Claims Analysis
Total Claims: 17
Claim 1
Independent Claim
106 words
An integral Bi-CMOS logic circuit comprising: a pair of first transistors including a first MOS transistor for receiving an input signal through its gate, and a first bipolar transistor with its base connected to the drain of the first MOS transistor for outputting a first output signal; and a pair of second transistors including a second MOS transistor for receiving the input signal through its gate, and a second bipolar transistor with its base connected to the drain of the second MOS transistor for outputting the first output signal, the first and second bipolar transistors having a common emitter terminal for outputting a final output signal.
Claim 2
Dependent Claim
106 words
An integral Bi-CMOS logic circuit comprising: a pair of first transistors including a first MOS transistor for receiving an input signal through its gate, and a first bipolar transistor with its base connected to the drain of the first MOS transistor for outputting a first output signal; and a pair of second transistors including a second MOS transistor for receiving the input signal through its gate, and a second bipolar transistor with its base connected to the drain of the second MOS transistor for outputting the first output signal, the first and second bipolar transistors having a common emitter terminal for outputting a final output signal.
Claim 3
Dependent Claim
21 words
The circuit of claim 1, wherein the first MOS transistor is a P-type, and the first bipolar transistor is an NPN-type.
Claim 4
Dependent Claim
21 words
The circuit of claim 1, wherein the second MOS transistor is an N-type, and the second bipolar transistor is a PNP-type.
Claim 5
Dependent Claim
34 words
The circuit of claim 1, wherein pair of the first transistors are formed on an n- well of a P-type substrate, and the pair of second transistors are formed directly on the P-type substrate.
Claim 6
Dependent Claim
53 words
The circuit of claim 1, wherein the pair of the first transistors are formed on an n- epitaxial layer which is in turn formed on an n+ buried layer, and the pair of the second transistors are formed on a P- epitaxial layer which is in turn formed on a P+ buried layer.
Claim 7
Dependent Claim
83 words
The circuit of claim 2, wherein the drain region of the P-type first MOS transistor is formed as a P- and P+ dual diffusion structure within an n- well, a source region of the P-type first MOS transistor is also formed within the n- well, a collector region of the NPN-type first bipolar transistor is formed as the n- well, and an n+ emitter region of the NPN-type first bipolar transistor is formed within a P- region of the NPN-type first bipolar transistor.
Claim 8
Dependent Claim
26 words
The circuit of claim 6, wherein the drain region of the P-type first MOS transistor serves as a base region of the NPN-type first bipolar transistor.
Claim 9
Dependent Claim
61 words
The circuit of claim 3, wherein the second N-type MOS transistor has a drain region comprising an n- and n+ dual diffusion structure within a P-type substrate, an n+ source region is also formed on the P-type substrate, the PNP-type second bipolar transistor has a collector region formed on the P-substrate, and an n+ emitter region formed within the n- region.
Claim 10
Dependent Claim
25 words
The circuit of claim 8, wherein the drain region of the N-type second MOS transistor serves as base region of the PNP-type second bipolar transistor.
Claim 11
Dependent Claim
26 words
The circuit of claim 1, wherein the pair of first transistors are formed in a completely complementary type with respect to the second pair of transistors.
Claim 12
Dependent Claim
80 words
The circuit of claim 4, wherein a drain region of the first MOS transistor is P-type and is formed as a P- and P+ dual diffusion structure within the n- well, a source region of the first MOS transistor is also formed within the n- well, a collector region of the first bipolar transistor is formed as the n- well, and an n+ emitter region of the first bipolar transistor is formed within a P-region of the first bipolar transistor.
Claim 13
Dependent Claim
26 words
The circuit of claim 11, wherein the drain region of the P-type first MOS transistor serves as a base region of the NPN-type first bipolar transistor.
Claim 14
Dependent Claim
71 words
The circuit of claim 4, wherein the second MOS transistor is N-type and has a drain region comprising an n- and n+ dual diffusion structure within the P-type substrate, an n+ source region is also formed on the substrate, and the second bipolar transistor is PNP-type and has a collector region formed on the P-substrate, and a p+ emitter region is formed within an n- region of the second bipolar transistor.
Claim 15
Dependent Claim
26 words
The circuit of claim 13, wherein the drain region of the N-type second MOS transistor serves as a base region of the PNP-type second bipolar transistor.
Claim 16
Dependent Claim
21 words
The circuit of claim 10, wherein the first MOS transistor is a P-type, and the first bipolar transistor is an NPN-type.
Claim 17
Dependent Claim
21 words
The circuit of claim 10, wherein the second MOS transistor is an N-type, and the second bipolar transistor is a PNP-type.