent Claim
30 words
The method as recited in claim 14 and wherein: the etch process to selectively etch the phase shifter material has no appreciable effect on the opaque layer or mask substrate.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1996-03-15 | 1996-09-14 | 1997-03-16 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2000-03-15 | 2000-09-14 | 2001-03-16 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2004-03-15 | 2004-09-14 | 2005-03-16 | $7700.00 | Window Closed / Lapsed |