Position detecting method and apparatus

Claim 2

A position detecting method for detecting the relative position of a particular grating pattern with respect to a predetermined reference grating pattern, said method comprising: a signal forming step for forming first and second signals corresponding to moire fringes provided or to be provided by the patterns; said signal forming step comprising a first-signal forming step for forming, by using the particular grating pattern and one portion of the reference grating pattern, the first signal corresponding to a first moire fringe provided by or to be provided by these patterns, and a second-signal forming step for forming, by using the particular grating pattern and another portion of the reference grating pattern, the second signal corresponding to a second moire fringe provided by or to be provided by these patterns; the first and second signals having phases shiftable in opposite directions in accordance with the position of the particular grating pattern with respect to the reference grating pattern; and a position detecting step for detecting the position of the particular grating pattern with respect to the reference grating pattern on the basis of any difference in phase between the first and second signals.

Claim 3

A method according to claim 1, wherein the reference grating pattern comprises, as the one portion and the other portion thereof respectively, first and second grating patterns having different spatial frequencies with respect to a predetermined direction and wherein the signal forming step comprises the first signal forming step for forming, by using the particular grating pattern and the first grating pattern, the first signal corresponding to a first moire fringe provided by or to be provided by these patterns, and the second signal forming step for forming, by using the particular grating pattern and the second grating pattern, the second signal corresponding to a second moire fringe provided by or to be provided by these patterns.

Claim 4

A method according to claim 1, wherein the reference grating pattern comprises, as the one portion and the other portion thereof respectively, first and second grating patterns the images of which, when formed, have different spatial frequencies in respect to a predetermined direction, and wherein said signal forming step comprises an image forming step for forming images of the particular grating pattern and the first and second grating patterns, a first signal forming step for forming the first signal corresponding to a first moire fringe provided by or to be provided by the images of the particular grating pattern and the first grating pattern, and a second signal forming step for forming the second signal corresponding to a second moire fringe provided by or to be provided by the images of the particular grating pattern and the second grating pattern, and wherein the images of the first and second grating patterns have spatial frequencies of F 0-F and F 0 +F, respectively, where F 0 denotes the spatial frequency in the predetermined direction of the image of the particular grating pattern and F denotes the spatial frequency in the predetermined direction of the first and second moire fringes.

Claim 5

A method according to claim 3, wherein, at the image forming step, the image of the particular grating pattern and the images of the first and second grating patterns are formed with spatial superposition.

Claim 6

A method according to claim 3, wherein, at the image forming step, the image of the particular grating pattern and the images of the first and second grating patterns are formed at spatially different positions.

Claim 7

A method according to claim 3, wherein, at the image forming step, the particular grating pattern is imaged with a magnification β W and the first and second grating patterns are imaged with a magnification β R , and wherein, when the grating pitch of the particular grating pattern in the predetermined direction is denoted by L W , the grating pitch of the first grating pattern in the predetermined direction is denoted by L R1 , the grating pitch of the second grating pattern in the predetermined direction is denoted by L R2 and the pitch of the first and second moire fringes in the predetermined direction is denoted β W ·L 0 , by then the following relation is satisfied: β.sub.W ·L.sub.2 =β.sub.R (1-ε)L.sub.R1 =β.sub.R (1+ε)L.sub.R2 =ε·β.sub.W ·L.sub.0 where ε is a real number in the range of 0<ε<0.5.

Claim 8

A method according to claim 6, wherein, at the image forming step, the images of the particular grating pattern and the first and second grating patterns are formed on an image pickup surface on which a number of picture elements are arranged in the predetermined direction, and wherein the following relationship is satisfied: ε.sub.W =(ε·L.sub.m ·2M)/L.sub.W where L m is the pitch of the arrayed picture elements and M is an arbitrary integral number.

Claim 9

A position detecting device for detecting the relative position of a particular grating pattern with respect to a predetermined reference grating pattern, said device comprising: image forming means for forming images of the patterns; and position detecting means for forming first and second signals corresponding to moire fringes provided or to be provided by the images of the patterns; said position detecting means forming the first signal by using the particular grating pattern and one portion of the reference grating pattern with the first signal thereby corresponding to a first moire fringe provided by or to be provided by these patterns, and forming the second signal by using the particular grating pattern and another portion of the reference grating pattern with the second signal thereby corresponding to a second moire fringe provided by or to be provided by these patterns; the first and second signals having phases shiftable in opposite directions in accordance with the position of the particular grating pattern with respect to the reference grating pattern; said position detecting means detecting the position of the particular grating pattern with respect to the reference grating pattern on the basis of any difference in phase between the first and second signals.

Claim 10

A position detecting device for detecting the relative position of a particular grating pattern with respect to a predetermined reference grating pattern, said device comprising: image forming means for forming images of the patterns; and position detecting means for forming first and second signals corresponding to moire fringes provided or to be provided by the images of the patterns; said position detecting means forming the first signal by using the particular grating pattern and one portion of the reference grating pattern with the first signal thereby corresponding to a first moire fringe provided by or to be provided by these patterns, and forming the second signal by using the particular grating pattern and another portion of the reference grating pattern with the second signal thereby corresponding to a second moire fringe provided by or to be provided by these patterns; the first and second signals having phases shiftable in opposite directions in accordance with the position of the particular grating pattern with respect to the reference grating pattern; said position detecting means detecting the position of the particular grating pattern with respect to the reference grating pattern on the basis of any difference in phase between the first and second signals.

Claim 11

A device according to claim 8, wherein the reference grating pattern comprises, as the one portion and the other portion thereof respectively, first and second grating patterns the images of which, when formed, have different spatial frequencies with respect to a predetermined direction, and wherein said image forming means is arranged to form the images of the particular grating pattern and the first grating pattern with spatial superposition and to form the images of the particular grating pattern and the second grating pattern with spatial superposition, and wherein said position detecting means includes photoelectric converting means for photoelectrically converting a first moire fringe provided by the images of the particular grating pattern and the first grating pattern and a second moire fringe provided by the images of the particular grating pattern and the second grating pattern, the first and second signals being formed on the basis of the photoelectric conversion by said photoelectric converting means.

Claim 12

A device according to claim 8 wherein the reference grating pattern comprises, as the one portion and the other portion thereof respectively, first and second grating patterns the images of which ,when formed, have different spatial frequencies with respect to a predetermined direction, and wherein said image forming means is arranged to form the image of the particular grating pattern and the images of the first and second grating patterns at spatially different positions, and wherein said position detecting means includes photoelectric converting means for photoelectrically converting the images of the particular grating pattern and the first and second grating patterns, and signal processing means for producing the first signal on the basis of a video signal from said photoelectric converting means, corresponding to the images of the particular grating pattern and the first grating pattern, and to form the second signal on the basis of a video signal from said photoelectric converting means, corresponding to the images of the particular grating pattern and the second grating pattern.

Claim 13

A device according to claim 9, wherein the images of the first and second grating patterns have spatial frequencies of F 0 -F and F 0 +F, respectively, where F 0 denotes the spatial frequency of the image of the particular grating pattern in the predetermined direction and F is the spatial frequency of the first and second moire fringes in the predetermined direction.

Claim 14

A device according to claim 10, wherein the images of the first and second grating patterns have spatial frequencies of F-F 0 and F+F 0 , respectively, where F is the spatial frequency of the moire fringe in the predetermined direction and F 0 is the spatial frequency of the image of the particular grating pattern.

Claim 15

A device according to claim 8, wherein the particular grating pattern is formed on an object to be examined and wherein said device includes a movable stage on which the object can be placed.

Claim 16

A device according to claim 8, further comprising a movable stage on which an object having the reference grating pattern formed thereon can be placed.

Claim 17

A device according to claim 8, wherein said image forming means is arranged to detect the formed images in a dark field.

Claim 18

A position detecting method for detecting the relative position of a particular grating pattern with respect to a predetermined reference grating pattern, said method comprising: a preparation step for preparing first and second grating patterns the images of which, when formed, have different spatial frequencies with respect to a predetermined direction, the first and second grating patterns functioning as the reference grating pattern; a first signal forming step for forming a first signal corresponding to a first moire fringe provided or to be provided by images of the particular grating pattern and the first grating pattern, the first signal having a phase shiftable in a first direction in accordance with the position of the particular grating pattern; a second signal forming step for forming a second signal corresponding to a second moire fringe provided or to be provided by images of the particular grating pattern and the second grating pattern, said second signal having a phase shiftable in a second direction opposite to the first direction in accordance with the position of the particular grating pattern; and a position detecting step for detecting the position of the particular pattern on the basis of any difference in phase between the first and second signals.

Claim 19

A position detecting method for detecting the relative position of a particular grating pattern with respect to a predetermined reference grating pattern, said method comprising: a preparation step for preparing first and second grating patterns the images of which, when formed, have different spatial frequencies with respect to a predetermined direction, the first and second grating patterns functioning as the reference grating pattern; a first signal forming step for forming a first signal corresponding to a first moire fringe provided or to be provided by images of the particular grating pattern and the first grating pattern, the first signal having a phase shiftable in a first direction in accordance with the position of the particular grating pattern; a second signal forming step for forming a second signal corresponding to a second moire fringe provided or to be provided by images of the particular grating pattern and the second grating pattern, said second signal having a phase shiftable in a second direction opposite to the first direction in accordance with the position of the particular grating pattern; and a position detecting step for detecting the position of the particular pattern on the basis of any difference in phase between the first and second signals.

Claim 20

A method according to claim 16, wherein the first and second grating patterns are so prepared that their images, when formed, have spatial frequencies F 0 -F and F 0 +F where F 0 is the spatial frequency of the particular grating pattern and F is the spatial frequency of the first and second moire fringes, in the predetermined direction.

Claim 21

A method according to claim 16, wherein the following relationship is satisfied: L.sub.W =εL.sub.0 (0<ε<0.5) where L W is the grating pitch of the image of the particular grating pattern and L 0 is the pitch of the first and second moire fringes, in the predetermined direction.

Claim 22

A method according to claim 18, wherein the following relationship is satisfied: (1-ε)L.sub.R1 =(1+ε)L.sub.R2 where L R1 and L R2 are the grating pitches of the images of the first and second grating patterns, in respect to the predetermined direction.

Claim 23

A method according to claim 16, wherein the first signal forming step includes a first converting step for photoelectrically converting the first moire fringe, with the images being superposed one upon another, wherein the second signal forming step includes a second converting step for photoelectrically converting the second moire fringe, with the images being superposed one upon another, and wherein the first signal is formed in accordance with the first converting step while the second signal is formed in accordance with the second converting step.

Claim 24

A method according to claim 20, wherein the first signal forming step includes a first extraction step for extracting a signal of a frequency not greater than a predetermined frequency, out of a signal obtained at the first converting step, the first signal being formed with the intervention of the first extracting step, and wherein the second signal forming step includes a second extracting step for extracting a signal of a frequency not greater than the predetermined frequency, out of a signal obtained at the second converting step, the second signal being formed with the intervention of the second extracting step.

Claim 25

A method according to claim 16, wherein the first signal forming step includes a first producing step for mutually multiplying signals obtained by photoelectric conversion of the images of the particular grating pattern and the first grating pattern to produce a predetermined signal, wherein the second signal forming step includes a second producing step for mutually multiplying signals obtained by photoelectric conversion of the images of the particular grating pattern and the second grating pattern to produce a predetermined signal, and wherein the first signal is formed in accordance with the first producing step and the second signal is formed in accordance with the second producing step.

Claim 26

A method according to claim 22, wherein the first signal forming step includes a first extracting step for extracting a signal of a frequency not greater than a predetermined frequency, out of the signal obtained at the first producing step, the first signal being formed with the intervention of the first extracting step, and wherein the second signal forming step includes a second extracting step for extracting a signal of a frequency not greater than the predetermined frequency, out of the signal obtained at the second producing step, the second signal being formed with the intervention of the second extracting step.

Claim 27

An exposure apparatus for aligning a wafer with respect to said apparatus by use of a grating mark formed on said wafer and a predetermined reference grating pattern formed at a location relative to said apparatus, and for exposing the wafer with a radiation beam to print a predetermined pattern on the wafer, said apparatus comprising: means for directing a radiation beam to the wafer; a stage for supporting the wafer and being movable relatively to said beam directing means; driving means for relatively moving said beam directing means and said stage; image pickup means for forming images of the grating mark and the reference grating pattern; and control means responsive to an output signal from said image pickup means for forming a first signal by using the images of the grating mark and one portion of the reference grating pattern and corresponding to a first moire fringe provided by or to be provided by these images, and forming a second signal by using the images of the grating mark and another portion of the reference grating pattern and corresponding to a second moire fringe provided by or to be provided by the images, the first and second signals having phases shiftable in opposite directions in accordance with the positional relationship between the grating mark and the reference grating pattern; said control means detecting any difference in phase between the first and the second signals, and controlling said driving means on the basis of the detected difference in phase between the first and second signals.

Claim 28

An exposure apparatus for aligning a wafer with respect to said apparatus by use of a grating mark formed on said wafer and a predetermined reference grating pattern formed at a location relative to said apparatus, and for exposing the wafer with a radiation beam to print a predetermined pattern on the wafer, said apparatus comprising: means for directing a radiation beam to the wafer; a stage for supporting the wafer and being movable relatively to said beam directing means; driving means for relatively moving said beam directing means and said stage; image pickup means for forming images of the grating mark and the reference grating pattern; and control means responsive to an output signal from said image pickup means for forming a first signal by using the images of the grating mark and one portion of the reference grating pattern and corresponding to a first moire fringe provided by or to be provided by these images, and forming a second signal by using the images of the grating mark and another portion of the reference grating pattern and corresponding to a second moire fringe provided by or to be provided by the images, the first and second signals having phases shiftable in opposite directions in accordance with the positional relationship between the grating mark and the reference grating pattern; said control means detecting any difference in phase between the first and the second signals, and controlling said driving means on the basis of the detected difference in phase between the first and second signals.

Claim 29

An apparatus according to claim 24, wherein said image pickup means forms the images of the grating mark and the reference grating pattern at spatially different positions and produces signals corresponding to the formed images, and wherein said control means operates to produce the first and second signals by mutual multiplication of the signals produced by the image pickup means corresponding to the formed images.

Claim 30

An apparatus according to claim 25, wherein said image pickup means forms the images of the grating mark and first and second grating patterns, which are the one portion and the other portion of the reference grating pattern respectively, and images of which have different spatial frequencies in respect to a predetermined direction, and wherein said control means operates to form the first signal by extracting a signal of a frequency not greater than a predetermined frequency, out of the signal formed by multiplication of a signal corresponding to the image of the grating mark with a signal corresponding to the image of the first grating pattern, and also to form the second signal by extracting a signal of a frequency not greater than the predetermined frequency, out of the signal formed by multiplication of a signal corresponding to the image of the grating mark with a signal corresponding to the image of the second grating pattern.

Claim 31

An apparatus according to claim 26, wherein said image pickup means forms the images of the grating mark and the first and second grating patterns, so that the image of the grating mark has a spatial frequency F 0 , the moire fringe has a spatial frequency F and the images of the first and second grating patterns have spatial frequencies of F 0 -F and F 0 +F, respectively.

Claim 32

An apparatus according to claim 27, wherein said beam directing means includes supporting means for supporting a mask having a circuit pattern and the first and second grating patterns formed thereon, and wherein said beam directing means directs a radiation beam to the wafer in accordance with the circuit pattern, to thereby print the circuit pattern on the wafer.

Claim 33

An apparatus according to claim 27, wherein said beam directing means includes supporting means for supporting a mask having a circuit pattern formed thereon, and a projection optical system for projecting an image of the circuit pattern on the wafer and for directing a radiation beam to the wafer in accordance with the circuit pattern to print the circuit pattern on the wafer.

Claim 34

An apparatus according to claim 29, further comprising a mark plate mounted with said apparatus and having the first and second grating patterns formed thereon, wherein said mark plate is provided at a position which is optically conjugate with the wafer with respect to said projection optical system.

Claim 35

An apparatus according to claim 30, wherein the mask is provided with a grating-like mask mark, other than the circuit pattern, wherein said image pickup means forms an image of the grating-like mask mark, wherein said control means operates to extract a signal of a frequency not greater than a predetermined frequency, out of a signal formed by multiplication of a signal corresponding to the image of the grating-like mask mark with a signal corresponding to the image of the first grating pattern, to produce a third signal having a phase shiftable in accordance with the position of the mask wherein said control means operates to extract a signal of a frequency not greater than the predetermined frequency , out of a signal formed by multiplication of a signal corresponding to the image of the grating-like mask mark with a signal corresponding to the image of the second grating pattern, to produce a fourth signal having a phase shiftable oppositely to the shift of the third signal, in accordance with the position of the mask, and wherein said control means operates to adjust the position of said supporting means in accordance with any difference in phase between the third and fourth signals, at align the mask with respect to said apparatus.

Claim 36

An apparatus according to claim 27, wherein said stage is movable and said driving means is operable to move said stage, and wherein said control means operates to control said driving means to adjust the position of said stage to align the wafer with respect to the apparatus.

Claim 37

An apparatus according to claim 24, wherein said image pickup means forms the images of the grating mark and the reference grating pattern with superposition and produces a particular signal, and wherein the first and second signals are formed on the basis of the particular signal.

Claim 38

An apparatus according to claim 33, wherein said image pickup means forms the images of the grating mark and first and second grating portions, which are the one portion and the other portion of the reference grating pattern respectively, and images of which have different spatial frequencies in respect to a predetermined direction, and wherein said control means operates to form the first signal by extracting a signal of a frequency not greater than a predetermined frequency, out of a signal obtained on the basis of superposition of the images of the grating mark and the first grating pattern, and to form the second signal by extracting a signal of a frequency not greater than the predetermined frequency, out of a signal obtained on the basis of superposition of the images of the grating mark and the second grating pattern.

Claim 39

An apparatus according to claim 34, wherein said image pickup means forms the images of the grating mark and the first and second grating patterns, so that the image of the grating mark has a spatial frequency F 0 , the moire fringe has a spatial frequency F and the images of the first and second grating patterns have spatial frequencies of F 0 -F and F 0 +F, respectively.

Claim 40

An apparatus according to claim 24, wherein said image pickup means forms the images of the reference grating pattern and first and second grating marks which serve as the grating mark and images of which have different spatial frequencies in respect to a predetermined direction, and wherein said control means operates to form the first signal corresponding to a moire fringe provided by or to be provided by the images of the first grating mark and the reference grating pattern, and also to form the second signal corresponding to a moire fringe provided by or to be provided by the images of the second grating mark and the grating pattern.

Claim 41

An apparatus according to claim 36, wherein said image pickup means forms the images of the reference grating pattern and the first and second grating marks so that the image of the reference grating pattern has a spatial frequency of F 0 , the moire fringe has a spatial frequency F and the images of the first and second grating marks have spatial frequencies of F 0 -F and F 0 +F, respectively, in said predetermined direction.

Claim 44

A method according to claim 38, wherein, with respect to the predetermined direction, the image of the grating pattern has a spatial frequency of F 0 , the moire fringes have a spatial frequency of F and the images of the first and second grating marks have spatial frequencies of F 0 -F and F 0 +F, respectively.

Claim 45

A method according to claim 39, wherein L W =εL 0 (0<ε<0.5) is satisfied when, with respect to the predetermined direction, each moire fringe has a pitch L 0 and the image of the grating pattern has a grating pitch L W , and wherein (1-ε)L R1 =(1+ε)L R2 is satisfied when the images of the first and second grating marks have grating pitch of L R1 and L R2 , respectively.

Claim 48

A method according to claim 41, wherein the first grating pattern has a pair of portions having different spatial frequencies, and wherein said first signal forming step comprises the step of forming the first signal by using an image of one of the paired portions of the first grating pattern and an image of the second grating pattern, and wherein said second signal forming step comprises the step of forming the second signal by using an image of the other portion of the first grating pattern and an image of the second grating pattern.

Claim 49

A method according to claim 42, further comprising the step of independently detecting each of: the image of the one of the paired portions of the first grating pattern, the image of the other of the paired portions of the first grating pattern, and the image of the second grating pattern, independently of the others.

Claim 50

A method according to claim 43, wherein said first signal forming step comprises the step of forming the first signal by detecting a moire fringe produced by superposing the image on one of the paired portions of the first grating pattern and the image of the second grating pattern one upon another, and wherein said second signal forming step comprises the step of forming the second signal by detecting a moire fringe produced by superposing the image of the other of the paired portions of the first grating pattern and the image of the second grating pattern one upon another.

Claim 51

In a semiconductor device manufacturing method usable with a substrate having a first grating pattern and a wafer having a second grating pattern, in which the position of the wafer with respect to the substrate is detected and, after adjustment of the position of the wafer on the basis of the detection, a circuit pattern is printed on the wafer, the improvement comprising the steps of: forming a first signal corresponding to a moire fringe, provided by the first and second grating patterns, and having a phase changeable in a direction in response to the position of the wafer; forming a second signal corresponding to a moire fringe, provided by the first and second grating patterns, and having a phase changeable in an opposite manner to the first signal in response to the position of the wafer; and determining the position of the wafer on the basis of the difference in phase between the first and second signals.

Claim 52

In a semiconductor device manufacturing method usable with a substrate having a first grating pattern and a wafer having a second grating pattern, in which the position of the wafer with respect to the substrate is detected and, after adjustment of the position of the wafer on the basis of the detection, a circuit pattern is printed on the wafer, the improvement comprising the steps of: forming a first signal corresponding to a moire fringe, provided by the first and second grating patterns, and having a phase changeable in a direction in response to the position of the wafer; forming a second signal corresponding to a moire fringe, provided by the first and second grating patterns, and having a phase changeable in an opposite manner to the first signal in response to the position of the wafer; and determining the position of the wafer on the basis of the difference in phase between the first and second signals.

Claim 53

In a semiconductor device manufacturing method usable with a mask having a circuit pattern and a wafer with respect to the mask is detected and, after adjustment of the position of the wafer on the basis of the detection, the circuit pattern of the mask is printed on the wafer, the improvements comprising the steps of: providing first and second grating patterns of different spatial frequencies on the mask; forming a first signal corresponding to a moire fringe, provided by the first grating pattern and the grating mark, and having a phase changeable in a direction in response to the position of the wafer; forming a second signal corresponding to a moire fringe, provided by the second grating pattern and the grating mark, and having a phase changeable in an opposite manner to the first signal in response to the position of the wafer; determining the position of the wafer on the basis of the difference in phase between the first and second signals; and adjusting the position of the wafer on the basis of the determination in said determining step.

Claim 54

In a semiconductor device manufacturing method usable with a mask having a circuit pattern and a wafer with respect to the mask is detected and, after adjustment of the position of the wafer on the basis of the detection, the circuit pattern of the mask is printed on the wafer, the improvements comprising the steps of: providing first and second grating patterns of different spatial frequencies on the mask; forming a first signal corresponding to a moire fringe, provided by the first grating pattern and the grating mark, and having a phase changeable in a direction in response to the position of the wafer; forming a second signal corresponding to a moire fringe, provided by the second grating pattern and the grating mark, and having a phase changeable in an opposite manner to the first signal in response to the position of the wafer; determining the position of the wafer on the basis of the difference in phase between the first and second signals; and adjusting the position of the wafer on the basis of the determination in said determining step.

Claim 55

A method according to claim 46, wherein further comprising the step of independently detecting each of the image of the first grating pattern, the image of the second grating pattern, and the image of the grating mark, independently of the others.

Claim 56

A method according to claim 46, wherein said first signal forming step comprises the step of forming the first signal by detecting a moire fringe produced by superposing the image of the first grating pattern and the image of the grating mark one upon another, and wherein said second signal forming step comprises the step of forming the second signal by detecting a moire fringe produced by superposing the image of the second grating pattern and the image of the grating mark one upon another.

Claim 57

In a semiconductor device manufacturing method usable with a mask having a circuit pattern and a wafer having a grating mark, in which the position of the wafer is detected and, after adjustment of the position of the wafer on the basis of the detection, the circuit pattern of the mask is printed on the wafer, the improvements comprising in the steps of: providing a reference plate having first and second grating patterns of different spatial frequencies; forming a first signal corresponding to a moire fringe, provided by the first grating pattern and the grating mark, and having a phase changeable in a direction in response to the position of the wafer; forming a second signal corresponding to a moire fringe, provided by the second grating pattern and the grating mark, and having a phase changeable in an opposite manner to the first signal in response to the position of the wafer; determining the position of the wafer with respect to the reference plate on the basis of the difference in phase between the first and second signals; and adjusting the position of the wafer on the basis of the determination in said determining step.

Claim 58

In a semiconductor device manufacturing method usable with a mask having a circuit pattern and a wafer having a grating mark, in which the position of the wafer is detected and, after adjustment of the position of the wafer on the basis of the detection, the circuit pattern of the mask is printed on the wafer, the improvements comprising in the steps of: providing a reference plate having first and second grating patterns of different spatial frequencies; forming a first signal corresponding to a moire fringe, provided by the first grating pattern and the grating mark, and having a phase changeable in a direction in response to the position of the wafer; forming a second signal corresponding to a moire fringe, provided by the second grating pattern and the grating mark, and having a phase changeable in an opposite manner to the first signal in response to the position of the wafer; determining the position of the wafer with respect to the reference plate on the basis of the difference in phase between the first and second signals; and adjusting the position of the wafer on the basis of the determination in said determining step.

Claim 59

A method according to claim 49, further comprising the step of independently determining each of the image of the first grating pattern, the image of the second grating pattern, and the image of the grating mark, independently of the others.

Claim 60

A method according to claim 49, wherein said first signal forming step comprises the step of forming the first signal by detecting a moire fringe produced by superposing the image of the first grating pattern and the image of the grating mark one upon another, and wherein said second signal forming step comprises the step of forming the second signal by detecting a moire fringe produced by superposing the image of the second grating pattern and the image of the grating mark one upon another.