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US5175740A Expired / Lapsed US ⏱️ 0.0 years remaining

Semiconductor laser and method of fabricating same

Assignee: Verizon Laboratories Inc
•
Filing: 1991-07-24
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Granted: 1992-12-29
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Expires: 2011-07-24
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Abstract

Abstract A ridge-waveguide laser is fabricated by epitaxially growing a GaAs-based heterostructure, disposing an AlAs etch stop layer on the heterostructure, disposing epitaxial layers on the etch stop layer, and etching the heterostructure to form the laser whereby the etch stop layer prevents further etching into said heterostructure.

Inventors

  • 👤 Boris S. Elman
  • 👤 Wayne F. Sharfin

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-06 10:45
CPC Classifications
H; H01; H01S; H01S5/00; H01S5/20; H01S5/22; H01S5/223; H01S5/2231; H01S5/2054; H01S5/2081; H01S5/209; H01S5/30; H01S5/32; H01S5/323; H01S5/32308

Claims Analysis

Total Claims: 7
Claim 1
Independent Claim 57 words
A method of fabricating a mesa structure including a ridge-waveguide laser, comprising the steps of: epitaxially growing a heterostructure; disposing an AlAs etch stop layer on said heterostructure; disposing epitaxial layers on said etch stop layer; and etching said epitaxial layers to form said mesa structure whereby said etch stop layer prevents further etching into said heterostructure.
Claim 2
Independent Claim 57 words
A method of fabricating a mesa structure including a ridge-waveguide laser, comprising the steps of: epitaxially growing a heterostructure; disposing an AlAs etch stop layer on said heterostructure; disposing epitaxial layers on said etch stop layer; and etching said epitaxial layers to form said mesa structure whereby said etch stop layer prevents further etching into said heterostructure.
Claim 3
Dependent Claim 54 words
The method as recited in claim 1 wherein said laser includes: a GaAs substrate; an AlGaAs lower cladding layer; a GaAs/InGaAs/GaAs quantum well active region; a first AlGaAs upper cladding layer interposed between said active region and said etch stop layer; and a second AlGaAs upper cladding layer disposed on said etch stop layer.
Claim 4
Dependent Claim 29 words
A heterostructure for fabricating a laser, comprising: an epitaxially-grown heterostructure; an AlAs etch stop layer disposed on said epitaxially-grown heterostructure; and epitaxial layers disposed on said etch stop layer.
Claim 5
Dependent Claim 29 words
A heterostructure for fabricating a laser, comprising: an epitaxially-grown heterostructure; an AlAs etch stop layer disposed on said epitaxially-grown heterostructure; and epitaxial layers disposed on said etch stop layer.
Claim 6
Dependent Claim 47 words
The heterostructure as recited in claim 3 wherein said epitaxially-grown heterostructure includes: a GaAs substrate; an AlGaAs lower cladding layer disposed on said substrate; a GaAs/InGaAs/GaAs quantum well active region disposed on said lower cladding layer; and an AlGaAs upper cladding layer disposed on said active region.
Claim 7
Dependent Claim 13 words
The heterostructure as recited in claim 4 wherein said epitaxial layers are AlGaAs.

References Cited (Backward Citations)

US4962057A Cited
US5020153A Cited
US5124996A Cited
US5111470A Cited
US5126804A Cited
US5114877A Cited
US5126803A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1995-12-29 1996-06-29 1996-12-29 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1999-12-29 2000-06-29 2000-12-29 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2003-12-29 2004-06-29 2004-12-29 $7700.00 Window Closed / Lapsed

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